The aim of this paper is to elucidate the influence of the deposition parameters on the structure and the texture of thin chromium films obtained by vacuum are evaporation. Both parameters related directly to the deposition process such as the argon pressure, are current and bias voltage, and those concerning the substrate such as its temperature and its nature, are taken into consideration. The structure and the texture were analysed by X-ray diffraction (XRD). It was found that only two parameters have a strong influence on these characteristics : the substrate temperature and the bias voltage. The increase in substrate temperature causes the (110) texture to change to a (200) texture, whereas the increase in bias voltage (in absolute value) tends to enhance the (110) texture. It was also found that the texture of the chromium films seems to be very sensitive to the presence of impurities.