Journal of Vacuum Science & Technology A

Journal of Vacuum Science & Technology A, Vol.18, No.3 Entire volume, number list

ISSN: 0734-2101 (Print)

In this Issue (42 articles)

797 - 801	Characterization of magnetron-sputtered partially ionized deposition as a function of metal and gas species Allain MMC, Hayden DB, Juliano DR, Ruzic DN
802 - 808	Microstructural and morphological analysis of ultrathin YBa2Cu3O7-x films grown by modulated magnetron sputtering on SrTiO3 substrates Del Vecchio A, De Riccardis MF, Tapfer L, Camerlingo C, Russo M
809 - 813	Diagnostics by optical absorption of sputtered atom density in magnetron discharges Dony MF, Dauchot JP, Wautelet M, Hecq M, Ricard A
814 - 818	Influence of substrate temperature on the properties of indium oxide thin films Adurodija FO, Izumi H, Ishihara T, Yoshioka H, Motoyama M, Murai K
819 - 822	Epitaxial growth structure and physical properties of Fe film biased dc-plasma sputter deposited on MgO(001) Chen CC, Yang JP, Nakai H, Hashimoto M
823 - 829	Optimization of plasma density and radial uniformity of a point-cusp magnetic field applied capacitive plasma Wickramanayaka S, Nakagawa Y, Sago Y, Numasawa Y
830 - 834	Depth distribution of plasma induced damage and dislocation generation due to an interaction of subsequent oxidation Yamaguchi T, Sasaki T, Nikoh H, Ito T
835 - 839	Platinum etching using a TiO2 hard mask in an O-2/Cl-2/Ar plasma Chung CW, Chung I
840 - 848	Large-diameter microwave plasma source excited by azimuthally symmetric surface waves Tuda M, Ono K, Ootera H, Tsuchihashi M, Hanazaki M, Komemura T
849 - 859	Diagnostic studies of aluminum etching in an inductively coupled plasma system: Determination of electron temperatures and connections to plasma-induced damage Malyshev MV, Donnelly VM, Downey SW, Colonell JI, Layadi N
860 - 863	Simulation of the influence of the filament arrangement on the gas phase during hot filament chemical vapor deposition of diamond films Song GH, Sun C, Huang RF, Wen LS
864 - 872	Diagnostics of an inductively coupled CF4/Ar plasma Hioki K, Hirata H, Matsumura S, Petrovic ZL, Makabe T
873 - 878	Study of the effects of discharge conditions and substrate temperature on Si epitaxial deposition using sputtering-type electron cyclotron resonance plasma Gao JS, Wang JL, Sakai N, Iwanaga K, Muraoka K, Nakashima H, Gao DW, Furukawa K
879 - 881	Selective etching of GaN over AlN using an inductively coupled plasma and an O-2/Cl-2/Ar chemistry Smith SA, Lampert WV, Rajagopal P, Banks AD, Thomson D, Davis RF
882 - 890	Mass-resolved ion energy distributions in continuous dual mode microwave/radio frequency plasmas in argon and nitrogen Hallil A, Zabeida O, Wertheimer MR, Martinu L
891 - 899	Kinetic study of 3C-SiC growth on Si by pyrolyzing tetramethysilane in low pressure radio frequency-induction heated chemical vapor deposition reactor Kim KC, Nahm KS, Hahn YB, Lee YS, Byun HS
900 - 906	Adhesion improvement of cubic BN : C film synthesized by a helicon wave plasma chemical vapor deposition process Kim KB, Kim SH
907 - 916	Monte Carlo simulation of vapor transport in physical vapor deposition of titanium Balakrishnan J, Boyd ID, Braun DG
917 - 921	Titanium oxide films on Si(100) deposited by electron-beam evaporation at 250 degrees C Jang HK, Whangbo SW, Kim HB, Im KY, Lee YS, Lyo IW, Whang CN, Kim G, Lee HS, Lee JM
922 - 926	Nonisomorphic ErF3 layers on Si(111) substrates grown by molecular beam epitaxy Ko JM, Durbin SD, Fukuda T, Inaba K
927 - 932	Plasma erosion of a magnesium radio-frequency cathode measured by laser-induced fluorescence Brockhaus A, Georg A, Wingsch V, Engemann J
933 - 937	Design and preparation of a 33-layer optical reflection filter of TiO2-SiO2 system Wang XR, Masumoto H, Someno Y, Chen LD, Hirai T
938 - 945	New C-F interatomic potential for molecular dynamics simulation of fluorocarbon film formation Tanaka J, Abrams CF, Graves DB
946 - 950	Synergism of transmission measurements with spectroscopic ellipsometry measurements in the analysis of a nearly opaque bimetal film stack on glass Tompkins HG, Tasic S
951 - 955	Atomic hydrogen-cleaned GaAs(100) negative electron affinity photocathode: Surface studies with reflection high-energy electron diffraction and quantum efficiency Elamrawi KA, Hafez MA, Elsayed-Ali HE
956 - 959	Excitons in ultrathin InAs/InP quantum wells: Interplay between extended and localized states Paki P, Leonelli R, Isnard L, Masut RA
960 - 964	Surface diffusion of adsorbed Si atoms on the Si(111)7x7 surface studied by atom-tracking scanning tunneling microscopy Sato T, Kitamura S, Iwatsuki M
965 - 967	Residual stress in GaN epilayers grown on silicon substrates Fu YK, Gulino DA, Higgins R
968 - 971	Wide range temperature dependence of reflection high-energy electron diffraction rocking curve from a Si(111)7x7 surface Fukaya Y, Nakamura K, Shigeta Y
972 - 979	Influence of air exposures and thermal treatments on the secondary electron yield of copper Bojko I, Hilleret N, Scheuerlein C
980 - 991	Stress, microstructure, and stability of Mo/Si, W/Si, and Mo/C multilayer films Windt DL
992 - 994	Delivery of pure ozone in ultrahigh vacuum Zhukov V, Popova I, Yates JT
995 - 1001	Novel method for absolute quantification of the flux and angular distribution of a radical source for atomic hydrogen Schwarz-Selinger T, von Keudell A, Jacob W
1002 - 1005	Low noise bipolar complementary metal-oxide-semiconductor mixer for radio frequency applications Colomines S, Parra T, Graffeuil J, Plana R
1006 - 1009	Modeling and characterization of logarithmic complementary metal-oxide-semiconductor active pixel sensors Tabet M, Tu N, Hornsey R
1010 - 1015	Real time scanning tunneling microscopy study of the initial stages of oxidation of Ni(111) between 400 and 470 K Hildebrandt S, Hagendorf C, Doege T, Jeckstiess C, Kulla R, Neddermeyer H, Uttich T
1016 - 1024	Designs, analyses, and tests of a spiral-grooved turbobooster pump Jou RY, Cheng HP, Chang YW, Chen FZ, Iwane M
1025 - 1034	Molecular transition and slip flows in the pumping channels of drag pumps Heo JS, Hwang YK
1035 - 1037	Evacuating flat glass panels Collins RE, Lenzen M, Ng N
1038 - 1040	Microhardness and structural analysis of (TI,AI)N, (Ti,Cr)N, (Ti,Zr)N and (TI,V)N films Hasegawa H, Kimura A, Suzuki T
1041 - 1044	Patterning of polycrystalline diamond thin films on a variety of substrates by selectively seeding with purified ultrafine diamond powder Liu HW, Gao CX, Li X, Wang CX, Han YH, Zou GT, Wang WK, Sun LL, Wen C
1045 - 1047	A gradational lead screw dry vacuum pump Akutsu I, Matsuoka T, Ozaki M, Kyuko T, Miyashita S, Ozawa T, Naka M, Ohnishi H, Narahara Y, Horikoshi G