Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology A, Vol.13, No.3, 596-601, 1995 DOI10.1116/1.579792 Export Citation Plasma-Enhanced Chemical-Vapor-Deposition of TiO2 in Microwave-Radio Frequency Hybrid Plasma Reactor Lee YH, Chan KK, Brady MJ Keywords:THIN-FILMS Please enable JavaScript to view the comments powered by Disqus.
