Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology A, Vol.13, No.3, 815-819, 1995 DOI10.1116/1.579833 Export Citation Application of Electron-Cyclotron-Resonance Plasma Source to Conductive Film Deposition Shimada M, One T, Nishimura H, Matsuo S Keywords:MICROWAVE PLASMA;MAGNETIC-FIELD Please enable JavaScript to view the comments powered by Disqus.
