Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology B, Vol.12, No.6, 3351-3355, 1994 DOI10.1116/1.587511 Export Citation Effects of Etch Chemistry on SF6-Based Tungsten Etching by Electron-Cyclotron-Resonance Reactive Ion Etching Eddy CR, Kosakowski J, Shirey LM, Dobisz EA, Rhee KW, Chu W, Foster KW, Marrian CR, Peckerar MC Keywords:X-RAY MASKS;PLASMAS;DISCHARGES Please enable JavaScript to view the comments powered by Disqus.
