561 - 564 |
W chemical-vapor deposition using (i-C3H7C5H4)(2)WH2 Ogura A, Imai S, Kagawa T, Kurozaki H, Ishikawa M, Muramoto I, Machida H, Ohshita Y |
565 - 570 |
Experiments and modeling of dual reactive magnetron sputtering using two reactive gases Kubart T, Trinh DH, Liljeholm L, Hultman L, Hogberg H, Nyberg T, Berg S |
571 - 580 |
Study of electron beam evaporated compositionally modulated Fe/Al multilayers Brajpuriya R, Tripathi S, Sharma A, Chaudhari SM, Shripathi T, Lakshmi N |
581 - 586 |
Development of a cosputter-evaporation chamber for Fe-Ga films Morley NA, Yeh SL, Rigby S, Javed A, Gibbs MRJ |
587 - 591 |
Growth of InN on Si (111) by atmospheric-pressure metal-organic chemical vapor deposition using InN/AlN double-buffer layers Li ZY, Lan SM, Uen WY, Chen YR, Chen MC, Huang YH, Ku CT, Liao SM, Yang TN, Wang SC, Chi GC |
592 - 596 |
Characterization of molecular nitrogen in III-V compound semiconductors by near-edge x-ray absorption fine structure and photoemission spectroscopies Bozanic A, Majlinger Z, Petravic M, Gao Q, Llewellyn D, Crotti C, Yang YW |
597 - 604 |
Mechanisms and selectivity for etching of HfO2 and Si in BCl3 plasmas Wang CY, Donnelly VM |
605 - 609 |
Classical size effect in oxide-encapsulated Cu thin films: Impact of grain boundaries versus surfaces on resistivity Sun T, Yao B, Warren AP, Kumar V, Roberts S, Barmak K, Coffey KR |
610 - 615 |
Morphological analysis of TiB2 thin film prepared by rf magnetron sputtering Dai W, Zhang TJ, Yang JY, Sun RX, Xu JL |
616 - 623 |
X-ray photoelectron spectroscopy studies of water-induced surface reorganization of amphiphilic poly(2-hydroxyethyl methacrylate-g-dimethylsiloxane) copolymers using cryogenic sample handling techniques Chen L, Hook DJ, Valint PL, Gardella JA |
624 - 633 |
Can the throttling of a perfect gas through a free molecular orifice produce a cooling effect? Young RM, Braggins TT, Kirby CF, Adam JD, Petach MB, Tward E |
634 - 645 |
Survey on measurement of tangential momentum accommodation coefficient Agrawal A, Prabhu SV |
648 - 648 |
Papers from the 54th International Symposium of AVS - 14-19 October 2007 - Seattle, Washington - Preface Lucovsky G |
650 - 653 |
Bulk ratio method for determining surface enhancement using Auger analysis Geller JD |
654 - 659 |
Investigation of thin-oxide-free protective coatings on chromium and 316 L stainless steel formed by treatment with etidronic acid Johnson SL, Sherwood PMA |
660 - 667 |
Cluster primary ions: Spikes, sputtering yields, secondary ion yields, and interrelationships for secondary molecular ions for static secondary ion mass spectrometry Seah MP |
668 - 672 |
Three dimensional image construction and spectrum extraction from two dimensional elemental mapping in Auger electron spectroscopy Urushihara N, Iida S, Sanada N, Suzuki M, Paul DF, Bryan S, Nakajima Y, Hanajiri T, Kakushima K, Ahmet P, Tsutsui K, Iwai H |
673 - 677 |
Electronic states of Fe nanostructures on Pt(997) surface Cheng RH, Ayieta E, Losovyj YB |
678 - 682 |
Effect of annealing temperature on the photocatalytic activity of sol-gel derived TiO2 thin films Biswas S, Majumder A, Hossain MF, Takahashi T, Kubota Y, Fujishima A |
683 - 687 |
Role of hydrogen bonding environment in a-Si : H films for c-Si surface passivation Burrows MZ, Das UK, Opila RL, De Wolf S, Birkmire RW |
688 - 691 |
Microstructural evolution of nickel-germanide in the Ni1-xTax/Ge systems during in situ annealing Lee JW, Bae JH, Park MH, Kang HB, Kim H, Yang CW |
692 - 696 |
Effects of hydrogen ambient and film thickness on ZnO : Al properties Duenow JN, Gessert TA, Wood DM, Dillon AC, Coutts TJ |
697 - 704 |
Main determinants for III-V metal-oxide-semiconductor field-effect transistors (invited) Ye PD |
705 - 709 |
Characterization of plasma etching induced interface states at Ti/p-SiGe Schottky contacts Mamor M, Sellai A |
710 - 715 |
Fabrication and characterization of a pentacene thin film transistor with a polymer insulator as a gate dielectric Lee C, Ko J, Lee J, Chung I |
716 - 719 |
Photoluminescence characterization of polythiophene films doped with highly functional molecules Kato H, Takemura S, Kobe H, Mori Y, Yamada A, Matsuoka Y, Watanabe Y, Shimada K, Hiramatsu T, Nanba N, Matsui K |
720 - 723 |
Influence of a post-chemical mechanical polishing cleaning process on the ferroelectric properties of a Pb(Zr,Ti)O-3 thin film capacitor fabricated by the damascene process Kim NH, Jun YK, Ko PJ, Lee WS |
724 - 730 |
Silicate formation and thermal stability of ternary rare earth oxides as high-k dielectrics Van Elshocht S, Adelmann C, Conard T, Delabie A, Franquet A, Nyns L, Richard O, Lehnen P, Swerts J, De Gendt S |
731 - 734 |
High magnetization FeCo/Pd multilayers Walock MJ, Ambaye H, Chshiev M, Klose FR, Butler WH, Mankey GJ |
735 - 738 |
Thermal stability of synthetic antiferromagnet and hard magnet coupled spin valves Tadisina ZR, Gupta S, LeClair P, Mewes T |
739 - 744 |
Process development and material characterization of polycrystalline Bi2Te3, PbTe, and PbSnSeTe thin films on silicon for millimeter-scale thermoelectric generators Boniche I, Morgan BC, Taylor PJ, Meyer CD, Arnold DP |
745 - 751 |
Fabrication of metal-based high-aspect-ratio microscale structures by compression molding Jiang J, Mei FH, Meng WJ |
752 - 756 |
Design and fabrication of a multilayer micro-/nanofluldic device with an electrically driven nanovalve Li H, Ocola LE, Auciello O, Firestone M |
757 - 762 |
Advances in magnetometry through miniaturization Edelstein AS, Burnette J, Fischer GA, Cheng SF, Egelhoff WF, Pong PWT, McMichael RD, Nowak ER |
763 - 767 |
Fabrication of stationary micro-optical shutter based on semiconductor-to-metallic phase transition of W-doped VO2 active layer driven by an external voltage Soltani M, Chaker M, Haddad E, Kruzelecky R, Margot J, Laou P, Paradis S |
768 - 776 |
Nanotribological and nanomechanical properties of lubricated PZT thin films for ferroelectric data storage applications Palacio M, Bhushan B |
777 - 782 |
Technique to measure contact angle of micro/nanodroplets using atomic force microscopy Jung YC, Bhushan B |
783 - 793 |
Platinum-coated probes sliding at up to 100 mm/s against lead zirconate titanate films for atomic force microscopy probe-based ferroelectric recording technology Kwak KJ, Bhushan B |
794 - 797 |
Improvement of the surface roughness and sensing properties of cerium dioxide thin film by chemical mechanical polishing Kim NH, Ko PJ, Lee WS |
798 - 804 |
Evaluation of bond quality and heat transfer of Cu-based microchannel heat exchange devices Mei FH, Jiang J, Meng WJ |
805 - 811 |
Gate oxide process control optimization by x-ray photoelectron spectroscopy in a semiconductor fabrication line Le Gouil A, Cabuil N, Dupeyrat P, Dickson B, Kwan M, Barge D, Gurer E, Doclot O, Royer JC |
812 - 818 |
Photoconductive analysis of ion implantation damage and annealing in silicon wafers Ahrenkiel RK |
819 - 823 |
Nanometer-scaled triangular platinum islands fabricated using the bridge phenomenon of polystyrene beads Lee BK, Kim KS, Lee JH, Kim NH, Roh Y |
824 - 831 |
Conducting polymer nanofilm growth on a nanoscale linked-crater pattern fabricated on an Al surface Kato H, Takemura S, Ishii A, Takarai Y, Watanabe Y, Sugiyama T, Hiramatsu T, Nanba N, Nishikawa O, Taniguchi M |
832 - 835 |
Growth and characterization of carbon nanotubes on constantan (Cu-Ni-Mn alloy) metallic substrates without adding additional catalysts Varanasi CV, Bulmer J, Brunke L, Burke J, Baca J, Yost K, Barnes R |
836 - 841 |
Thermoplasmonic shift and dispersion in thin metal films Lereu AL, Passian A, Farahi RH, van Hulst NF, Ferrell TL, Thundat T |
842 - 846 |
Effect of capacitive to inductive coupling transition in multiple linear U-type antenna on silicon thin film deposition from pure SiH4 discharges Kim HB, Lee HC, Kim KN, Yeom GY |
847 - 853 |
Study on plasma assisted metal-organic chemical vapor deposition of Zr(C,N) and TI(C,N) thin films and in situ plasma diagnostics with optical emission spectroscopy Cho SJ, Nam SH, Jung CK, Jee HG, Boo JH, Kim S, Han JG |
854 - 856 |
Exotic shapes of gold nanoparticles synthesized using plasma in aqueous solution Hieda J, Saito N, Takai O |
857 - 860 |
Dry etching of extreme ultraviolet lithography mask structures in inductively coupled plasmas Kim DY, Lee HJ, Jung HY, Lee NE, Kim TG, Kim BH, Ahn J, Kim CY |
861 - 864 |
Etching characteristics and application of physical-vapor-deposited amorphous carbon for multilevel resist Kim HT, Kwon BS, Lee NE, Park YS, Cho HJ, Hong B |
865 - 869 |
Global plasma simulations using dynamically generated chemical models Munro JJ, Tennyson J |
870 - 874 |
Surface reactions during low-k etching using H-2/N-2 plasma Fukasawa M, Tatsumi T, Shima K, Nagahata K, Uchida S, Takashima S, Hori M, Kamide Y |
875 - 880 |
Low-damage low-k etching with an environmentally friendly CF3I Plasma Soda E, Kondo S, Saito S, Ichihashi Y, Sato A, Ohtake H, Samukawa S |
881 - 886 |
Temperature effect on the glancing angle deposition of Si sculptured thin films Patzig C, Rauschenbach B |
887 - 892 |
Effect of swift heavy ion irradiation on the hardness of chromium nanorods Nagar R, Mehta BR, Singh JP, Jain D, Ganesan V, Kesapragada SV, Gall D |
893 - 897 |
High rate deposition of photocatalytic TiO2 films with high activity by hollow cathode gas-flow sputtering method Kubo Y, Iwabuchi Y, Yoshikawa M, Sato Y, Shigesato Y |
898 - 902 |
Preparation of TiO2 thin films by laser ablation for photocatalytic applications Wang SJ, Chang WT, Ciou JY, Wei MK, Wong MS |
903 - 907 |
High rate deposition of photocatalytic TiO2 films by dc magnetron sputtering using a TiO2-x target Sato Y, Uebayashi A, Ito N, Kamiyama T, Shigesato Y |
908 - 912 |
Plasma modification of CoPt3 nanoparticle arrays: A route to catalytic coatings of surfaces Gehl B, Flege JI, Aleksandrovic V, Schmidt T, Kornowski A, Bernstorff S, Falta J, Weller H, Baumer M |
913 - 918 |
Preparation of nickel nanoparticles and their catalytic activity in the cracking of methane De Jesus JC, Gonzalez I, Garcia M, Urbina C |
919 - 924 |
Surface science investigations of photoprocesses in model interstellar ices Thrower JD, Collings MP, McCoustra MRS, Burke DJ, Brown WA, Dawes A, Holtom PD, Kendall P, Mason NJ, Jamme F, Fraser HJ, Clark IP, Parker AW |
925 - 931 |
Photo-induced surface functionalization of carbon surfaces: The role of photoelectron ejection Colavita PE, Sun B, Tse KY, Hamers RJ |
932 - 937 |
Atomic-scale investigation of graphene formation on 6H-SiC(0001) Guisinger NP, Rutter GM, Crain JN, Heiliger C, First PN, Stroscio JA |
938 - 943 |
Structural and electronic properties of bilayer epitaxial graphene Rutter GM, Crain JN, Guisinger NP, First PN, Stroscio JA |
944 - 948 |
Photoluminescence and electroluminescence from Eu-activated CaAl2O4-based multicomponent oxide thin-film phosphors Fukada H, Matsui S, Miyata T, Minami T |
949 - 955 |
Single-chamber plasma enhanced chemical vapor deposition of transparent organic/inorganic multilayer barrier coating at low temperature Park SM, Kim DJ, Kim SI, Lee NE |
956 - 960 |
An electron impact emission spectroscopy flux sensor for monitoring deposition rate at high background gas pressure with improved accuracy Lu C, Blissett CD, Diehl G |
961 - 965 |
Top-emitting organic light-emitting diodes with Ba/Ag/indium tin oxide cathode and built-in potential analyses in these devices Lim JT, Lee JH, Yeom GY, Lee EH, Kim TW |
966 - 969 |
Effect of substrate temperatures on amorphous carbon nitride films prepared by reactive sputtering Aono M, Akiyoshi H, Kikuchi S, Kitazawa N, Watanabe Y |
970 - 973 |
Optical radiation selective photodetectors based on III nitrides Pillai R, Starikov D, Boney C, Bensaoula A |
974 - 979 |
Effects of P on amorphous chemical vapor deposition Ru-P alloy films for Cu interconnect liner applications Shin JH, Kim HW, Agapiou K, Jones RA, Hwang GS, Ekerdt JG |
980 - 984 |
Study on the amorphous Ta-Zr films as diffusion barrier in Cu metallization Li C, Hsieh JH, Tang ZZ |
985 - 990 |
Ferroelectric properties of Pb(Mn1/3Nb2/3)O-3-Pb(Zr, Ti)O-3 thin films epitaxially grown on (001)MgO substrates Zhang T, Wasa K, Kanno I, Zhang SY |
991 - 995 |
Ion beam deposition of tantalum pentoxide thin film at room temperature Kulisch W, Gilliland D, Ceccone G, Rauscher H, Sirghi L, Colpo P, Rossi F |
996 - 1001 |
Effects of manganese oxide-mixed abrasive slurry on the tetraethyl orthosilicate oxide chemical mechanical polishing for planarization of interlayer dielectric film in the multilevel interconnection Seo YJ, Park SW, Lee WS |
1002 - 1006 |
Comparative study of photocatalytic activity in CdS-TiO2 thin films prepared by two different techniques Biswas S, Hossain MF, Takahashi T, Kubota Y, Fujishima A |
1007 - 1011 |
Effect of structure and surface morphology of sol-gel derived TiO2 photoelectrode on the performance of dye-sensitized solar cells Hossain MF, Biswas S, Takahashi T, Kubota Y, Fujishima A |
1012 - 1017 |
Effect of substrate temperature on the facing target sputter deposited TiO2 photoelectrode of dye-sensitized solar cells Hossain MF, Biswas S, Takahashi T, Kubota Y, Fujishima A |
1018 - 1022 |
Silicon carbonitrides: On the attainability of stable compounds with high nitrogen content Rudolphi M, Baumann H, Geckle U, Bruns M |
1023 - 1026 |
Optical characterization of InN layers grown by high-pressure chemical vapor deposition Alevli M, Atalay R, Durkaya G, Weesekara A, Perera AGU, Dietz N, Kirste R, Hoffmann A |
1027 - 1029 |
Structural study of TiO2-based transparent conducting films Hitosugi T, Yamada N, Nakao S, Hatabayashi K, Shimada T, Hasegawa T |
1030 - 1036 |
A model for calculating resputter rates in codeposition Gregoire JM, van Dover RB |
1037 - 1041 |
Efficient combining of ion pumps and getter-palladium thin films Paolini C, Mura M, Ravelli F |
1042 - 1049 |
Recent advances to enhance low Earth orbit space simulation Collins FG |
1050 - 1057 |
Optical properties of organic and inorganic capped CdS nanoparticles and the effects of x-ray irradiation on organic capped CdS nanoparticles Hullavarad NV, Hullavarad SS |
1058 - 1061 |
Characterization of electrospray ion-beam-deposited CdSe/ZnS quantum dot thin films from a colloidal solution Tani Y, Kobayashi S, Kawazoe H |
1062 - 1067 |
Programmable memory devices using gold nanoparticles capped with alkanethiols of different carbon chain lengths Lai PY, Chen JS |
1068 - 1073 |
Electron backscatter diffraction of CdTe thin films: Effects of CdCl2 treatment Moutinho HR, Dhere RG, Romero MJ, Jiang CS, To B, Al-Jassim MM |
1074 - 1078 |
Study of characteristic fragmentation of nanocarbon by the scanning atom probe Nishikawaa O, Taniguchi M, Saito Y |
1079 - 1084 |
Self-limiting deposition of aluminum oxide thin films by pulsed plasma-enhanced chemical vapor deposition Szymanski SF, Rowlette P, Wolden CA |
1085 - 1092 |
Microstructure and tribological behavior of tungsten-containing diamondlike carbon coated rubbers Pei YT, Bui XL, Zhou XB, De Hosson JTM |
1093 - 1097 |
Effects of annealing on antiwear and antibacteria behaviors of TaN-Cu nanocomposite thin films Hsieh JH, Cheng MK, Chang YK, Li C, Chang CL, Liu PC |