검색결과 : 9건
| No. | Article |
|---|---|
| 1 |
Using SIMS and the NIST standard reference material #2137 to calibrate standards used in the B-11 (p, alpha) Be-8 nuclear reaction analysis of B in Si Magee CW, Jacobson DC Applied Surface Science, 203, 310, 2003 |
| 2 |
Transient enhanced diffusion of B in Si implanted with decaborane cluster ions Sosnowski M, Albano MA, Li C, Gossmann HJL, Jacobson DC Journal of the Electrochemical Society, 149(8), G474, 2002 |
| 3 |
Thin-film resistor fabrication for InP technology applications Kopf RF, Melendes R, Jacobson DC, Tate A, Melendes MA, Reyes RR, Hamm RA, Yang Y, Frackoviak J, Weimann NG, Maynard HL, Liu CT Journal of Vacuum Science & Technology B, 20(3), 871, 2002 |
| 4 |
Electrical properties of cobalt and copper contamination in processed silicon Benton JL, Boone T, Jacobson DC, Silverman PJ, Rosamilia JM, Rafferty CS, Weinzierl S, Vu B Journal of the Electrochemical Society, 148(6), G326, 2001 |
| 5 |
Behavior of molybdenum in silicon evaluated for integrated circuit processing Benton JL, Jacobson DC, Jackson B, Johnson JA, Boone T, Eaglesham DJ, Stevie FA, Becerro J Journal of the Electrochemical Society, 146(5), 1929, 1999 |
| 6 |
On the Mechanism of the Hydrogen-Induced Exfoliation of Silicon Weldon MK, Marsico VE, Chabal YJ, Agarwal A, Eaglesham DJ, Sapjeta J, Brown WL, Jacobson DC, Caudano Y, Christman SB, Chaban EE Journal of Vacuum Science & Technology B, 15(4), 1065, 1997 |
| 7 |
The Mechanisms of Iron Gettering in Silicon by Boron Ion-Implantation Benton JL, Stolk PA, Eaglesham DJ, Jacobson DC, Cheng JY, Poate JM, Myers SM, Haynes TE Journal of the Electrochemical Society, 143(4), 1406, 1996 |
| 8 |
Structural and Chemical Characteristics and Oxidation Behavior of Chromium-Implanted Single-Crystal Silicon-Carbide Du H, Yang Z, Libera M, Jacobson DC, Wang YC, Davis RF Journal of Materials Science, 30(10), 2668, 1995 |
| 9 |
Depth Profiling of Dopants in Thin Gate Oxides in Complementary Metal-Oxide-Semiconductor Structures by Resonance Ionization Mass-Spectrometry Downey SW, Emerson AB, Georgiou GE, Bevk J, Kistler RC, Moriya N, Jacobson DC, Wise ML Journal of Vacuum Science & Technology B, 13(2), 167, 1995 |