Journal of Vacuum Science & Technology B

Journal of Vacuum Science & Technology B, Vol.26, No.6 Entire volume, number list

ISSN: 1071-1023 (Print)

In this Issue (152 articles)

L45 - L47	Fabrication of thin-film silicon on insulator by separation by implanted oxygen layer transfer Wei X, Wu AM, Chen M, Chen J, Zhang M, Wang X, Lin CL
L48 - L52	Fabrication of Ag-tetracyanoquinodimethane nanostructures using ink-jet printing/vapor-solid chemical reaction process Aggarwal R, Narayan RJ, Xiao K, Geohegan DB
1831 - 1833	The transition mechanisms of a ten-period InAs/GaAs quantum-dot infrared photodetector Tseng CC, Chou ST, Lin SY, Chen CN, Lin WH, Chen YH, Chung TH, Wu MC
1834 - 1840	Fabrication and testing of through-silicon vias used in three-dimensional integration Abhulimen IU, Kamto A, Liu Y, Burkett SL, Schaper L
1841 - 1847	GaN nanowire and Ga2O3 nanowire and nanoribbon growth from ion implanted iron catalyst Johnson JL, Choi YH, Ural A
1848 - 1851	Gigahertz surface acoustic wave generation on ZnO thin films deposited by radio frequency magnetron sputtering on III-V semiconductor substrates Wang QJ, Pflugl C, Andress WF, Ham D, Capasso F, Yamanishi M
1852 - 1855	Large-area dielectric and metallic freestanding gratings for midinfrared optical filtering applications Vincent G, Collin S, Bardou N, Pelouard JL, Haidar R
1856 - 1859	Optimization of antireflection structures of polymer based on nanoimprinting using anodic porous alumina Yanagishita T, Kondo T, Nishio K, Masuda H
1860 - 1865	A new approach to fabricating high density nanoarrays by nanocontact printing Gu J, Xiao XY, Takulapalli BR, Morrison ME, Zhang P, Zenhausern F
1866 - 1870	Neutral particle proximity lithography: Noncontact nanoscale printing without charge-related artifacts Craver B, Nounu H, Wasson J, Wolfe JC
1871 - 1874	Epitaxial cubic HfN diffusion barriers deposited on Si (001) by using a TiN buffer layer Araujo RA, Zhang XH, Wang HY
1875 - 1882	Tungsten metal gate etching in Cl-2/O-2 inductively coupled high density plasmas Morel T, Bamola S, Ramos R, Beaurain A, Pargon E, Joubert O
1883 - 1886	High and low temperature behavior of Ohmic contacts to AlGaN/GaN heterostructures with a thin GaN cap Miller MA, Mohney SE
1887 - 1891	Characterization of a sol-gel based high-k dielectric field effect transistor for cryogenic operation Khan MZR, Hasko DG, Saifullah MSM, Welland ME
1892 - 1895	Improved field emission properties from polycrystalline indium oxide-coated single-walled carbon nanotubes Lee J, Lee W, Sim K, Han SH, Yi W
1896 - 1902	HBr-based inductively coupled plasma etching of high aspect ratio nanoscale trenches in GaInAsP/InP Zhou W, Sultana N, MacFarlane DL
1903 - 1910	Spatial scaling metrics of mask-induced line-edge roughness Naulleau PP, Gallatin G
1911 - 1918	Feature profile evolution during shallow trench isolation etch in chlorine-based plasmas. I. Feature scale modeling Hoang J, Hsu CC, Chang JP
1919 - 1925	Feature profile evolution during shallow trench isolation etch in chlorine-based plasmas. II. Coupling reactor and feature scale models Hsu CC, Hoang J, Le V, Chang JP
1926 - 1932	Damage mechanism in low-dielectric (low-k) films during plasma processes Jinnai B, Nozawa T, Samukawa S
1933 - 1936	Photoconductivity of vertically aligned ZnO nanoneedle array Park D, Yong K
1937 - 1941	Improved crystalline quality nonpolar a-GaN films grown by hydride vapor phase epitaxy Donskov AA, D'yakonov LI, Govorkov AV, Kozlova YP, Malakhov SS, Markov AV, Mezhennyi MV, Pavlov VF, Polyakov AY, Smirnov NB, Yugova TG, Pearton SJ
1942 - 1947	Solid-phase growth mechanism of tungsten oxide nanowires synthesized on sputtered tungsten film Kojima Y, Kasuya K, Nagato K, Hamaguchi T, Nakao M
1948 - 1951	The coexistence of surface reconstruction domains on strained heteroepitaxial films Sears LE, Millunchick JM, Pearson C
1952 - 1959	Ge1-ySny photoconductor structures at 1.55 mu m: From advanced materials to prototype devices Roucka R, Xie J, Kouvetakis J, Mathews J, D'Costa V, Menendez J, Tolle J, Yu SQ
1960 - 1963	Growth of Si nanowires on micropillars for the study of their dopant distribution by atom probe tomography Xu T, Nys JP, Grandidier B, Stievenard D, Coffinier Y, Boukherroub R, Larde R, Cadel E, Pareige P
1964 - 1970	Modifications of dielectric films induced by plasma ashing processes: Hybrid versus porous SiOCH materials Darnon M, Chevolleau T, David T, Posseme N, Ducote J, Licitra C, Vallier L, Joubert O, Torres J
1971 - 1977	Formation and stability of NiSi in the presence of Co and Fe alloying elements Deduytsche D, Detavernier C, Van Meirhaeghe RL, Jordan-Sweet JL, Lavoie C
1978 - 1986	Study of 193 nm photoresist degradation during short time fluorocarbon plasma exposure III. Effect of fluorocarbon film and initial surface condition on photoresist degradation Sumiya M, Bruce R, Engelmann S, Weilnboeck F, Oehrlein GS
1987 - 1992	Interface states mediated reverse leakage through metal/AlxGa1-xN/GaN Schottky diodes Lu CZ, Zhang XL, Xie XS, Feng SW, Diagne I, Khan A, Mohammad SN
1993 - 2007	Investigation of the oxide-assisted growth mechanism for nanowire growth and a model for this mechanism Mohammad SN
2008 - 2012	Bias power dependence of reactive ion etching lag in contact hole etching using inductively coupled fluorocarbon plasma Imai S
2013 - 2013	Spherical field emission cathode based on carbon nanotube paste and its application in luminescent bulbs (vol B 26, pg 1404, 2008) Fu WQ, Liu P, Tang J, Liu L, Fan SS
2025 - 2031	Electron beams in individual column cells of multicolumn cell system Yamada A, Yasuda H, Yamabe M
2032 - 2038	Process variation-aware three-dimensional proximity effect correction for electron beam direct writing at 45 nm node and beyond Ogino K, Hoshino H, Machida Y
2039 - 2042	Charging and error budgets in electron beam lithography tools Hartley JG, Lyons A
2043 - 2048	An innovative design of wafer height and tilt sensor for lithography systems Ruan JR, Hartley J
2049 - 2053	Influence of hydrogen silsesquioxane resist exposure temperature on ultrahigh resolution electron beam lithography Sidorkin V, van der Drift E, Salemink H
2054 - 2058	Dynamic stencil lithography on full wafer scale Savu V, van den Boogaart MAF, Brugger J, Arcamone J, Sansa M, Perez-Murano F
2059 - 2063	Projection maskless patterning for nanotechnology applications Platzgummer E, Loeschner H, Gross G
2064 - 2068	Sub-50 nm resolution surface electron emission lithography using nano-Si ballistic electron emitter Kojima A, Ohyi H, Koshida N
2069 - 2072	Multilevel visualization of local electric field at probe apex using scanning electron microscopy Fujita J, Ikeda Y, Suzuki I
2073 - 2079	Effect of the electric field on the form stability of a Schottky electron emitter: A step model Bronsgeest MS, Kruit P
2080 - 2084	Range of validity of field emission equations Bahm AS, Schwind GA, Swanson LW
2085 - 2090	Evaluation of electron energy spread in CsBr based photocathodes Maldonado JR, Sun Y, Liu Z, Liu XF, Tanimoto S, Pianetta P, Pease F
2091 - 2096	Brightness measurements of a gallium liquid metal ion source Hagen CW, Fokkema E, Kruit P
2097 - 2102	The use of ionic liquid ion sources in focused ion beam applications Zorzos AN, Lozano PC
2103 - 2106	Elemental analysis with the helium ion microscope Sijbrandij S, Thompson B, Notte J, Ward BW, Economou NP
2107 - 2115	Sputtering limits versus signal-to-noise limits in the observation of Sn balls in a Ga+ microscope Castaldo V, Hagen CW, Rieger B, Kruit P
2116 - 2120	Enhancement in hyper-numerical-aperture imaging through selective TM polarization Smith B, Zhou JM, Xie P
2121 - 2123	Image quality improvement in focused ion beam photomask repair system Yasaka A, Aramaki F, Muramatsu M, Kozakai T, Matsuda O, Sugiyama Y, Doi T, Takaoka O, Hagiwara R, Nakamae K
2124 - 2126	High-speed optical beam-steering based on phase-arrayed waveguides Jarrahi M, Fabian R, Pease W, Miller DAB, Lee TH
2127 - 2130	Application of vector scanning in focused ion beam photomask repair system Yasaka A, Aramaki F, Muramatsu M, Kozakai T, Matsuda O, Sugiyama Y, Doi T, Takaoka O, Hagiwara R, Nakamae K
2131 - 2134	Linewidth uniformity in Lloyd's mirror interference lithography systems O'Reilly TB, Smith HI
2135 - 2138	Spatial-frequency multiplication with multilevel interference lithography Chang CH, Zhao Y, Heilmann RK, Schattenburg ML
2139 - 2144	Light modulation with nanopatterned diffractive microelectromechanical system pixels Skinner JL, Talin AA, Horsley DA
2145 - 2150	Improving lithography pattern fidelity and line-edge roughness by reducing laser speckle Kritsun O, Lalovic I, Rokitski S, Partlo B, La Fontaine B, Farrar N, Levinson H
2151 - 2155	Fabrication of metallic nanoslit waveguides with sharp bends Lu M, Ocola LE, Gray SK, Wiederrecht GP
2156 - 2159	Optical antennas: A boost for infrared detection Li HF, Cheng X
2160 - 2163	Fabrication of Fresnel zone plates by holography in the extreme ultraviolet region Sarkar SS, Sahoo PK, Solak HH, David C, Van der Veen JF
2164 - 2167	Fabrication strategies for filter banks based on microring resonators Holzwarth CW, Amatya R, Dahlem M, Khilo A, Kartner FX, Ippen EP, Ram RJ, Smith HI
2168 - 2173	Focused in beam fabrication of metallic nanostructures on end faces of optical fibers for chemical sensing applications Dhawan A, Muth JF, Leonard DN, Gerhold MD, Gleeson J, Vo-Dinh T, Russell PE
2174 - 2178	NIL processes and material characterization on transparent substrates for optical applications Chaix N, Gourgon C, Perret C, Decossas S, Landis S, Lambertini VG, Pira NL
2179 - 2182	Fabrication of 200 nm period blazed transmission gratings on silicon-on-insulator wafers Ahn M, Heilmann RK, Schattenburg ML
2183 - 2187	Engineering surface plasmon grating couplers through computer simulation Ceperley DP, Neureuther AR
2188 - 2191	Light transmission through a metallic/dielectric nano-optic lens Ko H, Kim HC, Cheng M
2192 - 2196	Photomask image enhancement using grating-generated surface waves Lafferty NV, Bourov A, Estroff A, Smith BW
2197 - 2203	Optical focusing of plasmonic Fresnel zone plate-based metallic structure covered with a dielectric layer Kim HC, Ko H, Cheng M
2204 - 2207	Extreme ultraviolet lithography: Status and prospects Benschop J, Banine V, Lok S, Loopstra E
2208 - 2214	Effects of mask absorber structures on the extreme ultraviolet lithography Seo HS, Lee DG, Kim H, Huh S, Ahn BS, Han H, Kim D, Kim SS, Cho HK, Gullikson EM
2215 - 2219	Experimental validation of full-field extreme ultraviolet lithography flare and shadowing corrections Myers AM, Lorusso GF, Kim I, Goethals AM, Jonckheere R, Hermans J, Baudemprez B, Ronse K
2220 - 2224	Actinic extreme ultraviolet mask inspection beyond 0.25 numerical aperture Goldberg KA, Naulleau P, Mochi I, Anderson EH, Rekawa SB, Kemp CD, Gunion RF, Han HS, Huh S
2225 - 2229	The effects of oxygen plasma on the chemical composition and morphology of the Ru capping layer of the extreme ultraviolet mask blanks Belau L, Park JY, Liang T, Somorjai GA
2230 - 2235	Protection and reduction of surface oxidation of Mo/Si multilayers for extreme ultraviolet lithography projection optics by control of hydrocarbon gas atmosphere Niibe M, Koida K, Kakutani Y
2236 - 2240	Decomposition of catechol and carbonaceous residues on TiO2(110): A model system for cleaning of extreme ultraviolet lithography optics Jacobson P, Li SC, Wang C, Diebold U
2241 - 2246	Interaction of benzene with TiO2 surfaces: Relevance to contamination of extreme ultraviolet lithography mirror capping layers Zalkind S, Yakshinskiy BV, Madey TE
2247 - 2251	Stability of HSQ nanolines defined by e-beam lithography for Si nanowire field effect transistors Regonda S, Aryal M, Hu WC
2252 - 2256	Novel negative-tone molecular resist based on polyphenol derivative for extreme ultraviolet lithography Oizumi H, Kumise T, Itani T
2257 - 2260	Latent image formation in chemically amplified extreme ultraviolet resists with low activation energy for deprotection reaction Kozawa T, Tagawa S, Santillan JJ, Itani T
2261 - 2264	Dissolution characteristics of chemically amplified extreme ultraviolet resist Itani T, Kaneyama K, Kozawa T, Tagawa S
2265 - 2270	Improvement in linewidth roughness by postprocessing Chandhok M, Frasure K, Putna ES, Younkin TR, Rachmady W, Shah U, Yueh W
2271 - 2275	Epoxy silsesquioxane resists for UV nanoimprint lithography De Girolamo J, Chouiki M, Tortai JH, Sourd C, Derrough S, Zelsmann M, Boussey J
2276 - 2280	Understanding the effects of photoacid distribution homogeneity and diffusivity on critical dimension control and line edge roughness in chemically amplified resists Lee CT, Lawson RA, Henderson CL
2281 - 2289	Contributions of resist polymers to innate material roughness Fedynyshyn TH, Astolfi DK, Goodman RB, Cann S, Roberts J
2290 - 2294	Optical characterization of a hydrogen silsesquioxane lithography process Samarelli A, Macintyre DS, Strain MJ, De La Rue RM, Sorel M, Thoms S
2295 - 2299	Influence of base and photoacid generator on deprotection blur in extreme ultraviolet photoresists and some thoughts on shot noise Anderson CN, Naulleau PP, Niakoula D, Hassanein E, Brainard R, Gallatin G, Dean K
2300 - 2305	The effect of thin metal overlayers on the electron beam exposure of polymethyl methacrylate Samantaray CB, Hastings JT
2306 - 2310	The effects of molecular weight on the exposure characteristics of poly(methylmethacrylate) developed at low temperatures Yan M, Choi S, Subramanian KRV, Adesida I
2311 - 2315	Effect of microstructure on deprotection kinetics in photoresist Fryer DS, Singh V, Bollepalli SB, Granovsky AA
2316 - 2321	Field-programmable gate array implementation of real-time spatial-phase locking for electron-beam lithography Yang YG, Hastings JT
2322 - 2330	Abbe singular-value decomposition: Compact Abbe's kernel generation for microlithography aerial image simulation using singular-value decomposition method Chen CCP, Gurhanli A, Chiang TY, Hong JJ, Melvin LS
2331 - 2336	Aberration correction for electron beam inspection, metrology, and lithography Munro E, Rouse J, Liu HN, Wang LP
2337 - 2340	Study of machine to machine overlay error for sub-60-nm memory devices Shin J, Lee S, Yeo J, Kim H, Lee J, Han W
2341 - 2344	Nanometer-level alignment to a substrate-embedded coordinate system Moon EE, Smith HI
2345 - 2350	Resist charging effect in photomask: Its impact on pattern placement error and critical dimension Choi J, Nam DS, Kim BG, Woo SG, Cho HK
2351 - 2355	Self-assembled monolayer fiducial grids for spatial-phase-locked electron-beam lithography Samantaray CB, Hastings JT
2356 - 2361	Development of the compact low-energy soft x-ray CT instrument for the soft material structural analysis Miyoshi M, Hamakubo T, Kodama T, Tsuchiya M, Koishikawa A, Aoki N
2362 - 2366	X-ray diffraction microscopy: Reconstruction with partial magnitude and spatial a priori information Rad LB, Downes I, Dai B, Zhu DL, Scherz A, Ye J, Pianetta P, Pease RFW
2367 - 2373	Scanning proximal probes for parallel imaging and lithography Ivanova K, Sarov Y, Ivanov T, Frank A, Zollner J, Bitterlich C, Wenzel U, Volland BE, Klett S, Rangelow IW, Zawierucha P, Zielony M, Gotszalk T, Dontzov D, Schott W, Nikolov N, Zier M, Schmidt B, Engl W, Sulzbach T, Kostic I
2374 - 2379	Neutral atom and molecule focusing using a Fresnel zone plate Reisinger T, Holst B
2380 - 2384	Quality assessment of antisticking layers for thermal nanoimprint Scheer HC, Hafner W, Fidler A, Mollenbeck S, Bogdanski N
2385 - 2389	Patterning of polyfluorene based polymer light emitting diodes by reversal imprint lithography Cardozo BL, Pang SW
2390 - 2393	Fabrication of the nanoimprint mold using inorganic electron beam resist with post exposure bake Unno N, Taniguchi J, Shizuno M, Ishikawa K
2394 - 2398	Fluorinated diamondlike carbon templates for high resolution nanoimprint lithography Schvartzman M, Mathur A, Kang Y, Jahnes C, Hone J, Wind SJ
2399 - 2403	Experimental and numerical analyses on recovery of polymer deformation after demolding in the hot embossing process Takagi H, Takahashi M, Maeda R, Onishi Y, Iriye Y, Iwasaki T, Hirai Y
2404 - 2409	Improving organic thin-film transistor performance by nanoimprint-induced chain ordering Cui D, Li H, Park H, Cheng X
2410 - 2415	Full field imprint masks using variable shape beam pattern generators Selinidis K, Thompson E, Schmid G, Stacey N, Perez J, Maltabes J, Sreenivasan SV, Resnick DJ, Fujii A, Sakai Y, Sasaki S, Hayashi N
2416 - 2420	Contact angles in a thermal imprint process Bogdanski N, Mollenbeck S, Scheer HC
2421 - 2425	Metal transfer assisted nanolithography on rigid and flexible substrates Kang MG, Guo LJ
2426 - 2429	Easy duplication of stamps using UV-cured fluoro-silsesquioxane for nanoimprint lithography Pina-Hernandez C, Fu PF, Guo LJ
2430 - 2433	Comparison of monomer and polymer resists in thermal nanoimprint lithography Zelsmann M, Toralla K, De Girolamo J, Boutry D, Gourgon C
2434 - 2440	Exploration of etch step interactions in the dual patterning process for process modeling Melvin LS, Ward BS, Song H, Rhie SU, Lucas KD, Wiaux V, Verhaegen S, Maenhoudt M
2441 - 2446	Pattern specific optical models Tejnil E, Adam K, Lam MC, Berger G
2447 - 2450	Catalyst patterning for carbon nanotube growth on elevating posts by self-aligned double-layer electron beam lithography Haffner M, Heeren A, Haug A, Schuster E, Sagar A, Fleischer M, Peisert H, Burghard M, Chasse T, Kern DP
2451 - 2454	Direct patterning of plasma enhanced chemical vapor deposition silicon dioxide by electron beam lithography Brown DK
2455 - 2459	Preferential orientation effects in partial melt laser crystallization of silicon Witte DJ, Masbou MPA, Crnogorac F, Pease RFW, Pickard DS
2460 - 2463	Electron-beam-induced deposition of platinum at low landing energies Botman A, de Winter DAM, Mulders JJL
2464 - 2467	Investigation of morphological changes in platinum-containing nanostructures created by electron-beam-induced deposition Botman A, Hesselberth M, Mulders JJL
2468 - 2472	Ion track lithography and graphitic nanowires in diamondlike carbon Krauser J, Nix AK, Gehrke HG, Hofsass H, Trautmann C, Weidinger A, Wunsch F, Bruns J
2473 - 2477	Optical properties of sputtered fluorinated ethylene propylene and its application to surface-plasmon resonance sensor fabrication Keathley PD, Hastings JT
2478 - 2483	Relief and trench formation on chalcogenide thin films using electron beams Hoffman GB, Liu WC, Zhou W, Sooryakumar R, Boolchand P, Reano RM
2484 - 2488	Impact of trench width roughness on the graphoepitaxial assembly of block copolymers Welander AM, Nealey PF, Cao H, Bristol R
2489 - 2494	Si-containing block copolymers for self-assembled nanolithography Ross CA, Jung YS, Chuang VP, Ilievski F, Yang JKW, Bita I, Thomas EL, Smith HI, Berggren KK, Vancso GJ, Cheng JY
2495 - 2499	Directed assembly of asymmetric ternary block copolymer-homopolymer blends using symmetric block copolymer into checkerboard trimming chemical pattern Kang H, Craig GSW, Nealey PF
2500 - 2503	The replication of three dimensional structures using UV curable nanoimprint lithography Mohamed K, Alkaisi MM, Blaikie RJ
2504 - 2508	In situ characterization of block copolymer ordering on chemically nanopatterned surfaces by time-resolved small angle x-ray scattering Stuen KO, Liu C, Welander AM, Liu G, de Pablo JJ, Nealey PF, Satapathy DK, Nygard K, Bunk O, Solak HH, van der Veen JF
2509 - 2512	Carbon nanotube-based magnetic actuation of origami membranes In HJ, Lee H, Nichol AJ, Kim SG, Barbastathis G
2513 - 2519	Assisted convective-capillary force assembly of gold colloids in a microfluidic cell: Plasmonic properties of deterministic nanostructures Pinedo Rivera T, Lecarme O, Hartmann J, Rossitto E, Berton K, Peyrade D
2520 - 2523	Pulsed laser techniques for nanographoepitaxy Crnogorac F, Witte DJ, Pease RFW
2524 - 2528	Directed self-assembly of individual vertically aligned carbon nanotubes Goyal A, Liu S, Iqbal Z, Fetter LA, Farrow RC
2529 - 2533	Three-dimensional alignment with 10 nm order accuracy in electron-beam lithography on rotated sample for three-dimensional nanofabrication Yamazaki K, Yamaguchi H
2534 - 2538	Microscale self-assembly using molten alloys with different melting points Morris CJ, Dubey M
2539 - 2542	Chip-based microfabricated electrospinning nozzles Bellan LM, Alpha C, Corso T, Henion J, Craighead HG
2543 - 2548	High-aspect-ratio plasma-induced nanotextured poly(dimethylsiloxane) surfaces with enhanced protein adsorption capacity Vlachopoulou ME, Petrou PS, Kakabakos SE, Tserepi A, Gogolides E
2549 - 2553	Fabrication of elastomer pillar arrays with modulated stiffness for cellular force measurements Ghassemi S, Biais N, Maniura K, Wind SJ, Sheetz MP, Hone J
2554 - 2557	Optimizing substrate disorder for bone tissue engineering of mesenchymal stem cells Gadegaard N, Dalby MJ, Riehle MO, Wilkinson CDW
2558 - 2561	Nanomodified surfaces and guidance of nerve cell processes Johansson F, Hallstrom W, Gustavsson P, Wallman L, Prinz C, Montelius L, Kanje M
2562 - 2566	Imprinted large-scale high density polymer nanopillars for organic solar cells Aryal M, Buyukserin F, Mielczarek K, Zhao XM, Gao JM, Zakhidov A, Hu WC
2567 - 2571	Direct write electron beam patterning of DNA complex thin films Jones RA, Li WX, Spaeth H, Steckl AJ
2572 - 2577	Hybridization sensing by electrical enhancement with nanoparticles in nanogap Chen CC, Ko FH, Chang EY, Chang FC, Kuo SW
2578 - 2582	Control of DNA motion in microchannels integrated with dual electrodes Cardozo BL, Pang SW
2583 - 2586	Hybrid high resolution lithography (e-beam/deep ultraviolet) and etch process for the fabrication of stacked nanowire metal oxide semiconductor field effect transistors Pauliac-Vaujour S, Comboroure C, Vizioz C, Barnola S, Brianceau P, Alvaro VM, Dupre C, Ernst T
2587 - 2591	Silicon single-electron transistor with oxide tunnel barriers fabricated using chemical mechanical polishing Joshi V, Orlov AO, Snider GL
2592 - 2595	Prospects of free electron analog to digital technology Aldana R, Pease RF
2596 - 2600	Single atom doping for quantum device development in diamond and silicon Weis CD, Schuh A, Batra A, Persaud A, Rangelow IW, Bokor J, Lo CC, Cabrini S, Sideras-Haddad E, Fuchs GD, Hanson R, Awschalom DD, Schenkel T
2601 - 2603	ZnO nanostructures grown on zinc nanocones by thermal oxidation Chao LC, Liau CC, Lin SJ, Lee JW
2604 - 2610	Toward 1 Tdot/in.(2) nanoimprint lithography for magnetic bit-patterned media: Opportunities and challenges Yang XM, Xu Y, Seiler C, Wan L, Xiao SG
2611 - 2618	Potential of a rotary stage electron beam mastering system for fabricating patterned magnetic media Miyazaki T, Hayashi K, Kobayashi K, Kuba Y, Ohyi H, Obara T, Mizuta O, Murayama N, Tanaka N, Kawamura Y, Uemoto H
2619 - 2623	Electrothermal actuation studies on silicon carbide resonators Mastropaolo E, Cheung R
2624 - 2627	Novel SU-8 optical waveguide microgripper for simultaneous micromanipulation and optical detection Panepucci RR, Martinez JA
2628 - 2631	Resistivity change of the diamondlike carbon, deposited by focused-ion-beam chemical vapor deposition, induced by the annealing treatment Kometani R, Ichihashi T, Kanda K, Suzuki T, Niihara K, Ishihara S, Kaito T, Matsui S
2632 - 2635	Nanofabrication of super-high-aspect-ratio structures in hydrogen silsesquioxane from direct-write e-beam lithography and hot development Ocola LE, Tirumala VR