In order to prepare highly fluorinated fullerene, C60Fx, film and to realize the perfluorination of fullerene film as C60F60, RF CF4 plasma is used. From the experimental results, it is found that the best condition for preparation of highly fluorinated fullerene is to restrain the rising temperature of the substrate during the fluorination of fullerene film by using the cooling system and to use ions with lower energy by using the lower input power and symmetric structure of electrodes. In this study, fluorinated fullerene films with double shaped distribution as two peaks at C60F14 and C60F43 was obtained, and the strong intensity at around C60F60, is also detected by using RF CF4 plasma with cooling system.