Journal of Vacuum Science & Technology A

Journal of Vacuum Science & Technology A, Vol.13, No.3 Entire volume, number list

ISSN: 0734-2101 (Print)

In this Issue (244 articles)

503 - 508	Vacuum Gauging with Complementary Metal-Oxide-Semiconductor Microsensors Paul O, Brand O, Lenggenhager R, Baltes H
509 - 514	Optical Method for Low-Pressure Measurements Bello I, Bederka S, Haworth L
515 - 519	Surface-Analysis of Carbon on Ozone Treated Metals Momose T, Maeda Y, Asano K, Ishimaru H
520 - 523	Outgassing Reduction of Type-304 Stainless-Steel by Surface Oxidation in Air Odaka K, Ueda S
524 - 530	Enhancement of Hydrogen Pumping by Injecting Fluorine into the Exhaust System of Turbomolecular Pumps Ogure N, Shibata A, Ono K, Hayasaka N, Okano H, Okumura K
531 - 535	Pumping Behavior of Ion-Pump Elements at High and Misaligned Magnetic-Fields Hseuh HC, Jiang WS, Mapes M
536 - 539	Modeling of a Multistage Claw Rotor Vacuum Pump Ioffe IV, Koss VA, Gray M, Livesey RG
540 - 544	Vacuum Characteristics of Titanium Minato M, Itoh Y
545 - 548	Recombination Limited Outgassing of Stainless-Steel Moore BC
549 - 550	Theoretical Submonolayer Adsorption-Isotherms for Hydrogen on a Heterogeneous Surface Hobson JP
551 - 555	Pumping Characteristics of a Cryopump with Ar Sorbent in He and in a D-2/He Mixture Menon MM, Laughon GJ, Maingi R, Wade MR, Hillis DL, Mahdavi MA
556 - 561	Tin Thin-Film on Stainless-Steel for Extremely High-Vacuum Material Saito K, Inayoshi S, Ikeda Y, Yang Y, Tsukahara S
562 - 570	Secondary-Ion Mass-Spectroscopy Analysis for Aluminum Surfaces Treated by Glow-Discharge Cleaning Chen JR, Hsiung GY, Liu YC, Lee WH, Nee CC
571 - 575	Reduction of Outgassing Rate by Glow-Discharge Cleaning Li MX, Dylla HF
576 - 580	X-Ray Photoelectron-Spectroscopy Analysis of Cleaning Procedures for Synchrotron-Radiation Beamline Materials at the Advanced Photon Source Li Y, Ryding D, Liu C, Kuzay TM, Mcdowell MW, Rosenberg RA
581 - 584	Photon-Stimulated Desorption Measurements of Extruded Copper and of Welded Copper Beam Chambers for the PEP-II Asymmetric-B Factory Foerster CL, Lanni C, Perkins C, Calderon M, Barletta W
585 - 589	Photodesorption from a Copper Chamber with a Broached Inner Surface Kobari T, Matumoto M, Hirano N, Katane M, Matsuzaki M, Hori Y, Kobayashi M, Nagai M
590 - 595	Chemical-Vapor-Deposited Ticn - A New Barrier Metallization for Submicron via and Contact Applications Eizenberg M, Littau K, Ghanayem S, Liao M, Mosely R, Sinha AK
596 - 601	Plasma-Enhanced Chemical-Vapor-Deposition of TiO2 in Microwave-Radio Frequency Hybrid Plasma Reactor Lee YH, Chan KK, Brady MJ
602 - 606	Interface Characterization of an InP/InGaAs Resonant-Tunneling Diode by Scanning-Tunneling-Microscopy Wu W, Skala SL, Tucker JR, Lyding JW, Seabaugh A, Beam EA, Jovanovic D
607 - 613	Fourier-Transform Infrared Study of Rapid Thermal Annealing of A-Si-N-H(D) Films Prepared by Remote Plasma-Enhanced Chemical-Vapor-Deposition Lu Z, Santos P, Stevens G, Williams MJ, Lucovsky G
614 - 622	Electrical-Transport Properties of Hot-Electrons at Metal, Insulator, and Semiconductor Interfaces Ludeke R, Bauer A
623 - 628	Epitaxial-Growth of a Metal(CoSi2) Insulator(CaF2) Nanometer-Thick Heterostructure and Its Application to Quantum-Effect Devices Asada M, Watanabe M, Suemasu T, Kohno Y, Saitoh W
629 - 635	Optical Wave-Guides on Silicon Chips Yokoyama S, Nagata T, Kuroda Y, Doi T, Namba T, Miyake K, Miyamoto T, Miyazaki S, Koyanagi M, Hirose M
636 - 641	Si1-xGex/Si Multiple-Quantum Wells on Si(100) and Si(110) for Infrared-Absorption Kreifels TL, Hengehold RL, Yeo YK, Thompson PE, Simons DS
642 - 645	Silicon-Nitride Encapsulation of Sulfide Passivated GaAs/AlGaAs Microdisk Lasers Hobson WS, Ren F, Mohideen U, Slusher RE, Schnoes ML, Pearton SJ
646 - 651	Correlation of Surface-Morphology with Chemical Structures of Sulfur-Passivated GaAs(100) Investigated by Scanning-Tunneling-Microscopy and X-Ray Photoelectron-Spectroscopy Ha JS, Park SJ, Kim SB, Lee EH
652 - 657	Sulfide-Assisted Reordering at the InP Surface and Sinx/InP Interface Kwok RW, Jin G, So BK, Hui KC, Huang L, Lau WM, Hsu CC, Landheer D
658 - 661	Sputter-Deposition of Yttria-Stabilized Zirconia Onto a Porous Au Substrate Jankowski AF, Hayes JP
662 - 665	Sb Ion-Implantation and Annealing of Sigec Heteroepitaxial Layers on Si(001) Garcia R, Daley KE, Sego S, Culbertson RJ, Poker DB
666 - 671	Zincblende-CdSe on GaSb(110) - Characterization of Epitaxial-Growth and Electronic-Structure Neuhold G, Horn K, Magnusson KO, Evans DA
672 - 675	Effect of Substrate Pretreatment on Growth of GaN on (0001)Sapphire by Low-Pressure Metalorganic Chemical-Vapor-Deposition Hwang CY, Schurman MJ, Mayo WE, Li Y, Lu Y, Liu H, Salagaj T, Stall RA
676 - 680	Conformality of SiO2-Films from Tetraethoxysilane-Sourced Remote Microwave Plasma-Enhanced Chemical-Vapor-Deposition Raupp GB, Levedakis DA, Cale TS
681 - 682	Molecular-Beam Epitaxy Growth and Characterizations of (Zn, Mg)(S,Se) Epilayers for II-VI Blue-Green Laser-Diodes Grillo DC, Ringle MD, Hua GC, Han J, Gunshor RL, Nurmikko AV
683 - 689	Molecular-Beam Epitaxial-Growth of Znmgsse and Its Application to Blue and Green Laser-Diodes Ikeda M, Ishibashi A, Mori Y
690 - 695	Deep Levels Near Buried ZnSe/GaAs(100) Heterointerfaces Raisanen A, Brillson LJ, Vanzetti L, Sorba L, Franciosi A
696 - 704	Heteroepitaxy of Lattice-Matched Compound Semiconductors on Silicon Bachmann KJ, Dietz N, Miller AE, Venables D, Kelliher JT
705 - 710	Ingan/Algan Blue-Light-Emitting Diodes Nakamura S
711 - 715	Deposition of AlN at Lower Temperatures by Atmospheric Metalorganic Chemical-Vapor-Deposition Using Dimethylethylamine Alane and Ammonia Kidder JN, Kuo JS, Ludviksson A, Pearsall TP, Rogers JW, Grant JM, Allen LR, Hsu ST
716 - 718	Growth of InxGa1-Xn and Inxal1-Xn on GaAs Metalorganic Molecular-Beam Epitaxy Abernathy CR, Mackenzie JD, Bharatan SR, Jones KS, Pearton SJ
719 - 723	Outdiffusion of Deuterium from GaN, AlN, and Inn Wilson RG, Pearton SJ, Abernathy CR, Zavada JM
724 - 726	Magnetron Reactive Ion Etching of AlN and Inn in BCl3 Plasmas Mclane GF, Casas L, Lareau RT, Eckart DW, Vartuli CB, Pearton SJ, Abernathy CR
727 - 732	Ellipsometry for III-V Epitaxial-Growth Diagnostics Maracas GN, Kuo CH, Anand S, Droopad R, Sohie GR, Levola T
733 - 739	Real-Time Monitoring of Resonant-Tunneling Diode Growth Using Spectroscopic Ellipsometry Celii FG, Kao YC, Katz AJ, Moise TS
740 - 744	Real-Time Spectroscopic Ellipsometry Monitoring of Si1-xGex/Si Epitaxial-Growth Pickering C, Hope DA, Carline RT, Robbins DJ
745 - 749	Observation of Surface Symmetry for Si/Xef2 and Si/Cl-2 System Using 2nd-Harmonic Generation Haraichi S, Sasaki F, Kobayashi S, Komuro M, Tani T
750 - 752	Effect of Hydrogen Annealing on 2nd-Harmonic Generation from SiO2/Si(111) Interfaces Hirayama H, Ito F, Watanabe K
753 - 757	Nanoscale Structures in III-V Semiconductors Using Sidewall Masking and High Ion Density Dry-Etching Ren F, Pearton SJ, Abernathy CR, Lothian JR
758 - 762	Low-Resistivity Ohmic Contacts to Moderately Doped N-GaAs with Low-Temperature Processing Lovejoy ML, Howard AJ, Zavadil KR, Rieger DJ, Shul RJ, Barnes PA
763 - 766	Sensor for Measuring the Atomic Fraction in Highly Dissociated Hydrogen Gardner WL
767 - 771	Oxidation and 6H-SiC-SiO2 Interfaces Hornetz B, Michel HJ, Halbritter J
772 - 776	Evolution of Atomic-Scale Roughening on Si(001)-(2X1) Surfaces Resulting from High-Temperature Oxidation Seiple JV, Pelz JP
777 - 781	Atomically Resolved Scanning-Tunneling-Microscopy Study of the Adsorption and Dissociation of Methylchloride on Si(001) Bronikowski MJ, Hamers RJ
782 - 786	Roughness in Si1-xGex/Si Superlattices - Growth Temperature-Dependence Headrick RL, Baribeau JM
787 - 791	Buffer Layer-Modulation-Doped Field-Effect-Transistor Interactions Al0.33Ga0.67As/GaAs Superlattice System Pellegrino JG, Richter CA, Dura JA, Amirtharaj PM, Qadri SB, Roughani B
792 - 796	Interfacial Properties of Metal-Insulator-Semiconductor Capacitors on GaAs(110) Huang LJ, Rajesh K, Lau WM, Ingrey S, Landheer D, Noel JP, Lu ZH
797 - 800	The Correlation Between Selective Oxide Etching and Thermodynamic Prediction Mcnevin SC
801 - 809	High-Rate and Highly Selective SiO2 Etching Employing Inductively-Coupled Plasma and Discussion on Reaction-Kinetics Horiike Y, Kubota K, Shindo H, Fukasawa T
810 - 814	Tungsten Etching Using an Electron-Cyclotron-Resonance Plasma Maruyama T, Fujiwara N, Shiozawa K, Yoneda M
815 - 819	Application of Electron-Cyclotron-Resonance Plasma Source to Conductive Film Deposition Shimada M, One T, Nishimura H, Matsuo S
820 - 825	Plasma-Enhanced Chemical-Vapor-Deposition of Silicon, Germanium, and Tin Nitride Thin-Films from Metalorganic Precursors Hoffman DM, Rangarajan P, Athavale SD, Economou DJ, Liu JR, Zheng ZS, Chu WK
826 - 830	Analysis of the Oxygen Contamination Present in Sinx Films Deposited by Electron-Cyclotron-Resonance Garcia S, Martin JM, Fernandez M, Martil I, Gonzalezdiaz G
831 - 833	Synergistic Sputtering Effects During Ion-Bombardment with 2 Ion Species Berg S, Katardjiev IV
834 - 838	High-Aspect-Ratio Si Etching for Microsensor Fabrication Juan WH, Pang SW
839 - 842	Composition of the Oxygen Plasmas from 2 Inductively-Coupled Sources Tuszewski M, Scheuer JT, Tobin JA
843 - 848	Radio-Frequency Hollow-Cathode Discharge for Large-Area Double-Sided Foil Processing Korzec D, Schott M, Engemann J
849 - 852	High-Density, Low-Temperature Dry-Etching in GaAs and InP Device Technology Pearton SJ, Abernathy CR, Ren F
853 - 858	Substrate Bias Effects in High-Aspect-Ratio SiO2 Contact Etching Using an Inductively-Coupled Plasma Reactor Westerheim AC, Labun AH, Dubash JH, Arnold JC, Sawin HH, Yuwang V
859 - 864	The Effect of the Presheath on the Ion Angular-Distribution at the Wafer Surface Zheng J, Brinkmann RP, Mcvittie JP
865 - 870	Ponderomotive Effects in Helicon Plasmas Brown RD, Gilland JH, Hershkowitz N, Breun RA
871 - 874	Large-Area Radio-Frequency Plasma for Microelectronics Processing Yu Z, Shaw D, Gonzales P, Collins GJ
875 - 882	Large-Volume Electron-Cyclotron-Resonance Plasma Generation by Use of the Slotted Antenna Microwave Source Engemann J, Schott M, Werner F, Korzec D
883 - 886	Performance and Modeling of a Permanent-Magnet Electron-Cyclotron-Resonance Plasma Source Saproo A, Mantei TD
887 - 893	Diagnostics and Control of Radicals in an Inductively-Coupled Etching Reactor Sugai H, Nakamura K, Hikosaka Y, Nakamura M
894 - 899	Monitoring InP and GaAs Etched in Cl-2/Ar Using Optical-Emission Spectroscopy and Mass-Spectrometry Thomas S, Ko KK, Pang SW
900 - 904	Effect of Plasma Overetch of Polysilicon on Gate Oxide Damage Gabriel CT, Mcvittie JP
905 - 911	Plasma-Induced Gate-Oxide Charging Issues for Sub-0.5 Mu-M Complementary Metal-Oxide-Semiconductor Technologies Stamper AK, Lasky JB, Adkisson JW
912 - 917	Plasma-Induced Damage of GaAs During Etching of Refractory-Metal Contacts Shul RJ, Lovejoy ML, Baca AG, Zolper JC, Rieger DJ, Hafich MJ, Corless RF, Vartuli CB
918 - 926	Spatiotemporal Powder Formation and Trapping in Radio-Frequency Silane Plasmas Using 2-Dimensional Polarization-Sensitive Laser Scattering Dorier JL, Hollenstein C, Howling AA
927 - 930	Dynamics of Particulates in the Afterglow of a Radio-Frequency Excited Plasma Yeon CK, Kim JH, Whang KW
931 - 934	Reactive Ion Etching-Induced Damage in GaAs/AlGaAs Quantum-Well Structures and Recovery by Rapid Thermal Annealing and Hydrogen Passivation Yoo BS, Park SJ, Park KH
935 - 942	Ion and Neutral Argon Temperatures in Electron-Cyclotron-Resonance Plasmas by Doppler-Broadened Emission-Spectroscopy Tsu DV, Young RT, Ovshinsky SR, Klepper CC, Berry LA
943 - 947	Identification of Plasma-Induced Failure Modes in the Development of a Bipolar-Complementary Metal-Oxide-Semiconductor Process Hackenberg JJ, Dion MJ, Hemmenway DF, Pearce LG, Werner JW
948 - 951	Preparation of Germanium Doped Plasma-Polymerized Coatings as Inertial Confinement Fusion Target Ablators Brusasco R, Saculla M, Cook R
952 - 958	Development of Neutral-Beam-Assisted Etcher Yunogami T, Yokogawa K, Mizutani T
959 - 965	Hyperthermal Neutral Beam Etching Giapis KP, Moore TA, Minton TK
966 - 971	Molecular-Dynamics Simulation of Atomic Layer Etching of Silicon Athavale SD, Economou DJ
972 - 978	Defect Production and Recombination During Low-Energy Ion Processing Kellerman BK, Floro JA, Chason E, Brice DK, Picraux ST, White JM
979 - 982	Precision Shell Characterization Using Radial Averaging of X-Ray Images Stephens RB
983 - 989	The Design, Performance, and Application of an Atomic-Force Microscope-Based Profilometer Mceachern RL, Moore CE, Wallace RJ
990 - 995	Thin-Film Sensors for Automobiles Taga Y
996 - 1000	Increasing the Selectivity of Commercially Available Tin Oxide-Based Gas Sensors for Monitoring Combustible Gases in-Process Environments Hawk RM, Narayanaswamy A
A61 - A61	Papers from the 41St National Symposium of the American-Vacuum-Society .1. Preface Lucovsky G
1001 - 1007	Piezoelectric Tactile Integrated-Circuit Sensor Kolesar ES, Dyson CS
1008 - 1012	Composition and Morphology of a MgF2/Al Multilayer Thin-Film Reflective Coating Weimer JJ, Kim J, Zukic M, Torr DG
1013 - 1016	Production and Characterization of Multilayer KCl-LiF Thin-Films on Glass Somma F, Ercoli A, Santucci S, Lozzi L, Passacantando M, Picozzi P
1017 - 1021	Smart Thin-Film TiNi Piezoelectric Heterostructures Mercado PG, Jardine AP
1022 - 1026	Microstructures of Sputtered PbTiO3 Thin-Films Satoh T, Wasa K, Tabata K, Adachi H, Ichikawa Y, Setsune K
1027 - 1031	A Novel Technique for Characterizing the Surface Coverage of Thin-Film Chemical-Vapor-Deposition in Ultra-High-Aspect-Ratio Microstructures Soave RJ, Tasker GW, Then AM, Mayer JW, Shachamdiamand Y
1032 - 1035	Fabrication of Thin-Films with Highly Porous Microstructures Robbie K, Friedrich LJ, Dew SK, Smy T, Brett MJ
1036 - 1039	Heteroepitaxial Growth of C-70 Films on MoS2(0001) and Their Characterization by Low-Energy-Electron Diffraction and Photoelectron-Spectroscopy Han BY, Hevesi K, Yu LM, Gensterblum G, Pireaux JJ, Thiry PA, Caudano R
1040 - 1043	Magnetic, Microstructural, and Compositional Characterization of Fe-N Thin-Films for Recording Sensor Applications Kim YK, Narayan PB
1044 - 1047	Positron-Annihilation Studies of Diamond-Like Nanocomposite Films Asokakumar P, Dorfman BF, Abraizov MG, Yan D, Pollak FH
1048 - 1052	Calculation of the Figure of Merit for Indium Tin Oxide-Films Based on Basic Theory Knickerbocker SA, Kulkarni AK
1053 - 1057	Low-Temperature Formation of Textured ZnO Transparent Electrodes by Magnetron Sputtering Minami T, Sonohara H, Takata S, Fukuda I
1058 - 1062	Vacuum Conditions for Sputtering Thin-Film TiNi Jardine AP
1063 - 1066	Ionized Magnetron Sputter-Deposition of Amorphous-Carbon Nitride Thin-Films Li D, Lopez S, Chung YW, Wong MS, Sproul WD
1067 - 1072	Residual-Stress in Metal-Ion Implanted Titanium Nitride Films Studied by Glancing Incidence X-Ray-Diffraction Perry AJ, Treglio JR, Valvoda V, Rafaja D
1073 - 1077	Sputter-Deposition of Cermet Fuel Electrodes for Solid Oxide Fuel-Cells Tsai T, Barnett SA
1078 - 1082	Morphology of Precursors and Cuin1-Xgaxse2 Thin-Films Prepared by a 2-Stage Selenization Process Dhere NG, Kuttath S, Moutinho HR
1083 - 1087	Growth of Chalcopyrite Cu(in,Ga)Se-2/Cuin3Se5 Absorbers by Radio-Frequency Sputtering Hernandezrojas JL, Martil I, Santamaria J, Gonzalezdiaz G, Sanchezquesada F
1088 - 1094	Attaining a Solar-Energy Economy with Active Thin-Film Structures Goldner RB
1095 - 1099	Properties of Transparent Zinc-Stannate Conducting Films Prepared by Radio-Frequency Magnetron Sputtering Minami T, Takata S, Sato H, Sonohara H
1100 - 1103	Oxygen-Content of Indium Tin Oxide-Films Fabricated by Reactive Sputtering Honda S, Tsujimoto A, Watamori M, Oura K
1104 - 1110	Structure and Composition of Hydrogenated Tixcy Thin-Films Prepared by Reactive Sputtering Delplancke MP, Vassileris V, Winand R
1111 - 1115	Synchrotron-Radiation Photoelectron Emission Microscopy of Chemical-Vapor-Deposited Diamond Electron Emitters Shovlin JD, Kordesch ME, Dunham D, Tonner BP, Engel W
1116 - 1120	Surface Spectroscopic Studies of the Deposition of Tin Thin-Films from Tetrakis-(Dimethylamido)-Titanium and Ammonia Corneille JS, Chen PJ, Truong CM, Oh WS, Goodman DW
1121 - 1127	Characterization of Aluminum-Based Oxide Layers Formed by Microwave Plasma Katztsameret Z, Raveh A
1128 - 1132	Investigation of Pyroelectric Characteristics of Lead Titanate Thin-Films for Microsensor Applications Deb KK, Bennett KW, Brody PS
1133 - 1135	Resi2 Thin-Film Infrared Detectors Becker JP, Mahan JE, Long RG
1136 - 1144	Surface-Analysis at Low to Ultrahigh-Vacuum by Ion-Scattering and Direct Recoil Spectroscopy Hammond MS, Schultz JA, Krauss AR
1145 - 1149	Spectroscopic Ellipsometry of Thin-Films on Transparent Substrates - A Formalism for Data Interpretation Yang YH, Abelson JR
1150 - 1154	Optical-Emission Spectroscopy of H-2-Co and H2O-CH3OH Plasmas for Diamond Growth Manukonda R, Dillon R, Furtak T
1155 - 1159	Effect of 20-95 eV Ar Ion-Bombardment of GaAs(001) - In Pursuit of Damage-Free Ion-Assisted Growth and Etching Millunchick JM, Hultman L, Barnett SA
1160 - 1164	A Molecular-Dynamics Study of Transient Processes During Deposition on (001) Metal-Surfaces Gilmore CM, Sprague JA
1165 - 1170	Annealing Study of Gold-Films Using Scanning-Tunneling-Microscopy Porath D, Barsadeh E, Wolovelsky M, Grayevsky A, Goldstein Y, Millo O
1171 - 1174	Role of Temporal Delay in Dual-Laser Ablated Plumes Witanachchi S, Mukherjee P
1175 - 1181	Large-Area Pulsed-Laser Deposition - Techniques and Applications Greer JA, Tabat MD
1182 - 1187	Film Deposition and Surface Modification Using Intense Pulsed Ion-Beams Meli CA, Grabowski KS, Hinshelwood DD, Stephanakis SJ, Rej DJ, Waganaar WJ
1188 - 1191	Reactive Direct-Current Magnetron Sputtering of Aluminum-Oxide Coatings Sproul WD, Graham ME, Wong MS, Lopez S, Li D, Scholl RA
1192 - 1195	Simultaneous Deposition and Lamination Process in Vacuum Freeland AW, Germundson JR, Swisher RL, Barnes KP, Phipps JA, Wan CT
1196 - 1201	Thermomechanical and Chemical-Properties of SiC-C Functionally Gradient Coatings on Graphite Richards MR, Richards AC, Taya M, Ohuchi FS
1202 - 1207	Plasma-Based Surface Engineering Processes for Wear and Corrosion Protection Matthews A, Leyland A, Dorn B, Stevenson PR, Binsudin M, Rebholz C, Voevodin A, Schneider J
1208 - 1212	A Vacuum Technology for Coating Ticn-Based Cermets Konyashin IY
1217 - 1223	Surface Trimer Crystallization on Poly(Ethylene-Terephthalate) Studied by Time-of-Flight Secondary-Ion Mass-Spectrometry Reichlmaier S, Bryan SR, Briggs D
1224 - 1228	Scanning Photoelectron Microscope Ninomiya K, Hasegawa M
1229 - 1233	Scanning Auger Microscopy and X-Ray Photoelectron-Spectroscopy Studies of Roman Bronzes Paparazzo E, Moretto L, Northover JP, Damato C, Palmieri A
1234 - 1238	Strain Imaging Analysis of Si Using Raman Microscopy Ajito K, Sukamto JP, Nagahara LA, Hashimoto K, Fujishima A
1239 - 1246	Nature of the Use of Adventitious Carbon as a Binding-Energy Standard Barr TL, Seal S
1247 - 1253	Oxidation of Gold by Ultraviolet-Light and Ozone at 25-Degrees-C King DE
1254 - 1259	X-Ray Photoelectron and Infrared Spectroscopies of Cu-Implanted Silica and Borosilicate Glasses Henderson DO, George MA, Tung YS, Burger A, Morgan SH, Collins WE, White CW, Zuhr RA, Magruder RH
1260 - 1266	Investigations of the Surface-Chemistry of Pathogenic Silicates Seal S, Krezoski S, Hardcastle SE, Barr TL, Petering DH, Cheng CF, Klinowski J, Evans PH
1267 - 1274	Depth Profiling Free Carbon in Silicon-Carbide Paulson TE, Bojan VJ, Wichterman BM, Pantano CG
1275 - 1280	Metal Overlayers on Organic Functional-Groups of Self-Organized Molecular Assemblies .5. Ion-Scattering Spectroscopy and X-Ray Photoelectron-Spectroscopy of Ag/COOH Interfaces Herdt GC, Czanderna AW
1281 - 1285	Comparative-Analysis of Trimethylmethoxysilane and Trimethylchlorosilane Bonding on Polished Copper Surfaces Mishra S, Weimer JJ
1286 - 1289	Counterion and Dopant-Induced Effects on the Structure of Electropolymerized Polyaniline Thin-Films Porter TL, Minore D, Sykes AG
1290 - 1292	Thickness Determination of Uniform Overlayers on Rough Substrates - A Comparison of Calculations for Al2O3/Al to X-Ray Photoelectron-Spectroscopy and Atomic-Force Microscopy Experiments on Technical Aluminum Foils Gunter PL, Niemantsverdriet JW
1293 - 1298	Quantitative Depth Profiling of Oxygen in Homoepitaxial SrTiO3 Films Watamori M, Oura K, Nakamura T
1299 - 1303	An X-Ray Photoelectron Spectroscopic Study of Voltage Bias Implantation and Nitrogen Etching of Aluminum Rooke MA, Rotole JA, Sherwood PM
1304 - 1309	Inelastic Mean Free Pathlengths of Electrons for Quantitative Investigations of Ultrathin Technological Surface-Layers by Angle-Resolved X-Ray Photoelectron Spectrometry Gries WH
1310 - 1315	Simultaneous Dual-Element Analyses of Refractory-Metals in Naturally-Occurring Matrices Using Resonance Ionization of Sputtered Atoms Calaway WF, Wiens RC, Burnett DS, Pellin MJ, Gruen DM
1316 - 1320	Resolution in Sputter Depth Profiling Assessed by AlAs/GaAs Superlattices Kajiwara K, Shimizu R
1321 - 1324	The Effect of Tilt Angle on as Implants in Si Anthony JM, Keenan JA
1325 - 1330	Nondestructive and Quantitative Depth Profiling Analysis of Ion-Bombarded Ta2O5 Surfaces by Medium-Energy Ion-Scattering Spectroscopy Lee JC, Chung CS, Kang HJ, Kim YP, Kim HK, Moon DW
1331 - 1336	Probing the Different Phases of Self-Assembled Monolayers on Metal-Surfaces - Temperature-Dependence of the C-H Stretching Modes Bensebaa F, Ellis TH, Badia A, Lennox RB
1337 - 1344	Metal Overlayers on Organic Functional-Groups of Self-Assembled Monolayers .6. X-Ray Photoelectron-Spectroscopy of Cr/COOH on 16-Mercaptohexadecanoic Acid Jung DR, Czanderna AW
1345 - 1350	Adsorption of Perfluorinated N-Alkanoic Acids on Native Aluminum-Oxide Surfaces Wallace RM, Chen PJ, Henck SA, Webb DA
1351 - 1358	Probing the Interfacial Properties of Poly(Vinyl Acetate-Ethylene) Copolymer/Poly(Vinyl Chloride) Laminations by Time-of-Flight Secondary-Ion Mass-Spectrometry Clark PA, Gardner SA, Horwat D
1359 - 1367	Surface-Chemistry at Metallic Step Defect Sites Yates JT
1368 - 1372	Surface-Chemistry of 1,1-Dimethylhydrazine on Platinum Schwaner AL, Kovar M, Alberas DJ, White JM
1373 - 1377	Simulation and Sensitivity Analysis of the Heterogeneous Oxidation of Methane on a Platinum Foil Behrendt F, Deutschmann O, Maas U, Warnatz J
1378 - 1381	Surface Relaxation of PbTe(100) Lazarides AA, Duke CB, Paton A, Kahn A
1382 - 1388	High-Resolution Photoemission and Auger Parameter Studies of Electronic-Structure of Tin Oxides Kover L, Moretti G, Kovacs Z, Sanjines R, Csemy I, Margaritondo G, Palinkas J, Adachi H
1389 - 1395	Modification of Overlayer Growth-Kinetics by Surface Interlayers - The Si(111)Root-7X-Root-3-Indium Surface Surnev SL, Kraft J, Netzer FP
1396 - 1399	Surface Reaction-Diffusion Fronts Observed with Photoelectron Emission Microscopy During Carbon Deposition on Mo(310) Garcia A, Kordesch ME
1400 - 1404	Multibounce Direct Scattering of N-2 from Cu(110) - Experiment and Trajectory Simulations Siders JL, Sitz GO
1405 - 1408	Role of C in O Removal from Ultrathin Layers of Oxidized La on Pd(100) Graham GW, Rao BU, Ahmad M
1409 - 1412	The Early Stages of Ruthenium Oxidation Hrbek J, Vancampen DG, Malik IJ
1413 - 1415	Disorder Effects at the Al(110) Surface Schommers W, Mayer C, Gobel H, Vonblanckenhagen P
1416 - 1420	Scattering of He-3 from the NiO(001) Surface Bishop GG, Baker J, Gillman ES, Hernandez JJ, Safron SA, Skofronick JG
1421 - 1425	Resonant Neutralization of Li-7(+) Scattered from Cs/Al(100) as a Probe of the Local Electrostatic Potential Weare CB, Yarmoff JA
1426 - 1430	Effect of Preadsorbed Oxygen on the Direct Dissociative Chemisorption of Ethane on Ir(110) Kelly D, Hago W, Weinberg WH
1431 - 1437	Boron-Induced Reconstructions of Si(001) Investigated by Scanning-Tunneling-Microscopy Wang YJ, Hamers RJ
1438 - 1442	Scanning-Tunneling-Microscopy Observation of Hydrogen-Induced Ag Cluster Formation on the Si(111) Surfaces Ohnishi H, Yamamoto Y, Oura K, Katayama I, Ohba Y
1443 - 1447	Initial Growth of Ultrathin Pd Films on Cu(001) Yao J, Shen YG, Oconnor DJ, King BV
1448 - 1454	Surface-Chemistry of Carbon Tetrabromide on GaAs(100) Mcellistrem M, White JM
1455 - 1460	Surface-Chemistry of 1,1-Dimethylhydrazine on GaAs(100) Sun YM, Sloan DW, Mcellistrem M, Schwaner AL, White JM
1461 - 1468	Surface-Chemistry of Diethylsilane and Diethylgermane on Ge(100) Mahajan A, Kellerman BK, Heitzinger JM, Banerjee S, Tasch A, White JM, Ekerdt JG
1469 - 1472	A Scanning-Tunneling-Microscopy Study of Hydrogen Adsorption on Si(112) Baski AA, Whitman LJ
1473 - 1477	Surface-Morphology Induced by Ga and Sn Overlayers on Si(100) and Si(311) Surfaces Li L, Wei Y, Tsong IS
1478 - 1483	Structural Study of the Growth of Thin Cu Films on Ru(0001) by Low-Energy Alkali Ion-Scattering Shen YG, Oconnor DJ, Yao J, Vanzee H, Roberts RH, Macdonald RJ, Wandelt K
1484 - 1488	Faceting of the Mo(111) Surface by Ultrathin Pd and Pt Films Guan J, Campbell RA, Madey TE
1489 - 1492	Auger-Electron Diffraction Pattern from MgO(001) Obtained at High Angular Resolution Ichinohe Y, Ishii H, Owari M, Nihei Y
1493 - 1496	Structural Surface Phase-Transitions During Segregation Competition Militzer M, Hofmann S
1497 - 1500	Effect of Substrate Symmetry on the Preferred Magnetization Orientation of Ni Films on Cu Wu SZ, Mankey GJ, Willis RF
1501 - 1505	Bulk Fermi-Surface Determination by Tuning the Photoelectron Kinetic-Energy Avila J, Casado C, Asensio MC, Perez JL, Munoz MC, Soria F
1506 - 1510	Hot Scanning Tunneling Microscope Study of B-Type Step Edges and Small Silicon Islands on Si(001) Pearson C, Krueger M, Curtis R, Borovsky B, Shi X, Ganz E
1511 - 1516	CO2 Sticking on Pt(111) - The Role of Kinetic-Energy and Internal Degrees of Freedom Kulginov D, Persson M, Akerlund C, Zoric I, Kasemo B
1517 - 1521	Probing Reactive Deposition and Surface Dynamics Using in-Situ Real-Time Emission Microscopy Kordesch ME
1522 - 1526	Using Scanning-Tunneling-Microscopy to Understand Diffraction Oscillations - Fe Growth on Cu(100) Chambliss DD, Johnson KE
1527 - 1530	Spin-Dependent S-Level and Valence Photoemission from Ferromagnetic Nickel See AK, Klebanoff LE
1531 - 1533	Magnetic-Properties of Pseudomorphic Ferromagnetic Alloy-Films on Cu(100) Mankey GJ, Wu SZ, Schumann FO, Huang F, Kief MT, Willis RF
1534 - 1538	Spin-Specific Photoelectron Diffraction, Photoelectron-Spectroscopy, and Absorption Using Magnetic-X-Ray Circular-Dichroism Tobin JG, Waddill GD, Pappas DP, Tamura E, Sterne PA, Guo X, Tong SY
1539 - 1543	Evidence for Structure Sensitivity in the High-Pressure Co+no Reaction over Pd(111) and Pd(100) Vesecky SM, Chen PJ, Xu XP, Goodman DW
1544 - 1548	Magnetic and Structural-Properties of Ultrathin Mn and Fe Films on Ir(111) Obrien WL, Tonner BP
1549 - 1552	Resonant Photoemission-Studies of the Thickness Dependence of the Unoccupied Gd 5D Bands Dowben PA, Li DQ, Zhang JD, Onellion M
1553 - 1558	Nanosphere Lithography - A Materials General Fabrication Process for Periodic Particle Array Surfaces Hulteen JC, Vanduyne RP
1559 - 1563	Coadsorption of Alkalis and Hydrogen on W(100) Hago W, Estrup PJ
1564 - 1568	Thermal-Desorption Studies of High-Coverage Hydrogen Overlayers on Ru(001) Created with Gas-Phase Atomic-Hydrogen Jachimowski TA, Meng B, Johnson DF, Weinberg WH
1569 - 1573	Adsorption of Sulfur on Bimetallic Surfaces - Formation of Copper Sulfides on Pt(111) and Ru(001) Kuhn M, Rodriguez JA
1574 - 1578	Inelastic Electron-Scattering Study of Metallic Oxidation - Synergistic Effects Involving Electrons During the Low-Temperature Oxidation of Ni(111) Li W, Stirniman MJ, Sibener SJ
1579 - 1582	Infrared-Spectroscopy of Formate on Oxygen-Predosed Cu(100) - Broad-Band Reflectance and Low-Frequency Vibrations Lin KC, Tobin RG, Dumas P
1583 - 1588	Br/Si(211)2X1 Structure Investigated by X-Ray Standing-Wave Etelaniemi V, Michel EG, Materlik G
1589 - 1594	Transition-Metal Induced Ring-Cluster Structures on Si(111) Parikh SA, Lee MY, Bennett PA
1595 - 1599	Core-Level Shifts in Trimetallic Systems Rainer DR, Corneille JS, Goodman DW
1600 - 1605	Spectroscopic Characterization of Thin Vanadium Carbide Films on a Vanadium(110) Surface - Formation, Stability, and Reactivities Chen JG, Devries BD, Fruhberger B, Kim CM, Liu ZM
1606 - 1608	Electronic-Transitions and Excitations in Solid C-70 Studied by Reflection Electron-Energy-Loss Spectroscopy Han BY, Hevesi K, Yu LM, Gensterblum G, Rudolf P, Pireaux JJ, Thiry PA, Caudano R
1609 - 1612	Surface-Morphology of Si(111)-(7X7) Under an External Isotropic Tensile-Stress Wei Y, Li L, Tsong IS
1613 - 1616	Structure and Adatom Thermal Vibrational Amplitude for the 2X2 Ga/Si (001) Surface Qian YL, Bedzyk MJ
1617 - 1618	Low-Temperature Diamond Growth in a Pulsed Microwave Plasma Ring Z, Mantei TD, Thali S, Jackson HE
1619 - 1623	Effect of the Substrate State on the Formation of Diamond Film in a Low-Temperature Microwave-Plasma-Enhanced Chemical-Vapor-Deposition System Kim SH, Park YS, Jung SK, Kang DH, Lee JW
1624 - 1627	Diamond Deposition on Carbon-Fibers Shah SI, Waite MM
1628 - 1632	Carbon Dimer, C-2 as a Growth Species for Diamond Films from Methane/Hydrogen/Argon Microwave Plasmas Gruen DM, Zuiker CD, Krauss AR, Pan XZ
1633 - 1638	Auger-Electron Spectroscopy X-Ray Photoelectron-Spectroscopy Study of Ti-B-N Thin-Films Baker MA, Steiner A, Haupt J, Gissler W
1639 - 1643	Physical-Properties of Thin Carbon Nitride Films Deposited by Electron-Cyclotron-Resonance Assisted Vapor-Deposition Bousetta A, Lu M, Bensaoula A
1644 - 1648	Thermal-Behavior of Carbon Nitride and Tin/NbN Superlattice Films Lopez S, Wong MS, Sproul WD
1649 - 1657	Energetic Condensation - Processes, Properties, and Products Colligon JS
1658 - 1664	Deposition and Modification of Titanium Nitride by Ion-Assisted Are Deposition Bendavid A, Martin PJ, Wang X, Wittling M, Kinder TJ
1665 - 1670	Very High-Quality Thin Gate Oxide Formation Technology Ohmi T
1671 - 1675	Nitrogen-Atom Incorporation at Si-SiO2 Interfaces by a Low-Temperature (300-Degrees-C), Pre-Deposition, Remote-Plasma Oxidation Using N2O Lee DR, Lucovsky G
1676 - 1680	Thermal Effects on GaAs(001) Surface Prepared by Deoxygenated and Deionized Water-Treatment Hirota Y, Ogino T, Watanabe Y, Oshima M
1681 - 1686	Evidence of Specific and Nonspecific Adsorption of Perchlorate (ClO4) on Silver(110) Krasnopoler A, Stuve EM
1687 - 1692	Photoemission, and Thermal-Desorption Studies of the Interaction of Water-Vapor with Ni-3(Al,Ti)(100) and Ni-3(Al,Ti)(111) Surfaces Chia WJ, Chung YW
1693 - 1698	Tunnel Channels, Charge-Transfer, and Imaging Mechanisms in Scanning-Tunneling-Microscopy Repphun G, Halbritter J
1699 - 1704	Lateral and Vertical Dopant Profiling in Semiconductors by Atomic-Force Microscopy Using Conducting Tips Dewolf P, Snauwaert J, Hellemans L, Clarysse T, Vandervorst W, Dolieslaeger M, Quaeyhaegens D
1705 - 1708	Delineation of PN Junctions by Scanning-Tunneling-Microscopy Spectroscopy in Air and Ultrahigh-Vacuum Silver RM, Dagata JA, Tseng W
1709 - 1713	Soft-X-Ray Photoelectron-Spectroscopy Study of the Reaction of Xef2 with GaAs Simpson WC, Varekamp PR, Shuh DK, Yarmoff JA
1714 - 1718	Temperature-Dependent Vacancy Concentrations on InP(110) Surfaces Heinrich M, Ebert P, Simon M, Urban K, Lagally MG
1719 - 1727	Characterization of Silicon Surfaces and Interfaces by Optical Vibrational Spectroscopy Chabal YJ, Hines MA, Feijoo D
1728 - 1732	Surface Phase-Transformations in the Ni/Si(111) System Observed in Real-Time Using Low-Energy-Electron Microscopy Bennett PA, Lee MY, Parikh SA, Wurm K, Phaneuf RJ
1733 - 1736	Imaging an F-Actin Structure with Noncontact Scanning Force Microscopy Braunstein D
1737 - 1741	Scanning-Tunneling-Microscopy Modification of Purple Membranes Tamayo J, Saenz JJ, Garcia R
1742 - 1745	Force Modulation Imaging of Protein Membranes Yamada H, Hirata Y, Miyake J
1746 - 1751	Scanning Probe Visualization of Electrostatically Immobilized Intercalating Drug-Nucleic Acid Complexes Coury JE, Mcfailisom L, Presnell S, Williams LD, Bottomley LA
1752 - 1754	Deposition on Mica and Scanning Force Microscopy Imaging of DNA-Molecules Whose Original B-Structure Is Retained Muzzalupo I, Nigro C, Zuccheri G, Samori B, Quagliariello C, Buttinelli M
1755 - 1760	Fabrication and Characterization of a Nanosensor for Admittance Spectroscopy of Biomolecules Montelius L, Tegenfeldt JO, Ling TG
1761 - 1767	Molecular-Beam Epitaxy Growth of Thin-Films of Sns2 and Snse2 on Cleaved Mica and the Basal Planes of Single-Crystal Layered Semiconductors - Reflection High-Energy Electron-Diffraction, Low-Energy-Electron Diffraction, Photoemission, and Scanning-Tunneling-Microscopy Atomic-Force Microscopy Characterization Schlaf R, Louder D, Lang O, Pettenkofer C, Jaegermann W, Nebesny KW, Lee PA, Parkinson BA, Armstrong NR
1768 - 1775	Growth of Layered Semiconductors by Molecular-Beam Epitaxy - Formation and Characterization of GaSe, Mose2, and Phthalocyanine Ultrathin Films on Sulfur-Passivated Gap(111) Hammond C, Back A, Lawrence M, Nebesny K, Lee P, Schlaf R, Armstrong NR
1776 - 1786	Top 10 List of User-Hostile Interface Design - The 10 Most Frequent Mistakes Made in Human-Computer Interface Design Miller DP
1787 - 1791	Adaptive Extensions to a Multibranch Run-to-Run Controller for Plasma-Etching Moyne JR, Chaudhry N, Telfeyan R
1792 - 1796	Real-Time Feedback for Sidewall Profile Control in Reactive Ion Etching Rashap B, Freudenberg J, Elta M
1797 - 1801	Improved Method of Nonintrusive Deposition Rate Monitoring by Atomic-Absorption Spectroscopy for Physical Vapor-Deposition Processes Lu C, Guan Y
1802 - 1807	A Model-Based Technique for Real-Time Estimation of Absolute Fluorine Concentration in a CF4/Ar Plasma Hanish PD, Grizzle JW, Giles MD, Terry FL
1808 - 1813	Directed Growth of Uromyces-Hyphae on Integrated-Circuit Substrates Kozicki MN, Roberson RW, Whidden TK, Kersey SE