Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology A, Vol.13, No.3, 912-917, 1995 DOI10.1116/1.579851 Export Citation Plasma-Induced Damage of GaAs During Etching of Refractory-Metal Contacts Shul RJ, Lovejoy ML, Baca AG, Zolper JC, Rieger DJ, Hafich MJ, Corless RF, Vartuli CB Keywords:TUNGSTEN;DISCHARGES;CH4/H2/AR;CF4 Please enable JavaScript to view the comments powered by Disqus.
