225 - 231 |
Fundamental growth kinetics in MOMBE/CBE, MBE and MOVPE Leys MR |
232 - 236 |
Molecular dynamics simulation of III-V compound semiconductor growth with MBE Nakamura M, Fujioka H, Ono K, Takeuchi M, Mitsui T, Oshima M |
237 - 241 |
Growth of novel InP-based materials by He-plasma-assisted epitaxy Pinkney H, Thompson DA, Robinson BJ, Qian L, Benjamin SD, Smith PWE |
242 - 246 |
Preferential group-V replacement at InGaP/GaAs interfaces grown by gas-source MBE Ouchi K, Mishima T |
247 - 251 |
Effect of group-V species exchange at the interfaces of InGaAs/AlAsSb superlattice Georgiev N, Mozume T |
252 - 257 |
Expanded self-limiting growth condition of InP using alternate trimethylindium and tertiarybutylphosphine supply in ultrahigh vacuum Otsuka N, Nishizawa J, Kikuchi H, Oyama Y |
258 - 262 |
Magic numbers in Ga clusters on GaAs (001) surface Tsukamoto S, Koguchi N |
263 - 266 |
In situ etching using a novel precursor of tertiarybutylchloride (TBCl) Kondow M, Shi BQ, Tu CW |
267 - 271 |
Optimum thermal-cleaning condition of GaAs surface with a superior arsenic source: trisdimethylamino-arsine Suemasu T, Sakai M, Hasegawa F |
272 - 278 |
Alternative N-, P- and As-precursors for III/V-epitaxy Stolz W |
279 - 285 |
Dimethyldiselenide and diethyldisulphide as novel Se and S precursors for the low-temperature MOVPE growth of ZnSe, ZnS and ZnSSe Prete P, Lovergine N, Zanotti-Fregonara C, Mancini AM, Smith LM, Rushworth SA |
286 - 289 |
Studies into the carbon doping of GaAs, AlGaAs and AlAs grown by CBE using neopentyl iodide Coward KM, Jones AC, Pemble ME, Joyce TB, Smith LM |
290 - 296 |
In situ optical monitoring for SiGe epitaxy Robbins DJ, Pickering C, Russell J, Carline RT, Dann AW, Marrs AD, Glasper JL |
297 - 301 |
Optical second harmonic generation studies of epitaxial growth of Si and SiGe Tok ES, Woods NJ, Price RW, Taylor AG, Zhang J |
302 - 305 |
Transition from "dome" to "pyramid" shape of self-assembled GeSi islands Vostokov NV, Dolgov IV, Drozdov YN, Krasil'nik ZF, Lobanov DN, Moldavskaya LD, Novikov AV, Postnikov VV, Filatov DO |
306 - 310 |
Probing the silane, disilane and germane adsorption kinetics on the silicon (001) surface Price RW, Tok ES, Zhang J |
311 - 314 |
Growth mode of thin Si1-xGex films on Si (100) monitored by spectroscopic ellipsometry Akazawa H |
315 - 320 |
Observation of sharp current peaks in resonant tunneling diode with strained Si0.6Ge0.4/Si(100) grown by low-temperature low-pressure CVD Han P, Sakuraba M, Jeong YC, Bock K, Matsuura T, Murota J |
321 - 326 |
RHEED and SIMS studies of germanium segregation during growth of SiGe/Si heterostructures; a two-site exchange model with growth rate dependence Tok ES, Woods NJ, Zhang J |
327 - 330 |
Observation and control of surface reaction during Si molecular layer growth Nishizawa J, Murai A, Ohizumi T, Kurabayashi T, Ohtsuka K, Yoshida T |
331 - 334 |
Low-temperature deposition of Si and SiO2 thin-film layers in an ultrahigh vacuum system Ohtsuka K, Yoshida T, Oizumi T, Murai A, Kurabayashi T, Nishizawa J |
335 - 338 |
New approach to low-temperature Si epitaxy by using hot wire cell method Watahiki T, Yamada A, Konagai M |
339 - 344 |
CBE and MOCVD growth of GaInNAs Miyamoto T, Kageyama T, Makino S, Schlenker D, Koyama F, Iga K |
345 - 349 |
Mechanism analysis of improved GaInNAs optical properties through thermal annealing Kitatani T, Nakahara K, Kondow M, Uomi K, Tanaka T |
350 - 354 |
Optical quality of GaNAs and GaInNAs and its dependence on RF cell condition in chemical beam epitaxy Kageyama T, Miyamoto T, Makino S, Koyama F, Iga K |
355 - 363 |
Structure of clean and arsenic-covered GaN(0001) surfaces Ramachandran V, Lee CD, Feenstra RM, Smith AR, Northrup JE, Greve DW |
364 - 367 |
Plasma-assisted molecular beam epitaxy of GaN : In film on sapphire(0001) having the single polarity of (0001) Sonoda S, Shimizu S, Balakrishnan K, Okumura H |
368 - 372 |
Structural characterization of GaN grown by hydrogen-assisted ECR-MBE using electron microscopy Araki T, Chiba Y, Nobata M, Nishioka Y, Nanishi Y |
373 - 377 |
CBE growth of GaN on GaAs(001) and (111)B substrates using monomethylhydrazine Sasaki M, Yonemura S, Nakayama T, Shimoyama N, Suemasu T, Hasegawa F |
378 - 381 |
Epitaxial growth of Eu-doped GaN by gas source molecular beam epitaxy Morishima S, Maruyama T, Akimoto K |
382 - 386 |
High-purity cubic GaN grown on a AlGaAs buffer layer by molecular beam epitaxy Kimura R, Gotoh Y, Matsuzawa T, Takahashi K |
387 - 391 |
Improved properties of polycrystalline GaN grown on silica glass substrate Hiroki M, Asahi H, Tampo H, Asami K, Gonda S |
392 - 395 |
Initial growth monitoring of GaN epitaxy on 6H-SiC by metal-organic molecular beam epitaxy Honda T, Fujita N, Maki K, Yamamoto Y, Kawanishi H |
396 - 400 |
Investigations of optical and electrical properties of In-doped GaN films grown by gas-source molecular beam epitaxy Shen XQ, Ramvall P, Riblet P, Aoyagi Y, Hosi K, Tanaka S, Suemune I |
401 - 405 |
RF MBE growth of quasi-InGaN alloys by using multilayer structure Cho SH, Okumura H |
406 - 409 |
Heteroepitaxial growth of AlN at the resonance point of nitrogen-ECR plasma Inushima T, Ashino T, Murano K, Shiraishi T, Davydov VY, Ohoya S |
410 - 414 |
Comparison of AlN thin films grown on sapphire and cubic-SiC substrates by LP-MOCVD Tanaka Y, Hasebe Y, Inushima T, Sandhu A, Ohoya S |
415 - 418 |
Growth mode of AlN epitaxial layers on 6H-SiC by plasma assisted molecular beam Epitaxy Ferro G, Okumura H, Yoshida S |
419 - 423 |
Structural characterization of Al1-xInxN lattice-matched to GaN Kariya M, Nitta S, Yamaguchi S, Kashima T, Kato H, Amano H, Akasaki I |
424 - 430 |
Comparison of structural and optical properties in strained GaInAsP MQW structures grown by MOVPE and MOMBE Kroner P, Baumeister H, Rieger J, Veuhoff E, Marti O, Heinecke H |
431 - 434 |
The measurement of work function on GaAs (001) surface during MBE growth by scanning electron microscopy Higashino T, Osaka J, Tanahashi K, Kikuchi M, Kawamura Y, Inoue N, Homma Y |
435 - 439 |
Photoluminescence of GaAs grown by metallorganic molecular beam epitaxy in space ultra-vacuum Freundlich A, Horton C, Vilela MF, Sterling M, Ignatiev A, Neu G, Teisseire M |
440 - 444 |
Quasi-persistent photoconductivity of double-heterojunction pseudomorphic high-electron-mobility transistor epitaxial wafers Kizuki H, Kouji Y, Hayafuji N, Kajikawa Y |
445 - 449 |
Photoluminescence characterization of type IIInGaAs/AlAsSb heterostructures lattice matched to InP grown by molecular beam epitaxy Mozume T, Georgiev N, Nishimura T, Yoshida H, Nishikawa S, Neogi A |
450 - 453 |
Structural dependence of intersubband absorption of In0.53Ga0.47As/GaAs0.5Sb0.5 type II quantum well structures lattice-matched to InP Katayama T, Kawamura Y, Takasaki H, Yamamoto A, Inoue N |
454 - 458 |
Electrical and optical characterization of (111) oriented GaP/Si diodes grown by CBE Ohlsson BJ, Carlsson SB, Gustafsson A, Hakanson U, Litwin A, Samuelson L |
459 - 462 |
Be redistribution in GaInP and growth of GaInP/AlInP tunnel diode by gas source molecular beam epitaxy Li W, Likonen J, Haapamaa J, Pessa M |
463 - 470 |
MOMBE: superior epitaxial growth for InP-based monolithically integrated photonic circuits Gibis R, Kizuki H, Albrecht P, Harde P, Urmann G, Kaiser R, Kunzel H |
471 - 475 |
Interferometric wavelength converter operating at 10 Gb/s based on a monolithic-integrated photonic circuit Rigo C, Coriasso C, Campi D, Stano A, Cacciatore C, Re D, Fornuto G, Soldani D, De Franceschi R, Ghiglieno F, Vallone M, Valenti P, Zucchelli L, Lupo S, Gambini P |
476 - 480 |
Investigation of carbon-doped base materials grown by CBE for Al-free InPHBTs Benchimol JL, Mba J, Sermage B, Riet M, Blayac S, Berdaguer P, Duchenois AM, Andre P, Thuret J, Gonzalez C, Konczykowska A |
481 - 485 |
Development of GaAs space solar cells by high growth rate MOMBE/CBE Freundlich A, Newman F, Vilela MF, Monier C, Aguilar L, Street S |
486 - 491 |
Integrated laser/waveguide by shadow-masked selective area epitaxy using chemical beam epitaxy (CBE) Balmer RS, Martin T, Kane MJ, Maclean JO, Whitaker TJ, Ayling SG, Calcott PDJ, Houlton M, Newey JP, O'Mahony SJ |
492 - 498 |
Dynamic behavior of group III and V organometallic sources and nanostructure fabrication by supersonic molecular beams Cui J, Ozeki M, Ohashi M |
499 - 503 |
MOMBE selective infill growth of InP/GaInAs for quantum dot formation Gibis R, Schelhase S, Steingruber R, Urmann G, Kunzel H, Thiel S, Stier O, Bimberg D |
504 - 508 |
Fabrication of InGaAs quantum dots on GaAs(001) by droplet epitaxy Mano T, Watanabe K, Tsukamoto S, Fujioka H, Oshima M, Koguchi N |
509 - 512 |
Improvement of nanoscale patterning of heavily doped p-type GaAs by atomic force microscope (AFM)-based surface oxidation process Matsuzaki Y, Yamada A, Konagai M |
513 - 517 |
The growth mechanism of silicon nanowires and their quantum confinement effect Feng SQ, Yu DP, Zhang HZ, Bai ZG, Ding Y |
518 - 521 |
Fabrication of selectively grown II-VI widegap semiconductor photonic dots on (001)GaAs with MOMBE Ueta A, Avramescu A, Suemune I, Machida H, Shimoyama N |
522 - 525 |
Effects of oxygen plasma condition on MBE growth of ZnO Sakurai K, Kanehiro M, Nakahara K, Tanabe T, Fujita S, Fujita S |
526 - 531 |
Nitrogen-induced defects in ZnO : N grown on sapphire substrate by gas source MBE Iwata K, Fons P, Yamada A, Matsubara K, Niki S |
532 - 536 |
Uniaxial locked growth of high-quality epitaxial ZnO films on (11(2)over-bar-0)alpha-Al2O3 Fons P, Iwata K, Niki S, Yamada A, Matsubara K, Watanabe M |
537 - 541 |
Defect characterization in epitaxial ZnO/epi-GaN/Al2O3 heterostructures: transmission electron microscopy and triple-axis X-ray diffractometry Hong SK, Ko HJ, Chen YF, Yao T |
542 - 546 |
Growth of ZnSe single crystals Fang CS, Gu QT, Wei JQ, Pan QW, Shi W, Wang JY |
547 - 551 |
Gas-source MBE growth of Tl-based III-V semiconductors and their Raman scattering characterization Zhou YK, Asahi H, Ayabe A, Takenaka K, Fushida M, Asami K, Gonda S |
552 - 555 |
Formation and structural investigation of MnSb dots on S-passivated GaAs(001) substrates Mizuguchi M, Akinaga H, Ono K, Oshima M |
556 - 560 |
Molecular beam epitaxy of MnSb/MnAs multilayers on GaAs Ono K, Uragami T, Mizuguchi M, Fujioka H, Oshima M, Tanaka M, Akinaga H |
561 - 565 |
The effect of S- and Se-passivation on MBE growth of MnAs thin films on GaAs(100) substrates Uragami T, Ono K, Mizuguchi M, Fujioka H, Tanaka M, Oshima M |
VII - VII |
Chemical beam epitaxy and related growth techniques 1999 - Proceedings of the Seventh International Conference on Chemical Beam Epitaxy and Related Growth Techniques - Tsukuba, Japan, July 28-30, 1999 - Preface Sugiura H, Konagai M, Asahi H |