화학공학소재연구정보센터
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No. Article
1 Plasma-Assisted Dry-Etching of Cobalt Silicide for Microelectronics Applications
Fracassi F, Dagostino R, Lamendola R, Filippo A, Rapisarda C, Vasquez P
Journal of the Electrochemical Society, 143(2), 701, 1996
2 Deposition of Gold-Containing Siloxane Thin-Films
Fracassi F, Dagostino R, Palumbo F, Bellucci F, Monetta T
Thin Solid Films, 272(1), 60, 1996
3 Dry-Etching of Palladium Thin-Films in Fluorine-Containing Plasmas - X-Ray Photoelectron-Spectroscopy Investigation
Fracassi F, Dagostino R, Cacucci A
Journal of Vacuum Science & Technology A, 13(1), 63, 1995
4 Dry-Etching of Titanium Nitride Thin-Films in CF4-O-2 Plasmas
Fracassi F, Dagostino R, Lamendola R, Mangieri I
Journal of Vacuum Science & Technology A, 13(2), 335, 1995
5 Plasma-Assisted Deposition of Tungsten-Containing Siloxane Thin-Films
Fracassi F, Dagostino R, Palumbo F, Bellucci F, Monetta T
Thin Solid Films, 264(1), 40, 1995
6 Plasma Deposition of Thin-Films from a Fluorine-Containing Cyclosiloxane
Favia P, Caporiccio G, Dagostino R
Journal of Polymer Science Part A: Polymer Chemistry, 32(1), 121, 1994
7 Fluorinated Diamond-Like Carbon-Films Deposits from Radiofrequency Glow-Discharge in a Triode Reactor
Dagostino R, Lamendola R, Favia P, Giquel A
Journal of Vacuum Science & Technology A, 12(2), 308, 1994