Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology A, Vol.13, No.3, 826-830, 1995 DOI10.1116/1.579835 Export Citation Analysis of the Oxygen Contamination Present in Sinx Films Deposited by Electron-Cyclotron-Resonance Garcia S, Martin JM, Fernandez M, Martil I, Gonzalezdiaz G Keywords:CHEMICAL-VAPOR-DEPOSITION;SILICON-NITRIDE;PLASMA SOURCES;OXYNITRIDE FILMS;THIN-FILMS Please enable JavaScript to view the comments powered by Disqus.
