화학공학소재연구정보센터
Macromolecular Research, Vol.19, No.9, 891-896, September, 2011
SiO2 Nanodot Arrays Using Patterned Functionalization of Self-Assembled Block Copolymer and Selective Adsorption of Amine-Terminated Polydimethylsiloxane
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Silicon dioxide (SiO2) nanodot arrays were fabricated by the selective adsorption of amine-terminated polydimethylsiloxane on functionalized block copolymer thin films. A polystyrene-b-poly(acrylic acid/acrylic anhydride) thin film was created by the acid-catalyzed thermal deprotection of polystyrene-b-poly(tert-butyl acrylate). The amine-terminated polydimethylsiloxane selectively adsorbed on poly(acrylic acid) (PAA)/(acrylic anhydride) (AN) spherical nanodomains using a simple dipping method. Patterned SiO2 nanodot arrays were also fabricated using polystyrene-b-poly(tert-butyl acrylate) coated on the patterned SU-8 film. The final SiO2 nanodot arrays were obtained by the calcination of an organosilicon film.
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