Performance of inverted organic photovoltaic cells with nitrogen doped TiO2 films by atomic layer deposition

Muhammad Zafar; Ju-Young Yun; Do-Heyoung Kim

Korean Journal of Chemical Engineering, Vol.35, No.2, 567-573, February, 2018

DOI10.1007/s11814-017-0285-9 Export Citation

Performance of inverted organic photovoltaic cells with nitrogen doped TiO2 films by atomic layer deposition

Muhammad Zafar, Ju-Young Yun¹, and Do-Heyoung Kim^†

School of Chemical Engineering, Chonnam National University, 300 Youngbong-dong, Gwangju 61186, Korea
¹Center for Vacuum, Korea Research Institute of Standards and Science, 267 Gajeong-ro, Daejeon 34113, Korea

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Atomic layer deposition (ALD) was used to synthesize titanium oxide (TiO2) film as an electron transport layer (ETL) in inverted organic photovoltaic cells (IOPVs). By adjusting the ALD precursor ratio and deposition temperature, the thickness of the TiO2 film was 5 nm, and its effect on the photovoltaic performances was evaluated. We also investigated the effect of nitrogen doping of TiO2 on the power conversion efficiency (PCE) of the cells. An IOPV cell fabricated with a 0.6%-nitrogen-doped TiO2 (N-TiO2 A) ETL exhibited a PCE of 2.27%, which is a 6% increase compared with an equivalent cell containing an undoped TiO2 ETL. Furthermore, the XPS results confirmed the doping of nitrogen into the samples. The doping improved the electrical properties of the TiO2 films evidenced by the Hall measurements in terms of conductivity, hall electron mobility and carrier density.

Keywords:Electron Transport Layer;Atomic Layer Deposition;Inverted Organic Photovoltaic Cell;Titanium Dioxide;Nitrogen Doping

[References]

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Pham VHT, Truong NTN, Trinh TK, Lee SH, Park C, Korean J. Chem. Eng., 33(2), 678 (2016)
Irwin MD, Buchholz DB, Hains AW, Chang RPH, Marks TJ, Proc. Nat. Ac. Sci., 105, 2783 (2008)
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He Z, Xiao B, Liu F, Wu H, Yang Y, Xiao S, Wang C, Russell TP, Cao Y, Nature Photonics, 9, 174 (2015)
Zafar M, Yun JY, Kim DH, Korean J. Chem. Eng., 34(5), 1504 (2017)
Rao AD, Karalatti S, Thomas T, Ramamurthy PC, ACS Appl. Mater. Interfaces, 6, 16792 (2014)
Zafar M, Yun JY, Kim DH, Appl. Surf. Sci., 398, 9 (2017)
Cho HH, Cho CH, Kang H, Yu H, Oh JH, Kim BJ, Korean J. Chem. Eng., 32(2), 261 (2015)
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Aprilia A, Wulandari P, Suendo V, Herman, Hidayat R, Fujii A, Ozaki M, Sol. Energy Mater. Sol. Cells, 111, 181 (2013)
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[15] Cho HS, Shin N, Kim K, Kim B, Kim DH, Synthetic Metals, 207, 31 (2015)

[16] Kim JG, Shi D, Kong KJ, Heo YU, Kim JH, Jo MR, Lee YC, Kang YM, Dou SX, ACS Appl. Mater. Interfaces, 5, 691 (2013)

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[32] Kawamura M, Abe Y, Yanagisawa H, Sasaki K, Thin Solid Films, 287(1-2), 115 (1996)