Journal of Vacuum Science & Technology A, Vol.13, No.3, 711-715, 1995
Deposition of AlN at Lower Temperatures by Atmospheric Metalorganic Chemical-Vapor-Deposition Using Dimethylethylamine Alane and Ammonia
Keywords:ATOMIC LAYER EPITAXY;MOLECULAR-BEAM EPITAXY;NITRIDE THIN-FILMS;ALUMINUM NITRIDE;TRIMETHYLAMINE-ALANE;GROWTH;PRECURSOR;AIN;SPECTROSCOPY;COMPOUND