Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing, Vol.16, No.2 Entire volume, number list

ISSN: 0272-4324 (Print)

153 - 171	Electron-Energy Distribution-Functions and Rate and Transport-Coefficients of H-2/H/CH4 Reactive Plasmas for Diamond Film Deposition Capitelli M, Colonna G, Hassouni K, Gicquel A
173 - 185	On the Plasma Chemistry of the C/H System Relevant to Diamond Deposition Processes Schwarzler CG, Schnabl O, Laimer J, Stori H
187 - 194	Kinetics of O-2+teos Gas-Phase Chemical-Reactions in a Remote RF Plasma Reactor with Electron-Spin-Resonance Janca J, Talsky A, Zvonicek V
195 - 208	Surface Recombination in Breakdown Time-Delay Experiments - Effect of Different Cathode Materials Markovic VL, Pejovic MM, Petrovic ZL
209 - 225	Plasma and Beam Facility Atomic Oxygen Erosion of a Transition-Metal Complex Illingsworth ML, Banks BA, Smith JW, Jayne D, Garlick RG, Rutledge SK, Degroh KK
227 - 247	Energy Efficiency of No Removal by Pulsed Corona Discharges Vanveldhuizen EM, Rutgers WR, Bityurin VA
249 - 264	Homogeneous Nucleation of Metals in a Plasma-Quench Reactor Laviolette RA, Berry RA, Mcgraw R
265 - 286	Numerical-Simulation of a Nonequilibrium Plasma-Jet in an Applied Magnetic-Field Using 3-Fluid Model (Reprinted from Trans of the Japan Society of Mechanical-Engineers, Vol 60, Pg 3072, 1994) Nishiyama H, Saito T, Kamiyama S