Journal of Polymer Science Part A: Polymer Chemistry, Vol.53, No.20, 2343-2350, 2015
Synthesis of hyperbranched polyacetals via a(n)+b(2)-type polyaddition (n=3, 8, 18, and 21): Candidate resists for extreme ultraviolet lithography
Polyaddition (A(n)+B-2) reactions of 1,1,1-tris(4-hydoxyphenyl) ethane (THPE; A(3)-type monomer), calix[4]resorcinarene (CRA[4]; A(8)-type monomer), -cyclodextrin (-CD; A(18)-type monomer), and -cyclodextrin (-CD; A(21)-type monomer) with 1,4-bis(4-vinyloxy)cyclohexane (BVOC; B-2-type monomer) afforded corresponding soluble hyperbranched polyacetals. The physical properties, including solubility, thermal stability, and film-forming ability, the ultraviolet-induced degradation reactivity, and the solubility-switch in an extreme ultraviolet (EUV) exposure tool indicated that poly(THPE-co-BVOC) and poly(CRA[4]-co-BVOC) are candidate next-generation photo-resists. (c) 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2015, 53, 2343-2350
Keywords:addition polymerization;degradation;electron beam;extreme ultraviolet;hyperbranched polyacetal;polyaddition;photoresists;synthesis