| 초록 |
Polymer has been playing an important role in innovative semiconductor development as a key material for various core processes. Due to its characteristic properties and versatilty through functionalization, polymers have been widely utilized in semiconductor industry. Photoresist is one of the most prominent applications of polymer to semiconductor manufacturing process. Continuing shrinkage of feature size has kept asking for polymer structure change as a major ingredient of photoresist, and now demands new materials for 20nm or less patterns. Extreme UV (EUV) is the light with 13~15nm wavelength range. To utilize this powerful light for nano-scale features, enormous researches are in progress. In this paper, we will review the studies on new polymeric materials for EUV lithography and prospect the application of them to newly emerging lithographic technique. |
