Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology A, Vol.26, No.5, 1357-1361, 2008 DOI10.1116/1.2956630 Export Citation Investigation of a vapor deposited thin silica film as a novel substrate for in situ Fourier transform infrared spectroscopy Anderson A, Ashurst WR Please enable JavaScript to view the comments powered by Disqus.
