| 초록 |
Extreme Ultra Violet Lithography(EUVL) has been introduced and investigated as a next generation lithography tool for 20nm node devices. In our research, we have studied on the development of EUV dedicated photo acid generators(PAG), one element of EUV photoresist which makes high resolution ability for increasing pattern density. Therefore we have designed and synthesized the new PAG based on the following concept; Easy preparation, low cost and high efficiency, light stability for EUV exposure to release acid. Now, we have obtained feasible results of outgassing and exposure for EUV lithography. |
