Com. Ti plates were electrolytically polished, anodic passivated by oxidn. in 30% soln. K(2)SiO(3) for 5 min at 20-120 V and studied for surface morphol., roughness and hardness as well as for corrosion resistance in 5% soln. of NaCl by a potentiodynamic method. A formation of TiO(2)/SiO(2) layer on the Ti plates was obsd. The presence of Si in the layer resulted in an increase in the surface hardness. A decrease in the corrosion current d. from 325 nA/cm(2) down to below 10 nA/cm(2) was achieved when the anodic oxidn. was carried out at the voltage below 100 V.