Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology A, Vol.13, No.1, 67-72, 1995 DOI10.1116/1.579445 Export Citation Reactive Ion Etching Induced Damage with Gas-Mixtures Chf3 O2 and SF6 O2 Wu W, Mclarty PK Keywords:ETCHED SILICON;PLASMA;SI Please enable JavaScript to view the comments powered by Disqus.
