ZnO layers grown by Atomic Layer Deposition: A new material for transparent conductive oxide

Godlewski M; Guziewicz E; Luka G; Krajewski T; Lukasiewicz M; Wachnicki L; Wachnicka A; Kopalko K; Sarem A; Dalati B

Thin Solid Films, Vol.518, No.4, 1145-1148, 2009

DOI10.1016/j.tsf.2009.04.066 Export Citation

ZnO layers grown by Atomic Layer Deposition: A new material for transparent conductive oxide

Godlewski M, Guziewicz E, Luka G, Krajewski T, Lukasiewicz M, Wachnicki L, Wachnicka A, Kopalko K, Sarem A, Dalati B

We demonstrate possibility of a control (by selection of zinc precursors and variation of a growth temperature) of electrical properties of ZnO films grown by Atomic Layer Deposition (ALD). ZnO films grown by ALD are used in test photovoltaic devices (solar cells) as transparent conductive oxides for upper, transparent layer in inorganic and organic solar cells. and as n-type partners of p-type CdTe. (C) 2009 Elsevier B.V. All rights reserved.

Keywords:Atomic Layer Deposition;Photovoltaics;ZnO;Transparent conductive oxides;CdTe;Organic materials