Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology B, Vol.12, No.6, 3528-3532, 1994 DOI10.1116/1.587464 Export Citation Stress-Induced Pattern-Placement Errors in Thin Membrane Masks Liddle JA, Volkert CA Keywords:X-RAY MASKS;STENCIL MASKS;MU-M;LITHOGRAPHY;ABSORBER;EXPOSURE Please enable JavaScript to view the comments powered by Disqus.
