Thin Solid Films

Thin Solid Films, Vol.390, No.1-2 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (46 articles)

1 - 6	LiNb1-xTaxO3 films prepared by thermal plasma spray CVD Yamamoto H, Kulinich SA, Terashima K
7 - 12	Rapid hard tooling by plasma spraying for injection molding and sheet metal forming Zhang HO, Wang GL, Luo YH, Nakaga T
13 - 19	Numerical simulation of coating growth and pore formation in rapid plasma spray tooling Chen YX, Wang GL, Zhang HO
20 - 25	Surface modification of titanium oxide in pulse-modulated induction thermal plasma Ishigaki T, Haneda H, Okada N, Ito S
26 - 30	B-C-N nanotubes prepared by a plasma evaporation method Moriyoshi Y, Shimizu Y, Watanabe T
31 - 36	Synthesis of fullerenes from carbon powder by using high power induction thermal plasma Wang C, Imahori T, Tanaka Y, Sakuta T, Takikawa H, Matsuo H
37 - 43	Synthesis of new ceramics from powder mixtures using thermal plasma processing Fukumasa O
44 - 50	Preparation of ultrafine particles of silicon base intermetallic compound by arc plasma method Watanabe T, Itoh H, Ishii Y
51 - 58	Microwave plasma enhanced CVD of aluminum oxide films: OES diagnostics and influence of the RF bias Tristant P, Ding Z, Vinh QBT, Hidalgo H, Jauberteau JL, Desmaison J, Dong C
59 - 63	Quantitative modeling of reactive sputtering process for MgO thin film deposition Matsuda Y, Otomo K, Fujiyama H
64 - 69	Characterization of multilayer films of Ti-Al-O-C-N system prepared by pulsed d.c. plasma-enhanced chemical vapor deposition Kawata K, Sugimura H, Takai O
70 - 75	Preparation of strontium titanate thin firms by mirror-confinement-type electron cyclotron resonance plasma sputtering Baba S, Numata K, Saito H, Kumagai M, Ueno T, Kyoh B, Miyake S
76 - 82	Large-area uniform dust-free plasma CVD Fujiyama H, Maemura Y, Yamaguchi T
83 - 87	Anomalous behavior of electron temperature in silane glow discharge plasmas Takai M, Nishimoto T, Kondo M, Matsuda A
88 - 92	Reduction of carbon impurities in silicon oxide films prepared by rf plasma-enhanced CVD Teshima K, Inoue Y, Sugimura H, Takai O
93 - 97	Dissociation process of CH4/H-2 gas mixture during EACVD Dong LF, Chen JY, Li XW, Zhang LS, Han L, Fu GS
98 - 103	CVD of hard DLC films in a radio frequency inductively coupled plasma source Yu SJ, Ding ZF, Xu J, Zhang JL, Ma TC
104 - 106	Adhesion improvement of diamond films on cemented carbides with copper implant layer Ma ZB, Wang JH, Wu QC, Wang CX
107 - 112	Characterization of CNx films prepared by twinned ECR plasma source enhanced DC magnetron sputtering Xu J, Deng XL, Zhang JL, Lu WQ, Ma TC
113 - 118	A study on the formation and characteristics of the Si-O-C-H composite thin films with low dielectric constant for advanced semiconductor devices Yang CS, Oh KS, Ryu JY, Kim DC, Shou-Yong J, Choi CK, Lee HJ, Um SH, Chang HY
119 - 122	Localized material growth by a dielectric barrier discharge Jiang N, Qian SF, Wang L, Zhang HX
123 - 129	Investigation of deposition rate and structure of pulse DC plasma polymers Zhang J, van Ooij W, France P, Datta S, Radomyselskiy A, Xie HQ
130 - 133	Synthesis of multi-walled carbon nanotubes by microwave plasma-enhanced chemical vapor deposition Wang XH, Hu Z, Wu Q, Chen X, Chen Y
134 - 138	Surface reaction processes in C4F8 and C5F8 plasmas for selective etching of SiO2 over photo-resist Motomura H, Imai S, Tachibana K
139 - 144	Dynamic nitrogen and titanium plasma ion implantation/deposition at different bias voltages Tian XB, Wang LP, Zhan QY, Chu PK
145 - 148	Steady-state direct-current plasma immersion ion implantation using an electron cyclotron resonance plasma source Zeng XC, Chu PK, Chen QC, Tong HH
149 - 153	Pulsed high energy density plasma processing silicon surface Liu B, Liu CZ, Cheng DJ, He R, Yang SZ
154 - 158	Oxidative degradation of acridine orange induced by plasma with contact glow discharge electrolysis Gao JZ, Hu ZG, Wang XY, Hou JG, Lu XQ, Kang JW
159 - 164	Stabilization of chlorofluorocarbons (CFCs) by plasma copolymerization with hydrocarbon monomers Tsuji O, Minaguchi T, Nakano H
165 - 169	A novel pulsed plasma for chemical conversion Yao SL, Suzuki E, Nakayama A
170 - 174	Study on mechanism of C-H radicals' recombination into acetylene in the process of coal pyrolysis in hydrogen plasma Li MD, Fan YS, Dai B, Deng WW, Liu XL
175 - 180	Three-dimensional simulation of a plasma jet with transverse particle and carrier gas injection Li HP, Chen X
181 - 185	Modeling of the supersonic argon plasma jet at low gas pressure environment Han P, Chen X
186 - 191	Numerical analysis and experiments on transferred plasma torches for finding appropriate operating conditions and electrode configuration for a waste melting process Hur M, Hwang TH, Ju WT, Lee CM, Hong SH
192 - 196	Anode mode in cathodic arc deposition apparatus with various cathodes and ambient gases Miyano R, Saito T, Kimura K, IKeda M, Takikawa H, Sakakibara T
197 - 201	Optical emission patterns and microwave field distributions in a cylindrical microwave plasma source Fang F, Liang RQ, Ou QR, Sui YF
202 - 207	Production of low electron temperature ECR plasma for plasma processing Itagaki N, Ueda Y, Ishii N, Kawai Y
208 - 211	Ion and neutral temperatures in an electron cyclotron resonance plasma Yonesu A, Shinohara S, Yamashiro Y, Kawai Y
212 - 216	Ion-burst method for positive and negative ion species measurements Yoshimura S, Ichiki R, Shindo M, Kawai Y
217 - 221	Characteristics of VHF excited hydrogen plasmas using a ladder-shaped electrode Takeuchi Y, Kawasaki I, Mashima H, Murata M, Kawai Y
222 - 227	Estimate of the negative ion density in reactive gas plasmas Shindo M, Ichiki R, Yoshimura S, Kawai Y
228 - 233	Low-frequency modes in two-dimensional Debye-Yukawa plasma crystals Wang XG, Liu Y, Bhattacharjee A, Hu SH
234 - 236	Multiple microscale plasma CVD apparatuses on a substrate Ito T, Terashima K
237 - 242	Dielectric barrier discharge - properties and applications Xu XJ
243 - 247	Study on formation process of surface plasma Zhang GQ, Ge YJ, Yang WJ, Zhao ZF
VII - VII	Proceedings of the 5th Asia-Pacific Conference on Plasma Science & Technology and the 13th Symposium on Plasma Science for Materials, Dalian, China, 10-13 September, 2000 - Preface Tachibana K, Watanabe T, Yang XF