The photoelectrodeposition of copper on semiconducting B-doped diamond films was investigated. There were clear morphology differences between photoelectrodeposited and electrodeposited copper. Photoelectrodeposition proceeded by a uniform two-dimensional growth process, whereas electrodeposition involved isolated random deposition. By applying this effect we have succeeded in forming a conductive copper pattern on semiconducting B-doped diamond with the aid of a photo-mask. Interestingly, it was further found that changes occurring on the diamond surface during photoelectrochemical polarization in the absence of copper in solution facilitate subsequent copper electrodeposition in the dark, possibly due to the formation of subsurface hydrogen. We refer to this as the ＇photographic diamond surface phenomenon＇.