Journal of Crystal Growth, Vol.310, No.7-9, 2320-2325, 2008
Self-assembled InGaN quantum dots on GaN emitting at 520 nm grown by metalorganic vapor-phase epitaxy
Self-assembled InGaN quantum dots (QDs) have been grown using metalorganic vapor-phase epitaxy (MOVPE), without using anti-surfactant. Using 120s annealing, InGaN QDs have been successfully formed with a circular base diameter of 40 nm and an average height of 4 nm, with QDs density of 4 x 10(9)cm(-2). The InGaN QDs have peak photoluminescence (PL) wavelengths of 519 and 509 nm for samples without and with a GaN upper barrier, respectively. The full-width half-maximum (FWHM) of the PL spectra ranges from 56.6 up to 69.6 nm. These results demonstrates that high In-content InGaN QDs can be grown by MOVPE, and can potentially be utilized as the active media for light-emitting diodes (LEDs) and semiconductor laser diodes for green emission. (C) 2008 Elsevier B.V. All rights reserved.
Keywords:low-dimensional structures;nanostructures;metalorganic chemicalvapor deposition;nitrides;semiconducting III-V materials