Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology A, Vol.13, No.3, 905-911, 1995 DOI10.1116/1.579850 Export Citation Plasma-Induced Gate-Oxide Charging Issues for Sub-0.5 Mu-M Complementary Metal-Oxide-Semiconductor Technologies Stamper AK, Lasky JB, Adkisson JW Keywords:THIN OXIDES;DAMAGE Please enable JavaScript to view the comments powered by Disqus.
