Journal of the Electrochemical Society

Journal of the Electrochemical Society, Vol.143, No.2 Entire volume, number list

ISSN: 0013-4651 (Print)

In this Issue (71 articles)

391 - 394	Reactivity of Lithium Intercalated into Petroleum Coke in Carbonate Electrolytes Jean M, Tranchant A, Messina R
394 - 400	Nanocrystalline TiO2 (Anatase) Electrodes - Surface-Morphology, Adsorption, and Electrochemical Properties Kavan L, Gratzel M, Rathousky J, Zukal A
401 - 405	Voltammetry and Conductivity of a Polyether-Pyridinium Room-Temperature Molten-Salt Electrolyte and of Its Polymer Electrolyte-Solutions in Polydimethylsiloxane Pyati R, Murray RW
406 - 412	Sodium/Phosphorus-Sulfur Cells .1. Cell Performance Ridgway PL, Mclarnon FR, Cairns EJ
412 - 417	Sodium/Phosphorus-Sulfur Cells .2. Phase-Equilibria Ridgway PL, Mclarnon FR, Cairns EJ
418 - 422	The Effect of Mechanical Processing Procedures on the Decomposition Rate of Silver-Oxide Cathode Material Takeda K
422 - 428	The Reaction of Clean Li Surfaces with Small Molecules in Ultrahigh-Vacuum .1. Dioxygen Wang KL, Ross PN, Kong FP, Mclarnon F
429 - 435	Studies of Electrochemical Properties of Ti0.35Zr0.65Nixv2-X-Ymny Alloys with C-14 Laves Phase for Nickel/Metal Hydride Batteries Yang HW, Wang YY, Wan CC
435 - 441	Application of Porous-Electrode Theory on Metal Hydride Electrodes in Alkaline-Solution Zheng G, Popov BN, White RE
442 - 448	Corrosion of Tin Oxide at Anodic Potentials Cachet H, Froment M, Zenia F
449 - 458	The Detection and Analysis of Electrochemical Damage in Bismaleimide/Graphite Fiber Composites Taylor SR, Wall FD, Cahen GL
458 - 465	Anodic Behavior of Copper in Iodide Solutions - Comparison with Chloride and Effect of Benzotriazole-Type Inhibitors Tromans D, Silva JC
466 - 471	Kinetics of Particle Coarsening at Gold Electrode/Electrolyte Solution Interfaces Followed by in-Situ Scanning-Tunneling-Microscopy Andreasen G, Nazzarro M, Ramirez J, Salvarezza RC, Arvia AJ
472 - 480	Plasma Treatment Process for Palladium Chemisorption Onto Polymers Before Electroless Deposition Charbonnier M, Alami M, Romand M
480 - 485	3-Dimensional Calculation of Current Distribution in Electrodeposition on Patterned Cathode with Auxiliary Electrode Choi YS, Kang T
486 - 492	Workpiece, Pattern, and Feature Scale Current Distributions Debecker B, West AC
493 - 498	Improved Selenization Procedure to Obtain CuInSe2 Thin-Films from Sequentially Electrodeposited Precursors Guillen C, Herrero J
498 - 505	Effect of the Composition of Polypyrrole Substrate on the Electrodeposition of Copper and Nickel Hepel M, Chen YM, Stephenson R
505 - 509	Mathematical-Modeling of Electroless Nickel Deposition at Steady-State Using Rotating-Disk Electrode Kim YS, Sohn HJ
510 - 516	Kinetics and Mechanism of Electroless Deposition of Copper Mishra KG, Paramguru RK
517 - 523	Effects of Postdeposition Heat-Treatment on Morphology and Microstructure of CdTe Grown by Electrodeposition Qi B, Kim DW, Williamson DL, Trefny JU
524 - 530	Oxidation of N-InP and Indium in the Negative Potential Region at pH-5 Quinlan KP, Yip PW, Rai AK, Wittberg TN
530 - 543	Microstructure-Property Relations of Solid Oxide Fuel-Cell Cathodes and Current Collectors - Cathodic Polarization and Ohmic Resistance Sasaki K, Wurth JP, Gschwend R, Godickemeier M, Gauckler LJ
544 - 549	Effect of Mask Wall Angle on Shape Evolution During Through-Mask Electrochemical Micromachining Shenoy RV, Datta M
550 - 556	Electroreduction of C-60 in Aprotic-Solvents .3. Voltammetric Study, at Microelectrode, of C-60(N-) (N=0 to 4) Solvation in the Absence of Supporting Electrolyte Soucazeguillous B, Kutner W, Jones MT, Kadish KM
556 - 560	The Anodic Behavior of Azide Ions at Carbon Electrodes in Neutral Electrolyte Dalmia A, Wasmus S, Savinell RF, Liu CC
561 - 566	Electrochemical-Behavior of the Manganese-Substituted Nickel Hydroxides Guerloudemourgues L, Delmas C
567 - 570	Nonstoichiometry of Sintered Oxide Ca0.9La0.1Mno3-Delta and Its Cathodic Properties in Alkaline-Solutions Morimoto H, Kamata M, Esaka T
570 - 574	A Temperature Study of the Ionic-Conductivity of a Hybrid Polymer Electrolyte Olsen II, Koksbang R
574 - 582	In-Situ X-Ray-Absorption Near-Edge Spectroscopic Study of the Cathodic Reduction of Artificial Iron-Oxide Passive Films Schmuki P, Virtanen S, Davenport AJ, Vitus CM
582 - 586	Pulsed Electroreduction of CO2 on Silver Electrodes Shiratsuchi R, Nagami G
587 - 599	Characterization of Polymer Electrolyte Fuel-Cells Using AC-Impedance Spectroscopy Springer TE, Zawodzinski TA, Wilson MS, Gottesfeld S
600 - 608	Modeling Lithium Intercalation of Single-Fiber Carbon Microelectrodes Verbrugge MW, Koch BJ
609 - 613	Construction and Working Mechanism of Sulfur-Dioxide Sensor Utilizing Stabilized Zirconia and Metal Sulfate Yan Y, Miura N, Yamazoe N
614 - 619	An X-Ray-Absorption Near-Edge Spectroscopic Study of the Structure of Passive Films on Amorphous Al-Fe-Ce Alloys Mansour AN, Melendres CA, Poon SJ, He Y, Shiflet GJ
619 - 623	Kinetics and Modeling of Wet Etching of Aluminum-Oxide by Warm Phosphoric-Acid Zhou B, Ramirez WF
624 - 627	Growth and Resistivity Behavior of Copper Film by Chemical-Vapor-Deposition Choi ES, Park SK, Lee HH
628 - 633	Repair of Plasma Etch Related Gate Perimeter Damage Using Low-Temperature Oxidation Guldi RL, Wyke DR
634 - 639	On the Mechanism of Boron Incorporation During Silicon Epitaxy by Means of Chemical-Vapor-Deposition Kuhne H, Fischer A, Ozturk MC, Sanganeria MK
639 - 642	Nano-Trenched Local Oxidation of Silicon Isolation Using Island Polysilicon Grains Kwon SK, Lim C, Cho BJ, Kim JC
643 - 648	Wettability of Polished Silicon-Oxide Surfaces Thomas RR, Kaufman FB, Kirleis JT, Belsky RA
649 - 657	Silicon Nucleation and Film Evolution on Silicon Dioxide Using Disilane - Rapid Thermal Chemical-Vapor-Deposition of Very Smooth Silicon at High Deposition Rates Violette KE, Ozturk MC, Christensen KN, Maher DM
657 - 665	Self-Developing Characteristics of Si Containing Polymers and Their Application to X-Ray-Lithography Yamaguchi A, Ogawa T, Tachibana H, Oizumi H, Soga T, Matsumoto M, Matsuzaka T, Takeda E
666 - 671	Microcrystal Growth on Borophosphosilicate Glass-Film During High-Temperature Annealing Yoshimaru M, Wakamatsu H
672 - 676	Etching Profiles and Neutral Shadowing in Long Trenches Abrahamshrauner B, Wang CD
677 - 682	Effect of Transport Phenomena on Boron Concentration Profiles in Silicon Epitaxial Wafers Habuka H, Mayusumi M, Tsunoda H, Katayama M
683 - 687	Deposition of Tin Oxide into Porous Silicon by Atomic Layer Epitaxy Ducso C, Khanh NQ, Horvath Z, Barsony I, Utriainen M, Lehto S, Nieminen M, Niinisto L
687 - 691	Phase-Transformation and Lattice Strain of Alpha-AgI Stabilized in Superionic Glass Saito T, Tatsumisago M, Minami T
691 - 695	Selective Electroless Nickel Deposition on Patterned Phosphonate and Carboxylate Polymer-Films Schilling ML, Katz HE, Houlihan FM, Stein SM, Hutton RS, Taylor GN
695 - 700	Confinement Phenomena in Buried Oxides of Simox Structures as Affected by Processing Afanasev VV, Revesz AG, Hughes HL
701 - 707	Plasma-Assisted Dry-Etching of Cobalt Silicide for Microelectronics Applications Fracassi F, Dagostino R, Lamendola R, Filippo A, Rapisarda C, Vasquez P
707 - 711	Characteristics of Siof Films Formed Using Tetraethylorthosilicate and Fluorotriethoxysilane at Room-Temperature by Chemical-Vapor-Deposition Homma T
712 - 716	Control of Surface Concentration of Boron or Phosphorus Employing Ion Shower Doping Kasamatsu A, Takakubo H, Shono K
716 - 721	Modeling of the Wear Mechanism During Chemical-Mechanical Polishing Liu CW, Dai BT, Tseng WT, Yeh CF
722 - 725	Asymmetric Distribution of Oxygen Concentration in the Si Melt of a Czochralski System Yi KW, Kakimoto K, Niu ZG, Eguchi M, Noguchi H, Nakamura S, Mukai K
725 - 735	Microstructural Properties of Helium Implanted Void Layers in Silicon as Related to Front-Side Gettering Medernach JW, Hill TA, Myers SM, Headley TJ
736 - 744	Atmospheric-Pressure Chemical-Vapor-Deposition of Titanium Nitride from Tetrakis (Diethylamido) Titanium and Ammonia Musher JN, Gordon RG
744 - 749	A 0.25 Mu-M MOSFET Technology Using in-Situ Rapid Thermal Gate Dielectrics Zhang KX, Osburn CM, Hames G, Parker C, Bayoumi A
749 - 751	Dissolution Windows for Wet Chemical-Processing of Silicon and Silicon Dioxide - Potential-pH Diagrams for the Si-F-H2O System Osseoasare K, Wei DW, Mishra KK
752 - 758	Comparison of Dry-Etching Techniques for III-V Semiconductors in CH4/H-2/Ar Plasmas Pearton SJ, Lee JW, Lambers ES, Abernathy CR, Ren F, Hobson WS, Shul RJ
L21 - L23	In-Situ FTIR-Diffuse Reflection Spectroscopy of the Anode Surface in a Direct Methanol/Oxygen Fuel-Cell Fan QB, Pu C, Lay KL, Smotkin ES
L24 - L25	Promoting Effect of Sodium Dodecyl-Sulfate on the Redox Reaction of Hemoglobin Li GX, Fang HQ, Liao XM, Shi HR, Chen HY
L26 - L28	Effects of the Organic-Solvent on the Electrochemical Lithium Intercalation Behavior of Graphite Electrode Morita M, Ichimura T, Ishikawa M, Matsuda Y
L29 - L30	A New-Type of a Rocking-Chair Battery Family Based on a Graphite Anode and a Polymer Cathode Panero S, Spila E, Scrosati B
L31 - L33	The Role of Microcracking in Zrcrni Hydride Electrodes Mccormack M, Badding ME, Vyas B, Zahurak SM, Murphy DW
L33 - L35	Mixed Potential Type NOx Sensor-Based on Stabilized Zirconia and Oxide Electrode Miura N, Lu GY, Yamazoe N, Kurosawa H, Hasei M
L36 - L37	Selective Co Detection by Using Indium Oxide-Based Semiconductor Gas Sensor Yamaura H, Tamaki J, Moriya K, Miura N, Yamazoe N
L38 - L40	Control of Selective Tungsten Chemical-Vapor-Deposition by Monolayer Nitridation of Silicon Surface Takami S, Saito T, Fujii M, Egashira Y, Komiyama H
L40 - L42	Bevel Etching of Tin-Doped Indium Oxide Vandenmeerakker JE, Jacobs JW
L42 - L44	Fabrication of a Porous Silicon Diode Possessing Distinct Red and Orange Electroluminescent Regions Zhang LB, Coffer JL, Rho YG, Pinizzotto RF
L44 - L47	A Novel Electrochemical Method for Measuring Salt Diffusion-Coefficients and Ion Transference Numbers Xu J, Farrington GC