Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology B, Vol.12, No.6, 3347-3350, 1994 DOI10.1116/1.587510 Export Citation Electron-Cyclotron-Resonance Ion Stream Etching with High Uniformity and Accuracy for Metal-Oxide-Semiconductor Gate Fabrication Takahashi C, Matsuo S Keywords:PLASMA Please enable JavaScript to view the comments powered by Disqus.
