Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing, Vol.15, No.3 Entire volume, number list

ISSN: 0272-4324 (Print)

In this Issue (11 articles)

371 - 381	Langmuir Probe Measurements During Plasma-Activated Chemical-Vapor-Deposition in the System Argon/Hydrogen/Dicyclopentadienyldimethylhafium Spatenka P, Petig M, Wiesemann K, Suhr H
383 - 408	Effect of Power Modulation on Radical Concentration and Uniformity in a Single-Wafer Plasma Reactor Jiang P, Economou DJ, Shin CB
409 - 426	Electron Behavior in the Downstream of an Electron-Cyclotron-Resonance Plasma Used for Chemical-Vapor-Deposition Zhang M, Nonoyama S, Nakayama Y
427 - 449	On the Use of the Numerical-Simulation of the First Positive System of N-2 .1. Emission and LiF Analysis Simek M, Dilecce G, Debenedictis S
451 - 463	On the Use of the Numerical-Simulation of the First Positive System of N-2 .2. Fast T-Rot Estimation from the Partially Resolved (3,0)-Band Simek M, Debenedictis S
465 - 479	Destruction of Organic-Compounds in a High-Frequency Discharge Plasma at Reduced Pressure Teply J, Dressler M, Janca J, Tesar C
481 - 499	Electron-Beam Diagnostics of Gas-Mixtures Involved in SiO2 Film Deposition Belikov AE, Kuznetsov OV, Sharafutdinov RG
501 - 528	Nonequilibrium Vibrational Kinetics During Hypersonic Flow of a Solid Body in Nitrogen and Its Influence on the Surface Heat-Flux Armenise I, Capitelli M, Colonna G, Koudriavtsev N, Smetanin V
529 - 543	Catalytic Halocarbon Decomposition in a Microwave Postdischarge Aleksandrov NL, Dobkin SV, Konchakov AM
545 - 557	Formation of Titanium Carbide from Ilmenite Concentrates in a Thermal Plasma Reactor Taylor PR, Manrique M, Pirzada SA, Abdellatif M
559 - 579	Thermodynamic and Transport-Properties of Argon Helium Plasmas at Atmospheric-Pressure Chen WL, Heberlein J, Pfender E, Pateyron B, Delluc G, Elchinger MF, Fauchais P