Journal of Vacuum Science & Technology A

Journal of Vacuum Science & Technology A, Vol.19, No.4 Entire volume, number list

ISSN: 0734-2101 (Print)

In this Issue (182 articles)

A31 - A31	Papers from the 47th International Symposium of AVS - Preface Lucovsky G
1037 - 1041	Photovoltaic characteristics of BR/p-silicon heterostructures using surface photovoltage spectroscopy Li LS, Xu T, Zhang YJ, Jin J, Li TJ, Zou BS, Wang JP
1042 - 1045	Observation of the bone matrix structure of intact and regenerative zones of tibias by atomic force microscopy Baranauskas V, Garavello-Freitas I, Jingguo Z, Cruz-Hofling MA
1046 - 1051	Structural and electrical characteristics of chemical vapor deposited W/n-Si0.83Ge0.17/Si(001) and chemical vapor deposited WSix/n-Si0.83Ge0.17/Si(001) Jang YC, Shin DO, Kim KS, Shim KH, Lee NE, Youn SP, Roh KJ, Roh YH
1052 - 1056	Fabrication of smooth diamond films on SiO2 by the addition of nitrogen to the gas feed in hot-filament chemical vapor deposition Baranauskas V, Peterlevitz AC, Zhao JG, Durrant SF
1057 - 1062	Micro-crystalline diamond and nano-carbon structures produced using a high argon concentration in hot-filament chemical vapor deposition Baranauskas V, Peterlevitz AC, Ceragioli HJ, Durrant SF
1063 - 1067	Damage in etching of (Ba,Sr)TiO3 thin films using inductively coupled plasma Choi SK, Kim DP, Kim CI, Chang EG
1068 - 1071	Etch characteristics of CeO2 thin films as a buffer layer for the application of ferroelectric random access memory Oh CS, Kim CI, Kwon KH
1072 - 1077	Chemical interaction and adhesion characteristics at the interface of metals (Cu, Ta) and low-k cyclohexane-based plasma polymer (CHexPP) films Kim KJ, Kim KS, Lee NE, Choi J, Jung D
1078 - 1082	Low temperature deposition and characterization of polycrystalline Si films on polymer substrates Xu K, Shah SI, Guerin D
1083 - 1089	Cross-sectional transmission electron microscopy investigation of the dead layer of ZnS : Ag,Al phosphors in field emission displays Kajiwara K
1090 - 1094	Optical filters for plasma display panels using organic dyes and sputtered multilayer coatings Okamura T, Fukuda S, Koike K, Saigou H, Yoshikai M, Koyama M, Misawa T, Matsuzaki Y
1095 - 1098	Effects of ZnO buffer layer on the luminous properties of thin-film phosphors deposited on ZnO/ITO/glass substrates Kim YJ, Chung SM, Jeong YH, Lee YE
1099 - 1104	Investigation of the outgassing characteristics of the materials comprising a plasma display panel Han HR, Lee YJ, Yeom GY
1105 - 1110	In situ analysis of perfluoro compounds in semiconductor process exhaust: Use of Li+ ion-attachment mass spectrometry Nakamura M, Hino K, Sasaki T, Shiokawa Y, Fujii T
1111 - 1115	Quantitative comparison between Auger electron spectroscopy and secondary ion mass spectroscopy depth profiles of a double layer structure of AlAs in GaAs using the mixing-roughness-information depth model Hofmann S, Rar A, Moon DW, Yoshihara K
1116 - 1120	Surface characterization of IM7/5260 composites by x-ray photoelectron spectroscopy Ohno S, Lee MH, Lin KY, Ohuchi FS
1121 - 1125	Pt-metal oxide aerogel catalysts: X-ray photoemission investigation Nelson AJ, Reynolds JG, Sanner RD, Coronado PR, Hair LM
1126 - 1133	Scanning Auger microscopy studies of an ancient bronze Paparazzo E, Lea AS, Baer DR, Northover JP
1134 - 1138	Comparative ion yields by secondary ion mass spectrometry from microelectronic films Parks CC
1139 - 1142	Surface potential measurement with high spatial resolution using a scanning Auger electron microscope Sakai Y, Kudo M, Nielsen C
1143 - 1149	Chemical effects on FKLL Auger spectra in fluorides Kover L, Uda M, Cserny I, Toth J, Vegh J, Varga D, Ogasawara K, Adachi H
1150 - 1157	X-ray photoelectron spectroscopy, x-ray absorption spectroscopy, and x-ray diffraction characterization of CuO-TiO2-CeO2 catalyst system Francisco MSP, Nascente PAP, Mastelaro VR, Florentino AO
1158 - 1163	Chemical and structural characterization of V2O5/TiO2 catalysts Rodella CB, Nascente PAP, Mastelaro VR, Zucchi MR, Franco RWA, Magon CJ, Donoso P, Florentino AO
1164 - 1169	Interface formation and electrical properties of a TiNx/SiO2/Si structure for application in gate electrodes Kim KS, Jang YC, Kim KJ, Lee NE, Youn SP, Roh KJ, Roh YH
1170 - 1175	Interpretation of the Shirley background in x-ray photoelectron spectroscopy analysis Castle JE, Salvi AM
1176 - 1181	Formation of potentially protective oxide-free phosphate films on titanium characterized by valence band x-ray photoelectron spectroscopy Rotole JA, Gaskell K, Comte A, Sherwood PMA
1182 - 1185	Growth and magnetic properties of ultrathin Fe on Pd(110) Cuenya BR, Pearson J, Yu CT, Li DQ, Bader SD
1186 - 1190	Effect of composition and microstructure on temperature coefficient of resistance of polycrystalline La1-xCaxMnO3 thin films Lai CH, Hsu CF, Chin YC, Chiang CD
1191 - 1194	Preparation of cross-sectional transmission electron microscopy specimens of obliquely deposited magnetic thin films on a flexible tape Keim EG, Bijker MD, Lodder JC
1195 - 1198	Determination of magnetostriction for spin-valve devices with 5.0 and 10.0 nm Permalloy layers Gafron TJ, Russek SE, Burkett SL
1199 - 1202	Analysis of tunneling magnetoresistance test structures by low energy electron nanoscale-luminescence spectroscopy Goss SH, Parkin SSP, Brillson LJ
1203 - 1206	Corrosion behavior of Co-Sm based magnetic media Zana L, Zangari G
1207 - 1212	Surface processing with gas-cluster ions to improve giant magnetoresistance films Fenner DB, Hautala J, Allen LP, Tetreault TG, Al-Jibouri A, Budnick JI, Jones KS
1213 - 1218	Study of exchange anisotropy for Ni80Fe20/Fe60Mn40 (111) epitaxial films Liu CX, Du JH, Barnard JA, Mankey GJ
1219 - 1223	Micro-electro-mechanical system fabrication technology applied to large area x-ray image sensor arrays Daniel JH, Krusor B, Apte RB, Mulato M, Van Schuylenbergh K, Lau R, Do T, Street RA, Goredema A, Boils-Boissier DC, Kazmaier PM
1224 - 1228	A novel antistiction method using harmonic excitation on the microstructure Lai WP, Fang W
1229 - 1233	Nano- and microchannel fabrication using column/void network deposited silicon Nam WJ, Bae S, Kalkan AK, Fonash SJ
1234 - 1240	Investigation of the adhesion, friction, and wear properties of biphenyl thiol self-assembled monolayers by atomic force microscopy Liu HW, Bhushan B, Eck W, Stadler V
1241 - 1247	Data requirements and communication issues for advanced process control Markle RJ, Coss E
1248 - 1254	The application of in situ monitor of extremely rarefied particle clouds grown thermally above wafers by using laser light scattering method to the development of the mass-production condition of the tungsten thermal chemical vapor deposition Ito N, Moriya T, Uesugi F, Moriya S, Aomori M, Kato Y
1255 - 1260	Study on temperature calibration of a silicon substrate in a temperature programmed desorption analysis Hirashita N, Jimbo T, Matsunaga T, Matsuura M, Morita M, Nishiyama I, Nishizuka M, Okumura H, Shimazaki A, Yabumoto N
1261 - 1265	Friction force microscopy study on photodegradation of organosilane self-assembled monolayers irradiated with a vacuum ultraviolet light at 172 nm Sugimura H, Hayashi K, Amano Y, Takai O, Hozumi A
1266 - 1269	Monolayer formation of 6-deoxy-6-thiol-beta-cyclodextrin on a Au(111) surface studied by scanning tunneling microscopy Yasuda S, Futaba DN, Takeuchi O, Suzuki I, Yase K, Sumaoka J, Komiyama M, Shigekawa H
1270 - 1276	Investigation of the morphology of the initial growth of the aromatic molecule p-quaterphenyl on NaCl (001) Kintzel EJ, Smilgies DM, Skofronick JG, Safron SA, Van Winkle DH, Trelenberg TW, Akhadov EA, Flaherty FA
1277 - 1281	Effect of dry etching conditions on surface morphology and optical properties of GaN films in chlorine-based inductively coupled plasmas Hahn YB, Im YH, Park JS, Nahm KS, Lee YS
1282 - 1288	Observation of surface reaction layers formed in highly selective SiO2 etching Matsui M, Tatsumi T, Sekine M
1289 - 1293	Etching mechanism of YMnO3 thin films in Cl-2/Ar gas chemistries Min BJ, Kim CI, Kim YT
1294 - 1297	Ion compositions and energies in inductively coupled plasmas containing SF6 Goyette AN, Wang YC, Olthoff JK
1298 - 1303	Ion energy and angular distribution at the radio frequency biased electrode in an inductively coupled plasma apparatus Mizutani N, Hayashi T
1304 - 1307	Spatial distribution of carbon species in laser ablation of graphite target Ikegami T, Ishibashi S, Yamagata Y, Ebihara K, Thareja RK, Narayan J
1308 - 1311	Improved etch characteristics Of SiO2 by the enhanced inductively coupled plasma Cho SB, Song HY, Park SG, O BH
1312 - 1314	Effect of temperature on etch rate of iridium and platinum in CF4/O-2 Maa JS, Ying H, Zhang FY
1315 - 1319	Dry etching of SrBi2Ta2O9 thin films in Cl-2/NF3/O-2/Ar inductively coupled plasmas Im YH, Park JS, Choi CS, Choi RJ, Hahn YB, Lee SH, Lee JK
1320 - 1324	Structure control of pulsed laser deposited ZrO2/Y2O3 films Voevodin AA, Jones JG, Zabinski JS
1325 - 1329	Ion energy distributions in a pulsed, electron beam-generated plasma Walton SG, Leonhardt D, Blackwell DD, Fernsler RF, Murphy DP, Meger RA
1330 - 1335	Probe diagnostic development for electron beam produced plasmas Blackwell DD, Walton SG, Leonhardt D, Murphy DP, Fernsler RF, Amatucci WE, Meger RA
1336 - 1340	Ion-assisted deposition of silicon nitride films using electron cyclotron resonance plasma Vargheese KD, Rao GM
1341 - 1345	Plasma etching of lead germanate (PGO) ferroelectric thin film Ying H, Li TK, Maa JS, Zhang FY, Hsu ST, Gao YF, Engelhard M
1346 - 1352	Simulation of the production of atomic hydrogen in a low-pressure-arc-discharge-based source Kagadei VA, Kozyrev AV, Proskurovsky DI, Osipov IV
1353 - 1360	Physical and electrical properties of noncrystalline Al2O3 prepared by remote plasma enhanced chemical vapor deposition Johnson RS, Lucovsky G, Baumvol I
1361 - 1366	Etching of high-k dielectric Zr1-xAlxOy films in chlorine-containing plasmas Pelhos K, Donnelly VM, Kornblit A, Green ML, Van Dover RB, Manchanda L, Hu Y, Morris M, Bower E
1367 - 1373	Plasma diagnostics in large area plasma processing system Leonhardt D, Walton SG, Blackwell DD, Amatucci WE, Murphy DP, Fernsler RF, Meger RA
1374 - 1378	Relationship between deprotection and film thickness loss during plasma etching of positive tone chemically amplified resists Mahorowala AP, Medeiros DR
1379 - 1383	Novel technique to enhance etch selectivity of carbon antireflective coating over photoresist based on O-2/CHF3/Ar gas chemistry Hong J, Jeon JS, Kim YB, Min GJ, Ahn TH
1384 - 1387	Understanding the evolution of trench profiles in the via-first dual damascene integration scheme Kropewnicki T, Doan K, Tang B, Bjorkman C
1388 - 1391	Trench etch processes for dual damascene patterning of low-k dielectrics Jiang P, Celii FG, Dostalik WW, Newton KJ, Sakima H
1392 - 1398	Influence of the interface composition on the corrosion behavior of unbalanced magnetron grown niobium coatings on steel Schonjahn C, Paritong H, Munz WD, Twesten RD, Petrov I
1399 - 1403	Tribological performance of a novel high wear resistant high SiAl-Si alloy weld overlay Ott RD, Blue CA, Santella ML, Blau PJ
1404 - 1414	Interface engineering and graded films: Structure and characterization Bull SJ
1415 - 1420	Optimization of in situ substrate surface treatment in a cathodic arc plasma: A study by TEM and plasma diagnostics Schonjahn C, Ehlasarian AP, Lewis DB, New R, Munz WD, Twesten RD, Petrov I
1421 - 1424	Laterally graded multilayers and their applications Liu CA, Macrander A, Als-Nielsen J, Zhang K
1425 - 1431	Enhanced passivity of austenitic AISI 304 stainless steel by low-temperature ion nitriding Rudenja S, Pan J, Wallinder IO, Leygraf C, Kulu P, Mikli V
1432 - 1437	General rule for predicting surface segregation of substrate metal on film surface Yoshitake M, Aparna YR, Yoshihara K
1438 - 1441	High rate sputtering for Ni films by an rf-dc coupled magnetron sputtering system with multipolar magnetic plasma confinement Kawabata K, Tanaka T, Kitabatake A, Yamada K, Mikami Y, Kajioka H, Toiyama K
1442 - 1446	Corrosion resistance of chromium nitride on low alloy steels by cathodic arc deposition Han S, Lin JH, Wang DY, Lu FH, Shih HC
1447 - 1453	Electrochemical characterization and surface analysis of bulk amorphous alloys in aqueous solutions at different pH Schennach R, Grady T, Naugle DG, McWhinney H, Hays CC, Johnson WL, Cocke DL
1454 - 1459	Tribocharging in electrostatic beneficiation of coal: Effects of surface composition on work function as measured by x-ray photoelectron spectroscopy and ultraviolet photoelectron spectroscopy in air Trigwell S, Mazumder MK, Pellissier R
1460 - 1466	Study of high- and low-work-function surfaces for hyperthermal surface ionization using an absolute Kelvin probe Baikie ID, Peterman U, Lagel B, Dirscherl K
1467 - 1473	Oxygen loss and recovering induced by ultrahigh vacuum and oxygen annealing on WO3 thin film surfaces: Influences on the gas response properties Santucci S, Lozzi L, Maccallini E, Passacantando M, Ottaviano L, Cantalini C
1474 - 1480	Adsorption, decomposition, and stabilization of 1,2-dibromoethane on Cu(111) Chan ASY, Jones RG
1481 - 1484	Resonances in electron-stimulated desorption of Eu atoms Ageev VN, Kuznetsov YA, Madey TE
1485 - 1489	Photon-stimulated ion desorption from mono- and multilayered silicon alkoxide on silicon by core-level excitation Baba Y, Wu G, Sekiguchi T, Shimoyama I
1490 - 1496	Surface treatment and characterization of PMMA, PHEMA, and PHPMA Lim H, Lee Y, Han S, Cho J, Kim KJ
1497 - 1501	Adsorption and reaction of ethene on oxide-supported Pd, Rh, and Ir particles Frank M, Baumer M, Kuhnemuth R, Freund NJ
1502 - 1509	Effect of surface treatment on the gamma-WO3(001) surface: A comprehensive study of oxidation and reduction by scanning tunneling microscopy and low-energy electron diffraction Tanner RE, Altman EI
1510 - 1515	Surface science models for CoMo hydrodesulfurization catalysts: Influence of the support on hydrodesulfurization activity Coulier L, Kishan G, van Veen JAR, Niemantsverdriet JW
1516 - 1523	Reaction kinetics on supported model catalysts: Molecular beam/in situ time-resolved infrared reflection absorption spectroscopy study of the CO oxidation on alumina supported Pd particles Libuda J, Meusel I, Hoffmann J, Hartmann J, Freund HJ
1524 - 1530	Comparison of phosgene formation from adsorption of carbon tetrachloride on oxygen modified Ir(111) and oxygen modified Ir(110) Meyer RJ, Reeves CT, Safarik DJ, Allen DT, Mullins CB
1531 - 1536	Chemistry and aging of organosiloxane and fluorocarbon films grown from hyperthermal polyatomic ions Hanley L, Fuoco E, Wijesundara MBJ, Beck AJ, Brookes PN, Short RD
1537 - 1542	Interaction of chlorodifluoromethane with ultrathin solid water films Safarik DJ, Meyer RJ, Mullins CB
1543 - 1548	Molecular dynamics simulations of the trapping of ethane on Si(100)-(2x1): Effect of rotational energy and surface temperature Reeves CT, Stiehl JD, Mullins CB, Sitz GO
1549 - 1552	Characteristic structures of the Si(111)-7x7 surface step studied by scanning tunneling microscopy Miyake K, Okawa S, Takeuchi O, Futaba DN, Hata K, Morita R, Yamashita M, Shigekawa H
1553 - 1561	Transition from thermally grown gate dielectrics to deposited gate dielectrics for advanced silicon devices: A classification scheme based on bond ionicity Lucovsky G
1562 - 1565	Tungsten silicide for the alternate gate metal in metal-oxide-semiconductor devices Roh K, Youn S, Yang S, Roh Y
1566 - 1570	Influence of annealing temperature on simultaneous vapor deposited calcium phosphate thin films Hamdi M, Ektessabi AM
1571 - 1576	Deposition of electronic quality amorphous silicon, a-Si : H, thin films by a hollow cathode plasma-jet reactive sputtering system Pribil G, Hubicka Z, Soukup RJ, Ianno NJ
1577 - 1581	Supermagnetron plasma chemical vapor deposition and qualitative analysis of electrically conductive diamond-like amorphous carbon films Kinoshita H, Yoshida M
1582 - 1585	Energetic oxygen ions in the reactive sputtering of the Zr target in Ar+O-2 atmosphere Tominaga K, Kikuma T
1586 - 1590	Low temperature aluminum nitride deposition on aluminum by rf reactive sputtering Tait RN, Mirfazli A
1591 - 1594	Investigation of the W-TiN metal gate for metal-oxide-semiconductor devices Youn S, Roh K, Yang S, Roh Y, Kim KS, Jang YC, Lee NE
1595 - 1599	Effect of interlayer on thermal stability of nickel silicide Maa JS, Ono Y, Tweet DJ, Zhang FY, Hsu ST
1600 - 1605	Optical and structural properties of sol-gel SiO2 layers containing cobalt Ramos-Mendoza A, Tototzintle-Huitle H, Mendoza-Galvan A, Gonzalez-Hernandez J, Chao BS
1606 - 1610	Deposition and properties of tetrahedral amorphous carbon films prepared on magnetic hard disks Chan CY, Lai KH, Fung MK, Wong WK, Bello I, Huang RF, Lee CS, Lee ST, Wong SP
1611 - 1616	Structural, morphological, and mechanical properties of plasma deposited hydrogenated amorphous carbon thin films: Ar gas dilution effects Valentini L, Kenny JM, Mariotto G, Tosi P, Carlotti G, Socino G, Lozzi L, Santucci S
1617 - 1622	Wet oxidation behaviors of polycrystalline Si1-xGex films Kang SK, Ko DH, Lee KC, Lee TW, Lee YH, Ahn TH, Yeo IS, Oh SH, Park CG
1623 - 1629	Mechanism of the isotermic amorphous-to-crystalline phase transition in Ge : Sb : Te ternary alloys Gonzalez-Hernandez J, Prokhorov EF, Vorobiev YV, Morales-Sanchez E, Mendoza-Galvan A, Kostylev SA, Gorobets YI, Zakharchenko VN, Zakharchenko RV
1630 - 1635	Extension velocities for level set based surface profile evolution Richards DF, Bloomfield MO, Sen S, Cale TS
1636 - 1641	Effects of excess oxygen introduced during sputter deposition on carrier mobility in as-deposited and postannealed indium-tin-oxide films Kikuchi N, Kusano E, Kishio E, Kinbara A, Nanto H
1642 - 1646	Preparation and properties of transparent conductive aluminum-doped zinc oxide thin films by sol-gel process Alam MJ, Cameron DC
1647 - 1651	Synthesis and characterization of transparent conducting oxide cobalt-nickel spinel films Windisch CF, Ferris KF, Exarhos GJ
1652 - 1656	Measurements of photon stimulated desorption from thick and thin oxide of KEKB collider copper beam chambers and a stainless steel beam chamber Foerster CL, Lanni C, Foerster CL
1657 - 1661	Study of the exposure-dose-dependent photon-stimulated-desorption phenomena Hsiung GY, Young KY, Hsu YJ, Chen JR
1662 - 1665	Vacuum characteristics of sprayed metal films Minato M, Iwamoto H
1666 - 1673	Edison's vacuum coating patents Waits RK
1674 - 1678	Method for calculation of gas flow in the whole pressure regime through ducts of any length Livesey RG
1679 - 1687	Free jets in vacuum technologies Rebrov AK
1688 - 1692	Development of the quadrupole mass spectrometer with the Bessel-Box type energy analyzer: Function of the energy analyzer in the partial pressure measurements Takahashi N, Hayashi T, Akimichi H, Tuzi Y
1693 - 1698	Summary of quick disconnect vacuum flanges Mapes M
1699 - 1703	Cornell Electron Storage Ring phase-III interaction region vacuum chamber He Y, Li YL, Mistry NB, Greenwald S
1704 - 1707	Rapid cooling dual slot load locks for liquid crystal display Hosokawa A, Blonigan W, Kurita S
1708 - 1711	Design and operation of scroll-type dry primary vacuum pumps Liepert A, Lessard P
1712 - 1719	Practical guide to the use of Bayard-Alpert ionization gauges Singleton JH
1720 - 1724	Study of ZrO2 thin films for gate oxide applications Nam SW, Yoo JH, Kim HY, Kang SK, Ko DH, Yang CW, Lee HJ, Cho MH, Ku JH
1725 - 1729	Oxidation of H-covered flat and vicinal Si(111)-1x1 surfaces Zhang X, Chabal YJ, Christman SB, Chaban EE, Garfunkel E
1730 - 1736	Process window extension of TiN diffusion barrier using preoxidation of Ru and RuOx film for (Ba,Sr)TiO3 dielectric film Yoon DS, Hong K, Roh JS
1737 - 1741	Technology for the fabrication of ultrashort channel metal-oxide-semiconductor field-effect transistors Knoch J, Appenzeller J, Lengeler B, Martel R, Solomon P, Avouris P, Dieker C, Lu Y, Wang KL, Scholvin J, del Alamo JA
1742 - 1746	Oxide phosphor thin-film electroluminescent devices fabricated by magnetron sputtering with rapid thermal annealing Minami T, Toda H, Miyata T
1747 - 1751	Low-k materials etching in magnetic neutral loop discharge plasma Morikawa Y, Yasunami S, Chen W, Hayashi T, Uchida T
1752 - 1757	Scanning spreading resistance microscopy study of a metalorganic chemical vapor deposited grown InP optoelectronic structure Dixon-Warren S, Lu RP, Ingrey S, Macquistan D, Bryskiewicz T, Smith G, Bryskiewicz B
1758 - 1762	Fabrication of ferromagnetic/semiconductor waveguide structures and application to microwave bandstop filter Wu W, Lee CC, Tsai CS, Su J, So W, Yoo J, Chuang R
1763 - 1768	Calibrated magnetic force microscopy measurement of current-carrying lines Yongsunthon R, McCoy J, Williams ED
1769 - 1772	Scanning Hall probe microscopy on an atomic force microscope tip Chong BK, Zhou H, Mills G, Donaldson L, Weaver JMR
1773 - 1776	Ferromagnetic resonance of monodisperse Co particles Wiedwald U, Spasova M, Farle M, Hilgendorff M, Giersig M
1777 - 1785	Static friction and surface roughness studies of surface micromachined electrostatic micromotors using an atomic force/friction force microscope Sundararajan S, Bhushan B
1786 - 1789	Field-emission properties of vertically aligned carbon-nanotube array dependent on gas exposures and growth conditions Lim SC, Jeong HJ, Park YS, Bae DS, Choi YC, Shin YM, Kim WS, An KH, Lee YH
1790 - 1795	Carbon nanotube-based electron gun for electron microscopy Leopold JG, Zik O, Cheifetz E, Rosenblatt D
1796 - 1799	Growth of well-aligned carbon nanotubes on nickel by hot-filament-assisted dc plasma chemical vapor deposition in a CH4/H-2 plasma Hayashi Y, Negishi T, Nishino S
1800 - 1805	Gas-phase production of carbon single-walled nanotubes from carbon monoxide via the HiPco process: A parametric study Bronikowski MJ, Willis PA, Colbert DT, Smith KA, Smalley RE
1806 - 1811	Selective-area chemical-vapor deposition of Si using a bilayer dielectric mask patterned by proximal probe oxidation Gwo S, Yasuda T, Yamasaki S
1812 - 1816	Amino-terminated self-assembled monolayer on a SiO2 surface formed by chemical vapor deposition Hozumi A, Yokogawa Y, Kameyama T, Sugimura H, Hayashi K, Shirayama H, Takai O
1817 - 1821	Surface acoustic wave investigation by ultrahigh vacuum scanning tunneling microscopy Voigt PU, Krauss S, Chilla E, Koch R
1822 - 1824	Method for navigating two scanning probes to a common point without additional microscopes Okamoto H, Chen DM
1825 - 1828	Nanomechanical properties of molecular organic thin films Caro J, Fraxedas J, Gorostiza P, Sanz F
1829 - 1834	Self-organization of large-area periodic nanowire arrays by glancing incidence ion bombardment of CaF2(111) surfaces Batzill M, Bardou F, Snowdon KJ
1835 - 1839	Aspect ratio dependent plasma-induced charging damage in rf precleaning of a metal contact Kim J, Shin KS, Park WJ, Kim YJ, Kang CJ, Ahn TH, Moon JT
1840 - 1845	Reactive magnetron sputter-deposition of NbN and (Nb,Ti)N films related to sputtering source characterization and optimization Iosad NN, Jackson BD, Polyakov SN, Dmitriev PN, Klapwijk TM
1846 - 1849	Process development for small-area GaN/AlGaN heterojunction bipolar transistors Lee KP, Zhang AP, Dang G, Ren F, Hobson WS, Lopata J, Abenathy CR, Pearton SJ, Lee JW
1850 - 1853	Two-step metalorganic chemical vapor deposition growth of piezoelectric ZnO thin film on SiO2/Si substrate Muthukumar S, Emanetoglu NW, Patounakis G, Gorla CR, Liang S, Lu Y
1854 - 1861	Characterization of residues formed by anhydrous hydrogen fluoride etching of doped oxides Muscat AJ, Thorsness AG, Montano-Miranda G
1862 - 1867	Critical behavior of epitaxial Si1-xGex/Si(001) islands Budiman RA, Ruda HE, Perovic DD, Bahierathan B
1868 - 1870	Adatom assisted stabilization of ad dimers on Ge(001) Zoethout E, Zandvliet HJW, Poelsema B
1871 - 1877	Investigation of the penetration of atomic hydrogen from the gas phase into SiO2/GaAs Kagadei VA, Nefyodtsev EV, Proskurovsky DI
1878 - 1881	High density plasma via hole etching in SiC Cho H, Lee KP, Leerungnawarat P, Chu SNG, Ren F, Pearton SJ, Zetterling CM
1882 - 1886	Reflection high-energy electron diffraction study of ion-beam induced carbonization for 3C-SiC heteroepitaxial growth on Si (100) Tsubouchi N, Chayahara A, Mokuno Y, Kinomura A, Horino Y
1887 - 1893	Epitaxial growth of cubic SiC thin films on silicon using single molecular precursors by metalorganic chemical vapor deposition Boo JH, Lee SB, Lee KW, Yu KS, Kim Y, Yeon SH, Jung IN
1894 - 1897	Visible emission from amorphous AlN thin-film phosphors with Cu, Mn, or Cr Martin AL, Spalding CM, Dimitrova VI, Van Patten PG, Caldwell ML, Kordesch ME, Richardson HH
1898 - 1901	Investigation of polycrystalline silicon grain structure with single wafer chemical vapor deposition technique Bu H, Hu C, Bevan M, Wang S, Sanchez E, Luo L
1902 - 1906	Cluster deposition study by molecular dynamics simulation: Al and Cu cluster Kang JW, Choi KS, Kang JC, Kang ES, Byun KR, Hwang HJ
1907 - 1911	Atomic-order thermal nitridation of Si(100) and subsequent growth of Si Watanabe T, Sakuraba M, Matsuura T, Murota J
1912 - 1918	Structure and mechanical properties of Ti-Si-C coatings deposited by magnetron sputtering Koutzaki SH, Krzanowski JE
1919 - 1922	Multilayered (Ti, Al) ceramic coating for high-speed machining applications Zeng XT, Zhang S, Tan LS
1923 - 1928	Controlled coordination and oxidation states of copper and manganese cations in complex nickel-copper-cobalt-manganese oxide thin films Kukuruznyak DA, Han SW, Lee MH, Omland KA, Gregg MC, Stern EA, Ohuchi FS
1929 - 1932	Ultraviolet photoemission spectroscopy study of ultrahigh-vacuum-fractured CaVO3 surface Aiura Y, Kawanaka H, Bando H, Yasue T
1933 - 1937	Reactions of acetaldehyde on UO2(111) single crystal surfaces. Evidence of benzene formation Chong SV, Idriss H
1938 - 1941	Metallic electronic states on SrTiO3 (110) surface: An in situ conduction measurement Bando H, Ochiai Y, Aiura Y, Haruyama Y, Yasue T, Nishihara Y
1942 - 1946	Self-diffusion in ceria Perkins CL, Henderson MA, Peden CHF, Herman GS
1947 - 1952	Behavior of ultrathin Al2O3 films in very high electric fields: Scanning tunneling microscope-induced void formation and dielectric breakdown Niu C, Magtoto NP, Kelber JA
1953 - 1958	Tin-oxide overlayer formation by oxidation of Pt-Sn(111) surface alloys Batzill M, Beck DE, Jerdev D, Koel BE
1959 - 1964	Surface characterization of oxidative corrosion of U-Nb alloys Kelly D, Lillard JA, Manner WL, Hanrahan R, Paffett MT
1965 - 1970	Plasma oxidation as a tool to design oxide films at low temperatures Schennach R, Grady T, Naugle DG, Parga JR, McWhinney H, Cocke DL
1971 - 1976	Making superior corrosion resistant aluminum oxide films using ozone-electrochemical and electron microscopy studies Kuznetsova A, Popova I, Zhukov V, Yates JT, Zhou G, Yang JC, Chen X
1977 - 1982	Nature of oxygen at rocksalt and spinel oxide surfaces Langell MA, Kim JG, Pugmire DL, McCarroll W
1983 - 1987	Fermi contours and adsorbate phonon anomalies for Li/Mo(110) and Li/W(110) Rotenberg E, Kevan SD
1988 - 1992	Adsorption of hydrogen on clean and potassium modified low index copper surfaces: Cu(100) and Cu(110) Thomsen L, Onsgaard J, Godowski PJ, Moller P, Hoffmann SV
1993 - 1995	Scanning tunneling microscopy study of the molecular arrangement of meta- and para-xylene on Pd(111) Futaba DN, Landry JP, Loui A, Chiang S
1996 - 2000	Behavior of zirconium surfaces in the presence of oxygen, nitrogen, and hydrogen containing adsorbates Kang YC, Clauss DA, Ramsier RD
2001 - 2006	Chlorosilane adsorption on clean Si surfaces: Scanning tunneling microscopy and Fourier-transform infrared absorption spectroscopy studies Nishizawa M, Yasuda T, Yamasaki S, Shinohara M, Kamakura N, Kimura Y, Niwano M
2007 - 2012	Line of sight techniques: Providing an inventory of all species arriving at and departing from a surface Chan ASY, Skegg MP, Jones RG
2013 - 2016	Near-edge valence-band structure of amorphous hydrogenated Si-C thin films characterized by Auger and photoemission processes Lee MH, Ohuchi FS
2017 - 2024	In situ characterization of thin film growth: Boron nitride on silicon Fukarek W
2025 - 2033	Cluster beam synthesis of nanostructured thin films Milani P, Piseri P, Barborini E, Podesta A, Lenardi C