The effect of N+ implantation on the microstructural and tribological properties of r.f.-sputtered MoS2 films was studied. The cross-section scanning electron micrographs show that, after N+ implantation, the loose column structure of the sputtered MoS2 films increases in density. A decrease in film thickness of about 50% is also observed. The results of X-ray diffraction analysis show that N+ bombardment enhances the (100) edge plane orientation of the MoS, crystal in the film. The scratch test indicates an improved film-substrate adherence. The tribological test results indicate that N+ implantation yields a distinct enhancement in the wear life of the sputtered MoS2 films. Compared with the as-deposited MoS2 film, the wear life of the sputtered MoS2 films implanted with 150 keV N+ at 1 x 10(16) N+ cm-2 shows a threefold increase in a relative humidity of 60%-70% and a twofold increase in a vacuum of 5 x 10(-3) Pa. However, N+ implantation increases the friction coefficient. The lubrication model of the N+-modified film is given.