Applied Surface Science, Vol.257, No.23, 10036-10041, 2011
Microstructures and optical properties of Cu-doped ZnO films prepared by radio frequency reactive magnetron sputtering
Pure and Cu-doped ZnO (ZnO:Cu) thin films were deposited on glass substrates using radio frequency (RF) reactive magnetron sputtering. The effect of substrate temperature on the crystallization behavior and optical properties of the ZnO:Cu films have been studied. The crystal structures, surface morphology and optical properties of the films were systematically investigated by X-ray diffraction (XRD), scanning electron microscopy (SEM) and a fluorescence spectrophotometer, respectively. The results indicated that ZnO films showed a stronger preferred orientation toward the c-axis and a more uniform grain size after Cu-doping. As for ZnO:Cu films, the full width at half maxima (FWHM) of (0 0 2) diffraction peaks decreased first and then increased, reaching a minimum of about 0.42 degrees at 350 degrees C and the compressive stress of ZnO:Cu decreased gradually with the increase of substrate temperature. The photoluminescence (PL) spectra measured at room temperature revealed two blue and two green emissions. Intense blue-green luminescence was obtained from the sample deposited at higher substrate temperature. Finally, we discussed the influence of annealing temperature on the structural and optical properties of ZnO:Cu films. The quality of ZnO:Cu film was markedly improved and the intensity of blue peak (similar to 485 nm) and green peak (similar to 527 nm) increased noticeably after annealing. The origin of these emissions was discussed. (C) 2011 Elsevier B.V. All rights reserved.
Keywords:Cu-doped ZnO thin films;RF magnetron sputtering;Microstructure;X-ray diffraction;Optical properties