검색결과 : 7건
| No. | Article |
|---|---|
| 1 |
Extreme ultraviolet mask fabrication with high inspection contrast TaSiNx absorber stack Wasson JR, Weisbrod EJ, Lu B, Mangat PJS, Dauksher WJ, Resnick DJ, Sohn J, Engelstad R, Pettibone D Journal of Vacuum Science & Technology B, 21(6), 3086, 2003 |
| 2 |
Proximity and heating effects during electron-beam patterning of ultraviolet lithography masks Lu B, Wasson JR, Weisbrod EJ, Masnyj Z, Mangat PJS, Nordquist K, Resnick D Journal of Vacuum Science & Technology B, 20(6), 3029, 2002 |
| 3 |
Writing, repairing, and inspecting of extreme ultraviolet lithography reticles considering the impact of the materials Wasson JR, Lu B, Mangat PJS, Nordquist K, Resnick DJ Journal of Vacuum Science & Technology B, 19(6), 2635, 2001 |
| 4 |
Cr absorber etch process for extreme ultraviolet lithography mask fabrication Smith KH, Wasson JR, Mangat PJS, Dauksher WJ, Resnick DJ Journal of Vacuum Science & Technology B, 19(6), 2906, 2001 |
| 5 |
Experimental evaluation of an optimized radiation cooling geometry for ion projection lithography masks Torres JL, Nounu HN, Wasson JR, Wolfe JC, Lutz J, Haugeneder E, Loschner H, Stengl G, Kaesmaier R Journal of Vacuum Science & Technology B, 18(6), 3207, 2000 |
| 6 |
TaSiN thin-film pattern transfer optimization for 200 mm SCALPEL and extreme ultraviolet lithography masks Dauksher WJ, Resnick DJ, Clemens SB, Standfast DL, Masnyj ZS, Wasson JR, Bergmann NM, Han SI, Mangat PJS Journal of Vacuum Science & Technology B, 18(6), 3232, 2000 |
| 7 |
Ion absorbing stencil mask coatings for ion beam lithography Wasson JR, Torres JL, Rampersad HR, Wolfe JC, Ruchhoeft P, Herbordt M, Loschner H Journal of Vacuum Science & Technology B, 15(6), 2214, 1997 |