Korean Journal of Materials Research, Vol.17, No.7, 386-389, July, 2007
다양한 기판위에 증착된 BST 박막의 열처리 온도에 따른 마이크로파 유전성질과 미세구조 변화
Microwave Properties and Microstructures of (Ba,Sr)TiO3 Thin Films on Various Substrates with Annealing Temperature
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The dielectric properties of ferroelectric thin films have been investigated according to the substrates in order to optimize the their properties. MgO, r-plane sapphire, and poly-crystalline sapphire (Alumina) substrates have been used to deposite ferroelectric thin films by RF magnetron sputtering. The BST thin films deposited on the single crystal (100)MgO substrates have high tunability and low dielectric loss. These results are caused by a low misfit between the lattice parameters of the BST films and the substrate. The BST films deposited on r-plane sapphire have relatively high misfit, and the tunability of 17% and dielectric loss of 0.0007. To improve the dielectric properties of the BST films, the post-annealing methods has been introduced. The BST films deposited on (100)MgO, (1102)r-plane sapphire, and poly-crystalline sapphire substrates have best properties in post-annealing conditions of , , and , respectively. The different optimal post-annealing conditions have been found according to the different misfits between the films and substrates, and thermal expansion coefficients. Moreover, the films deposited on alumina substrate which is relatively cheap have a good tunability properties of 23% by the post-annealing.
- Stephen Cheung W, Frederic H. Levien, Microwave Made Simple: Principles and Application, Artech House, (1985) (1985)
- Miranda FA, Subramanyam G, Van Keuls FW, Romanofsky RR, Warne JD, Muller CH, IEEE Troms. Microwave Theory Tech., 48(7), 1181 (2000)
- Kang CY, Yoon SJ, Kim HJ, J. of KIEEME, 18(6), 532 (2005)
- Lancaster MJ, Powell J, Porch A, Supercond. Sci. Technol., 11(11), 1323 (1998)
- Ha JY, Choi JW, Kang CY, Karmanenko SF, Yoon SJ, Choi DJ, Kim HJ, Jpn, J. Appl. Phys., 44(38), L1196 (2005)
- Rose TL, Kelliher EM, Scoville AN, Stone SE, J. Appl. Phys., 55(10), 3706 (1984)
- Li P, McDonald JF, Lu TM, J. Appl. Phys., 71(11), 5596 (1992)
- Kwak BS, Zhang K, Boyd EP, Erbil A, Wilkens BJ, J. Appl. Phys., 69(2), 767 (1991)
- Alexander Tagantsev, Appl. Phys. Letts., 76, 1182 (2000)
- Vendik OG, Zubbko SP, Nikolski MA, Zh. Tekh. Fiz. Tech. Phys., 44, 4 (1999)
- Cho KH, Ha JY, Choi JW, Kim JS, Yoon SJ, Kang CY, J. Korean Phys. Soc., 49(3), 1076 (2006)