검색결과 : 143건
| No. | Article |
|---|---|
| 1 |
Fundamental investigation on interaction between hexafluoroisopropylalcohol-containing styrene and photochemical acid generator for rationale design of photoresist system Doi T, Shimokawa T, Sudo A, Endo T Journal of Polymer Science Part A: Polymer Chemistry, 57(4), 531, 2019 |
| 2 |
Dual-Responsive Polydimethylsiloxane Networks Giebler M, Radl SV, Ast M, Kaiser S, Griesser T, Kern W, Schlogl S Journal of Polymer Science Part A: Polymer Chemistry, 56(20), 2319, 2018 |
| 3 |
Photoinduced Cross-Linking of Dynamic Poly(disulfide) Films via Thiol Oxidative Coupling Feillee N, Chemtob A, Ley C, Croutxe-Barghorn C, Allonas X, Ponche A, Le Nouen D, Majjad H, Jacomine L Macromolecular Rapid Communications, 37(2), 155, 2016 |
| 4 |
Design and application of photo-reversible elastomer networks by using the [4 pi s+4 pi s] cycloaddition reaction of pendant anthracene groups Manhart J, Ayalur-Karunakaran S, Radl S, Oesterreicher A, Moser A, Ganser C, Teichert C, Pinter G, Kern W, Griesser T, Schlogl S Polymer, 102, 10, 2016 |
| 5 |
Advanced Photoresist Technologies by Intricate Molecular Brush Architectures: Diblock Brush Terpolymer-Based Positive-Tone Photoresist Materials Sun GR, Cho SH, Yang F, He X, Pavia-Sanders A, Clark C, Raymond JE, Verkhoturov SV, Schweikert EA, Thackeray JW, Trefonas P, Wooley KL Journal of Polymer Science Part A: Polymer Chemistry, 53(2), 193, 2015 |
| 6 |
Base-Amplifying Silicone Resins with Photobase-Generating Side Chains and Their Application to Negative-Working Photoresists Furutani M, Kobayashi H, Gunji T, Abe Y, Arimitsu K Journal of Polymer Science Part A: Polymer Chemistry, 53(10), 1205, 2015 |
| 7 |
Fluorous Solvent-Soluble Imaging Materials Containing Anthracene Moieties Park HJ, Jung H, Kim SH, Park M, Kim JH, Son J, Jung BJ, Hwang DH, Lee C, Lee JK, Yoon JG, Yoon SY Journal of Polymer Science Part A: Polymer Chemistry, 53(10), 1252, 2015 |
| 8 |
Synthesis of hyperbranched polyacetals via a(n)+b(2)-type polyaddition (n=3, 8, 18, and 21): Candidate resists for extreme ultraviolet lithography Kudo H, Matsubara S, Yamamoto H, Kozawa T Journal of Polymer Science Part A: Polymer Chemistry, 53(20), 2343, 2015 |
| 9 |
Initiated Chemical Vapor Deposition and Light-Responsive Cross-Linking of Poly(vinyl cinnamate) Thin Films Petruczok CD, Armagan E, Ince GO, Gleason KK Macromolecular Rapid Communications, 35(15), 1345, 2014 |
| 10 |
A Polyurethane-Based Positive Photoresist Garcia-Fernandez L, Specht A, del Campo A Macromolecular Rapid Communications, 35(20), 1801, 2014 |