Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology B, Vol.13, No.3, 902-907, 1995 DOI10.1116/1.588203 Export Citation Silicon Surface Cleaning by Oxidation with Electron-Cyclotron-Resonance Oxygen Plasma After Contact Hole Dry-Etching Sakuma K, Machida K, Kamoshida K, Sato Y, Imai K, Arai E Keywords:BARRIER [Referenced By] Please enable JavaScript to view the comments powered by Disqus.
