화학공학소재연구정보센터

Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing, Vol.24, No.4 Entire volume, number list
ISSN: 0272-4324 (Print) 

In this Issue (7 articles)

493 - 510 Development of novel coating technology by vacuum arc with rotating cathodes for industrial production of nc-(Al1-xTix)N/a-Si3N4 superhard nanocomposite coatings for dry, hard machining
Jilek M, Cselle T, Holubar P, Morstein M, Veprek-Heijman MGJ, Veprek S
511 - 535 A global model of chemical vapor deposition of silicon dioxide by direct-current corona discharges in dry air containing octamethylcyclotetrasiloxane vapor
Chen JH, Davidson JH
537 - 554 Hydrogen isotope exchange reactions in an atmospheric pressure discharge utilizing water as carrier gas
Koo IG, Lee WM
555 - 571 In-flight spheroidization of alumina powders in Ar-H-2 and Ar-N-2 induction plasmas
Ye R, Ishigaki T, Jurewicz J, Proulx P, Boulos MI
573 - 584 The design optimization of a plasma reactor for chemical waste destruction
Dayal AR, Pfluger D, Kearney TN, Western RJ, McAllister T
585 - 601 Comparative study of flow characteristics inside plasma torch with different nozzle configurations
Yuan XQ, Li H, Zhao TZ, Wang F, Guo WK, Xu P
603 - 623 Comparison of simple particle-radiation coupling models applied on a plasma black process
Gonzalez-Aguilar J, Deme I, Fulcheri L, Flamant G, Gruenberger TM, Ravary B