We describe a new method that allows photopolymerization of hydrogels to occur on surfaces functionalized with eosin. In this work, glass and silicon surfaces were derivatized with eosin and photopolymerization was carried out using visible light (514 nm). This mild condition may have advantages over methods that use ultraviolet (UV) light (e.g., for encapsulation of cells and proteins, in drug screening, or in biosensing applications). The hydrogel formed on the modified surface is remarkably stable for an extended period of time. The resultant hydrogel was hydrated for more than 18 months without suffering delamination from the substrate surface. This strongly suggests covalent attachment of the hydrogel to the surface. Contact angle titration measurements and X-ray photoelectron spectroscopy analysis of eosin surfaces before and after irradiation in the presence of triethanolamine suggest that the eosin radical is responsible for the covalent attachment of the gel onto the substrate surface. This method allows for 2-D patterning of hydrogels, which is demonstrated here using the microcontact printing technique. However, noncontact photolithography could be used to form similar patterns by directing light through a mask. This method can be easily implemented to form arrays of fluorophores and proteins in situ.