Previous Article Next Article Table of Contents Journal of Polymer Science Part A: Polymer Chemistry, Vol.53, No.2, 193-199, 2015 DOI10.1002/pola.27362 Export Citation Advanced Photoresist Technologies by Intricate Molecular Brush Architectures: Diblock Brush Terpolymer-Based Positive-Tone Photoresist Materials Sun GR, Cho SH, Yang F, He X, Pavia-Sanders A, Clark C, Raymond JE, Verkhoturov SV, Schweikert EA, Thackeray JW, Trefonas P, Wooley KL Keywords:diblock brush terpolymer;lithography;photoresists;ROMP;vertical alignment on substrate Please enable JavaScript to view the comments powered by Disqus.
