Thin Solid Films

Thin Solid Films, Vol.447 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (118 articles)

1 - 6	Demonstration of the Stierwalt effect caused by scatter from induced coating defects in multilayer dielectric filters Barrie JD, Fuqua PD, Jones BL, Presser N
7 - 13	Structure and tribological behaviour of nanoscale multilayer C/Cr coatings deposited by the combined steered cathodic arc/unbalanced magnetron sputtering technique Hovsepian PE, Kok YN, Ehiasarian AP, Erdemir A, Wen JG, Petrov I
14 - 19	Optical properties of aluminium oxide thin films prepared at room temperature by off-plane filtered cathodic vacuum arc system Zhao ZW, Tay BK, Yu GQ, Chua DHC, Lau SR, Cheah LK
20 - 25	Improved mechanical properties of optical coatings via an enhanced sputtering process West GT, Kelly PJ
26 - 32	Mechanical modelling of multilayer optical coatings G-Berasategui E, Bull SJ, Page TF
33 - 39	The characteristics of aluminium-doped zinc oxide films prepared by pulsed magnetron sputtering from powder targets Zhou Y, Kelly PJ, Postill A, Abu-Zeid O, Alnajjar AA
40 - 45	Study of TiO2 film growth mechanisms in low-pressure plasma by in situ real-time spectroscopic ellipsometry Amassian A, Desjardins P, Martinu L
46 - 50	Determination of pore size distribution in thin organized mesoporous silica films by spectroscopic ellipsometry in the visible and infrared range Bourgeois A, Bruneau AB, Fisson S, Demarets B, Grosso D, Cagnol F, Sanchez C, Rivory J
51 - 55	Reactivity of 3D hexagonal mesoporous silica films to environment studied by infrared ellipsometry Brunet-Bruneau A, Besson S, Gacoin T, Boilot JP, Rivory J
56 - 60	Improving the conductance of ZnO thin films by doping with Ti Lu YM, Chang CM, Tsai SI, Wey TS
61 - 67	Electro-optical and structural properties of thin ZnO films, prepared by filtered vacuum arc deposition David T, Goldsmith S, Boxman RL
68 - 73	Growth behavior and optical properties of metal-nanoparticle dispersed dielectric thin films formed by alternating sputtering Cho SH, Lee S, Ku DY, Lee TS, Cheong B, Kim WM, Lee KS
74 - 79	Amorphous carbon nitride thin films as electron injection layer in organic LEDs Cremona M, Reyes R, Achete CA, Britto RT, Camargo SS
80 - 84	Photovoltaic effect in nanocrystalline Pb1-xFexS-single crystal silicon heterojunctions Joshi RK, Mohan S, Agarwal SK, Sehgal HK
85 - 89	The characteristics of thin film electroluminescent displays produced using sol-gel produced tantalum pentoxide and zinc sulfide Kavanagh Y, Alam MJ, Cameron DC
90 - 94	Inductively-coupled-plasma reactive ion etching of ZnO using BCl3-based plasmas and effect of the plasma treatment on Ti/Au ohmic contacts to ZnO Kim HK, Bae JW, Kim KK, Park SJ, Seong TY, Adesida I
95 - 99	Ion beam-induced erosion and humidity effect of MgO protective layer prepared by vacuum arc deposition Kim JK, Lee ES, Kim DH, Kim DG
100 - 104	High rate etching of 6H-SiC in SF6-based magnetically-enhanced inductively coupled plasmas Kim DW, Lee HY, Park BJ, Kim HS, Sung YJ, Chae SH, Ko YW, Yeom GY
105 - 110	Influence of target-to-substrate distance on the properties of AZO films grown by RF magnetron sputtering Jeong SH, Boo JH
111 - 114	n-ZnO/p-Si UV photodetectors employing AlOx films for antireflection Jeong IS, Kim JH, Park HH, Im S
115 - 118	Characteristics of indium tin oxide thin films prepared using electron beam evaporation Yamaguchi M, Ide-Ektessabi A, Nomura H, Yasui N
119 - 124	Influence of the film structure on the properties of electrochromic CeO2 thin films deposited by e-beam PVD Porqueras I, Person C, Bertran E
125 - 130	The role of ion energy on the growth mechanism of cubic boron nitride films Eyhusen S, Hofsass H, Ronning C
131 - 135	Stress measurement and stress relaxation during magnetron sputter deposition of cubic boron nitride thin films Abendroth B, Gago R, Kolitsch A, Moller W
136 - 141	Effect of diamond films as bufferlayer on formation of cubic boron nitride films by chemical vapor deposition Yang TS, Cheng YP, Cheng CL, Wong MS
142 - 147	DLC based coatings prepared by reactive d.c. magnetron sputtering Bewilogua K, Wittorf R, Thomsen H, Weber M
148 - 152	Optical and electrical properties of amorphous carbon films deposited using filtered cathodic vacuum arc with pulse biasing Sze JY, Tay BK, Sheeja D, Lau SP, Fu YQ, Chua DHC, Milne WI
153 - 157	Fabrication of silicone carbide thin films by plasma immersion ion implantation with self-ignites glow discharge An ZH, Fu RKY, Chen P, Liu WL, Chu PK, Lin CL
158 - 162	Fast and slow decay of ion beam induced electron emission in boron doped hydrogenated CVD diamond films Richter V, Avigal Y
163 - 168	An intermediate hybridization in diamond: edge-shared tetrahedra Badzian A, Badzian T
169 - 173	Nanoscale manipulation of tetrahedral amorphous carbon films Lee CS, Kim TY, Lee KR, Yoon KH
174 - 180	Effects of substrate temperature on bonding structure and mechanical properties of amorphous carbon films Chowdhury S, Laugier MT, Rahman IZ
181 - 186	Functionalisation of the carbon nanofibres by plasma treatment Brandl W, Marginean G
187 - 191	Thermally activated electron emission from nano-tips of amorphous diamond and carbon nano-tubes Kan MC, Huang JL, Sung J, Chen KH
192 - 196	Characterization of ternary boron carbon nitride films synthesized by RF magnetron sputtering Kim DH, Byon E, Lee S, Kim JK, Ruh H
197 - 200	Corrosion behavior of boron-carbon-nitride films grown by magnetron sputtering Byon E, Son M, Hara N, Sugimoto K
201 - 207	Mechanical and optical properties of hard SiCN coatings prepared by PECVD Jedrzejowski P, Cizek J, Amassian A, Klemberg-Sapieha JE, Vlcek J, Martinu L
208 - 211	Synthesis of thick DLC film for micromachine components Takeuchi S, Tanji A, Miyazawa H, Murakawa M
212 - 216	Electron-emission from nano- and micro-crystalline diamond films: the effects of nitrogen and oxygen additives Seo SH, Lee TH, Kim YD, Park CK, Park JS
217 - 222	Effect of silicon doping on the mechanical and optical properties of carbon nitride thin films Sarangi D, Sanjines R, Karimi A
223 - 230	Interaction of oxygen with a-C : H, a-C films and other carbon materials Kulikovsky V, Vorlicek V, Bohac P, Kurdyumov A, Jastrabik L
231 - 238	Growth of highly-oriented diamond films on 6H-SiC (0001) and Si (111) substrates and the effect of carburization Lee TH, Seo SH, Kang SM, Park JS
239 - 245	A new technique to determine the elastoplastic properties of thin metallic films using sharp indenters Bucaille JL, Stauss S, Schwaller P, Michler J
246 - 250	Nanoindentation with spherical indenters: finite element studies of deformation in the elastic-plastic transition regime Park YJ, Pharr GM
251 - 257	Factors limiting the measurement of residual stresses in thin films by nanoindentation Lepienski CM, Pharr GM, Park YJ, Watkins TR, Misra A, Zhang X
258 - 263	Mechanical strength improvement of electrical discharge machined cemented carbides through PVD (TiN, TiAlN) coatings Casas B, Lousa A, Calderon J, Anglada M, Esteve J, Llanes L
264 - 271	A nanoindentation based determination of internal stress alterations in PVD films and their cemented carbides substrates induced by recoating procedures and their effect on the cutting performance Bouzakis KD, Skordaris G, Hadjiyiannis S, Asimakopoulos A, Mirisidis J, Michailidis N, Erkens G, Cremer R, Klocke F, Kleinjans M
272 - 277	A multi-technique approach of tribofilm characterisation Minfray C, Martin JM, Esnouf C, Le Mogne T, Kersting R, Hagenhoff B
278 - 283	Depth profiling by GDOES: application of hydrogen and d.c. bias voltage corrections to the analysis of thin oxide films Michler J, Aeberhard M, Velten D, Winter S, Payling R, Breme J
284 - 288	Phase transition studies of sol-gel deposited barium zirconate titanate thin films Dixit A, Majumder SB, Dobal PS, Katiyar RS, Bhalla AS
289 - 295	Can oxygen stabilize chromium nitride? Characterization of high temperature cycled chromium oxynitride Wilhartitz P, Dreer S, Ramminger P
296 - 301	Effects of lattice mismatches in ZnO/substrate structures on the orientations of ZnO films and characteristics of SAW devices Lee JB, Lee MH, Park CK, Park JS
302 - 305	The growth of high-quality SiGe films with an intermediate Si layer Lee SW, Chen PS, Tsai MJ, Chia CT, Liu CW, Chen LJ
306 - 310	Study of the a-Si/a-SiO2 interface deposited by r.f. magnetron sputtering Tomozeiu N, van Faassen EE, Palmero A, Arnoldbik WM, Vredenberg AM, Habraken FHPM
311 - 315	Thermal stability and crystallization studies of amorphous TM-C films Bauer-Grosse E
316 - 321	Optical and electronic properties of magnetron sputtered ZrNx thin films Lamni R, Martinez E, Springer SG, Sanjines R, Schmid PE, Levy F
322 - 326	Structural and electrical properties of metal-ferroelectric-insulator-semiconductor field-effect transistors using a Pt/Bi3.25La0.75Ti3O12/CeO2/Si structure Lee JM, Kim KT, Kim CI
327 - 331	Active soft solder deposition by magnetron-sputter-ion-plating (MSIP)-PVD-process Lugscheider E, Bobzin K, Erdle A
332 - 336	Electrical, optical and mechanical properties of sputtered CrNy and Cr1-xSixN1.02 thin films Martinez E, Sanjines R, Banakh O, Levy F
337 - 342	Electrical properties of Bi4-xEuxTi3O12 (BET) thin films after etching in inductively coupled CF4/Ar plasma Lim KT, Kim KT, Kim DP, Kim CI
343 - 348	Etching mechanism of Bi4-xLaxTi3O12 films in Ar/Cl-2 inductively coupled plasma Kim DP, Kim KT, Kim CI, Efremov AM
349 - 353	Effects of ion-implantation on the formation of light-emitting FeSi2 in Fe thin films on (001)Si Lu HT, Chen LJ, Chueh YL, Chou LJ
354 - 358	Atmospheric RF plasma effects on the film adhesion property Chung YM, Jung MJ, Han JG, Lee MW, Kim YM
359 - 364	Physical and mechanical properties of polyimide/titania hybrid films Chiang PC, Whang WT, Tsai MH, Wu SC
365 - 370	Effects of Si content and free Si on oxidation behavior of Ti-Si-N coating layers Choi JB, Cho K, Lee MH, Kim KH
371 - 376	Effects of bias voltage and temperature on mechanical properties of Ti-Si-N coatings deposited by a hybrid system of arc ion plating and sputtering techniques Choi SR, Park IW, Kim SH, Kim KH
377 - 382	Characteristics of ion beam modified magnesium oxide films Yasui N, Nomura H, Ide-Ektessabi A
383 - 387	Ion beam processing of MgO thin films Ide-Ektessabi A, Nomura H, Yasui N, Tsukuda T
388 - 391	Dry processing of thin film capacitors arrays using ion beam assisted deposition Ide-Ektessabi A, Uehara H, Kamitani S
392 - 398	The tribological properties of co-deposited aluminium-titanium alloy coatings Hampshire J, Kelly PJ, Teer DG
399 - 405	Finite element analysis of substrate effects on indentation behaviour of thin films Xu ZH, Rowcliffe D
406 - 412	On the behaviour of indentation fracture in TiAlSiN hard thin films Nakonechna O, Cselle T, Morstein M, Karimi A
413 - 417	Effect of Bi4Ti3O12 seeding layer on the structural and ferroelectric properties of Bi3.25La0.75TiO12 thin films fabricated by a metalorganic decomposition method Kim KT, Kim CI
418 - 424	The structure of co-deposited aluminium-titanium alloy coatings Hampshire J, Kelly PJ, Teer DG
425 - 429	Effects of MEVVA-implanted chromium on the structure and properties of CrN film Han S, Chen HY, Chang KL, Weng KW, Wang DY, Lu FH, Shih HC
430 - 435	Deposition of TiOx thin film using the grid-assisting magnetron sputtering Jung MJ, Kim YM, Chung YM, Han JG, Bang KY
436 - 442	Effect of substrate bias voltage on amorphous Si-C-N films produced by PVD techniques Cunha L, Moura C, Leme J, Andres G, Pischow K
443 - 448	Deposition and mechanical evaluation of superhard Ti-Al-Si-N nanocomposite films by a hybrid coating system Park IW, Choi SR, Suh JH, Park CG, Kim KH
449 - 454	Structural, optical and mechanical properties of coloured TiNxOy thin films Vaz F, Cerqueira P, Rebouta L, Nascimento SMC, Alves E, Goudeau P, Riviere JR, Pischow K, de Rijk J
455 - 461	Performance and characterisation of CVD diamond coated, sintered diamond and WC-Co cutting tools for dental and micromachining applications Sein H, Ahmed W, Jackson M, Woodwards R, Polini R
462 - 467	Effect of sputtering target power on microstructure and mechanical properties of nanocomposite nc-TiN/a-SiNx thin films Zhang S, Sun D, Fu YQ, Du HJ
468 - 473	The role of subsurface oxygen in the local oxidation of zirconium and zirconium nitride thin films Farkas N, Zhang G, Donnelly KM, Evans EA, Ramsier RD, Dagata JA
474 - 480	Electrically conducting polyaniline microtube blends Hopkins AR, Lipeles RA, Kao W
481 - 488	Design and performance of an electrothermal MEMS microengine capable of bi-directional motion Kolesar ES, Odom WE, Jayachandran JA, Ruff MD, Ko SY, Howard JT, Allen PB, Wilken JM, Boydston NC, Bosch JE, Wilks RJ, McAllister JB
489 - 492	Passivation of type IIInAs/GaSb superlattice photodiodes Gin A, Wei YJ, Bae JJ, Hood A, Nah J, Razeghi M
493 - 501	Ferromagnetism in GaN and SiC doped with transition metals Pearton SJ, Park YD, Abernathy CR, Overberg ME, Thaler GT, Kim J, Ren R, Zavada JM, Wilson RG
502 - 508	Influence of pH on structural and electrical properties of sol-gel derived (Ba, Sr)TiO3 thin films under humid conditions Agarwala S, Samanta SB, Sharma GL
509 - 515	High quality r.f. sputtered metal oxides (Ta2O5, HfO2 and their properties after annealing Gruger H, Kunath C, Kurth E, Sorge S, Pufe W, Pechstein I
516 - 523	Extraction of electrical mechanisms of low-dielectric constant material MSZ for interconnect applications Chang TC, Yan ST, Liu R, Lin ZW, Aoki H, Sze SM
524 - 530	CMP of ultra low-k material porous-polysilazane (PPSZ) for interconnect applications Chang TC, Tsai TM, Liu PT, Chen CW, Yan ST, Aoki H, Chang YC, Tseng T
531 - 536	Evaluation of advanced chemical mechanical planarization techniques for copper damascene interconnect Chen KW, Wang YL, Liu CP, Yang K, Chang L, Lo KY, Liu CW
537 - 541	Structural and dielectric properties of heterostructured BST thin films by sol-gel technique Jain M, Majumder SB, Katiyar RS, Bhalla AS
542 - 548	Copper surface protection with a completely enclosed copper structure for a damascene process Wang TC, Hsieh TE, Wang YL, Wu YL, Lo KY, Liu CW, Chen KW
549 - 557	Hybrid organo-ceramic corrosion protection coatings with encapsulated organic corrosion inhibitors Khramov AN, Voevodin NN, Balbyshev VN, Donley MS
558 - 563	Investigation of quaternary Al-based quasicrystal thin films for corrosion protection Balbyshev VN, King DJ, Khramov A, Kasten LS, Donley MS
564 - 567	Comparative study of Mg doped ZnO and multilayer ZnO/MgO thin films Bhattacharya P, Das RR, Katiyar RS
568 - 574	The evaporative deposition of aluminum coatings and shapes with grain size control Jankowski A, Hayes J
575 - 579	Investigation of the bonding states of the SiO2 aerogel film/metal interface Jung SB, Park HH, Kim H
580 - 585	Application of SiO2 aerogel film for interlayer dielectric on GaAs with a barrier of Si3N4 Jung SB, Park SW, Yang JK, Park HH, Kim H
586 - 591	Effect of additive gases on the selective etching of tungsten films using inductively coupled halogen-based plasmas Park SD, Lee YJ, Cho NG, Kim SG, Choe HH, Hong MP, Yeom GY
592 - 598	Characterization of polymer-like thin films deposited on silicon and glass substrates using PECVD method Kim MC, Cho SH, Lee SB, Kim Y, Boo JH
599 - 604	Study on precipitations of fluorine-doped silicon oxide Wu J, Wang YL, Liu CP, Chang SC, Kuo CT, Ay C
605 - 609	Fabrication and characterization of high frequency SAW device with IDT/ZnO/AlN/Si configuration: role of AlN buffer Jung JP, Lee JB, Kim JS, Park JS
610 - 614	Effects of bottom electrodes on the orientation of AlN films and the frequency responses of resonators in AlN-based FBARs Lee JB, Jung JP, Lee MH, Park JS
615 - 618	Improvement of the surface characteristics of sputtered metal layer for a MEMS micro-mirror switch Lee MW, Jo SB, Lee KC, Kim CW, Park SG, Lee SG, Lee EH, O BH
619 - 625	Characteristics of rapid-thermal-annealed LiNi1-xCoxO2 cathode films for all-solid-state rechargeable thin film microbatteries Kim HK, Seong TY, Yoon YS
626 - 631	Improved performance of GaAs MESFETs through sulfidation of Pt/GaAs interface Yang JK, Park HH, Kim H, Jang HW, Lee JL, Im S
632 - 637	Investigation of the electrical properties and reliability of amorphous SiCN Chen CW, Chang TC, Liu PT, Tsai TM, Huang HC, Chen JM, Tseng CH, Liu CC, Tseng TY
638 - 644	Fabrication of colloidal self-assembled monolayer (SAM) using monodisperse silica and its use as a lithographic mask Ko HY, Lee HW, Moon J
645 - 650	Monitor and eliminate the circular defects in HDP-STI deposition through oxynitride/oxide composite liner Lan JK, Wang YL, Liu CP, Lee WH, Ay C, Cheng YL, Chang SC
651 - 655	Dielectric properties of highly (100) oriented (Pb-0.5, Sr-0.5)TiO3 thin films grown on LaNiO3 electrodes Kim KT, Kim CI
656 - 662	Low pressure deposition of LixZnyO thin films by means of RF plasma jet system Hubicka Z, Cada M, Potucek Z, Ptacek P, Sichova H, Malkova Z, Jastrabik L, Trunda B
663 - 668	Studies on microstructure bilayer film of ultrasonic dipped cadmium sulfide and d.c. sputtered indium tin oxide Cui HN, Teixeira V, Meng LJ, Zhang HJ
669 - 673	Electrical properties of PZT thin films by photochemical deposition Park HH, Yoon S, Park HH, Hill RH
674 - 680	Fluorine-modified low-k a-SiOC : H composite films prepared by plasma enhanced chemical vapor deposition JangJean SK, Liu CP, Wang YL, Hwang WS, Tseng WT, Chen SW, Lo KY
681 - 687	Moisture resistance and thermal stability of fluorine-incorporation siloxane-based low-dielectric-constant material Cheng YL, Wang YL, Wu YL, Liu CP, Liu CW, Lan JK, O'Neil ML, Ay C, Feng MS
688 - 692	(Pb,Sr)TiO3 thin films etching characteristics using inductively coupled plasma Kim GH, Kim KT, Kim DP, Kim CI
XIII - XIII	Proceedings of the 30th International Conference on Metallurgical Coatings and Thin Films, San Diego, California, April 28-May 2, 2003 -Preface Matthews A, Marchev K, Patscheider J, Pauleau Y