Photocatalytic TiO2 films were deposited on glass substrates by dc magnetron sputtering using a slightly reduced TiO2-x target (2-x=1.986; conductivity, 3.7 S cm(-1); density, 4.21 g/cm(3)). The variation in the deposition rate as a function of the O-2 flow ratio did not show a hysteresis curve at the "transition region" as seen in the case of a Ti metal target. The deposition rate using the TiO2-x target in 100% Ar gas was approximately seven times higher than that using the Ti metal target in an "oxide mode." The films postannealed in air at temperatures >= 200 degrees C showed excellent photodecomposition characteristics of acetaldehyde (CH3CHO) as well as photoinduced hydrophilicity. (C) 2008 American Vacuum Society.