L73 - L76 |
Dual Intercalating Molten Electrolyte Batteries Carlin RT, Delong HC, Fuller J, Trulove PC |
L76 - L79 |
A 3 Volt Lithium Manganese Oxide Cathode for Rechargeable Lithium Batteries Huang HT, Bruce PG |
L78 - L79 |
Lithium Ion Conductivity of A-Site Deficient Perovskite Solid-Solution La0.67-Xli3Xtio3 Kawai H, Kuwano J |
L80 - L81 |
New Thin-Layer Solid-State Lithium Polymer Batteries Passerini S, Loutzky S, Scrosati B |
L82 - L84 |
Fast Electrochromic Switching with Nanocrystalline Oxide Semiconductor-Films Hagfeldt A, Vlachopoulos N, Gratzel M |
L85 - L87 |
Use of Atomic-Force Microscopy to Image Surfaces During Fluid-Flow Schmidt WU, Alkire RC |
1709 - 1713 |
A Silane-Based Electroactive Film Prepared in an Imidazolium Chloroaluminate Molten-Salt Carlin RT, Osteryoung RA |
1713 - 1720 |
Heterogeneous and Homogeneous Electron-Transfer Reactions of Tetrathiafulvalene in Ambient-Temperature Chloraluminate Molten-Salts Carter MT, Osteryoung A |
1720 - 1725 |
Electrochemical Hydrogen Permeation in a Proton-Hole Mixed Conductor and Its Application to a Membrane Reactor Hamakawa S, Hibino T, Iwahara H |
1725 - 1730 |
The Exchange Current-Density of Oxide Cathodes in Molten Carbonates Hatoh K, Niikura J, Yasumoto E, Gamo T |
1730 - 1734 |
Electric Double-Layer Capacitor Composed of Activated Carbon-Fiber Cloth Electrodes and Solid Polymer Electrolytes Containing Alkylammonium Salts Ishikawa M, Morita M, Ihara M, Matsuda Y |
1735 - 1739 |
Observation of a Transient Structural-Change During the Reversible Reduction of a Porphyrin Thin-Film Electrode Jaeger NI, Lehmkuhl R, Schlettwein D, Wohrle D |
1740 - 1746 |
A Novel Active Material for the Negative Electrode in Alkaline Nickel-Oxide Secondary Batteries Sakamoto Y, Kuruma K, Hirano S, Hirata M |
1747 - 1750 |
Optimization of Composition and Structure of Metal-Hydride Electrodes Petrov K, Rostami AA, Visintin A, Srinivasan S |
1751 - 1758 |
Modeling of Cylindrical Alkaline Cells .7. A Wound Cell Model Podlaha EJ, Cheh HY |
1758 - 1762 |
Electrochromism of Electrodeposited Tungsten Trioxide Films .1. Electrochemical Characterization Shen PK, Chen KY, Tseung AC |
1762 - 1769 |
A Reinvestigation of the Electrochemical-Behavior of Nb(V) in AlCl3-Naclsat and Related Melts Sienerth KD, Hondrogiannis EM, Mamantov G |
1770 - 1773 |
The Influence of Methanol on O(2) Electroreduction at a Rotating Pt Disk Electrode in Acid Electrolyte Chu D, Gilman S |
1773 - 1779 |
Electrodeposition of Cobalt-Chromium Alloy from Trivalent Chromium Solutions Dasarathy H, Riley C, Coble HD |
1779 - 1783 |
Preparation and Properties of Sb2S3 Thin-Films for Photoelectrochemical Applications Deshmukh LP, Holikatti SG, Rane BP, More BM, Hankare PP |
1783 - 1791 |
Fundamental-Study on Electrodeposition of Co and Co-P Films Fukunaka Y, Aikawa S, Asaki Z |
1791 - 1795 |
Direct Nickel-Plating on Aluminum Substrate for Microbump Formation Honma H, Watanabe H, Kobayashi T |
1795 - 1803 |
Temperature-Dependent Methanol Electrooxidation on Well-Characterized Pt-Ru Alloys Gasteiger HA, Markovic N, Ross PN, Cairns EJ |
1804 - 1808 |
Evaluation of an Effective Platinum Metal-Surface Area in a Phosphoric-Acid Fuel-Cell Aragane J, Urushibata H, Murahashi T |
1808 - 1819 |
Impedance Spectroscopy of Nonactive Metal-Electrodes at Low Potentials in Propylene Carbonate Solutions - A Comparison to Studies of Li Electrodes Aurbach D, Zaban A |
1819 - 1823 |
Water-Absorption of the Polymer Electrolyte Systems Pb(Cf3So3)2Peon and Zn(Cf3So3)2Peon Lauenstein A, Johansson A, Tegenfeldt J |
1823 - 1826 |
Tables of Degenerate Electrical Networks for Use in the Equivalent-Circuit Analysis of Electrochemical Systems Fletcher S |
1827 - 1831 |
Electrotransportation of Aniline Through a Perfluorosulfonate Ion-Exchange Membrane Katakura K, Inaba M, Toyama K, Ogumi Z, Takehara Z |
1832 - 1838 |
Silica Films on Silicon - Thickness Measurement by Electron-Microscopy and Ellipsometry Kao SC, Doremus RH |
1838 - 1842 |
Calibration of an Electrochemical Quartz-Crystal Microbalance During Localized Corrosion Oltra R, Efimov IO |
1843 - 1850 |
Electrochemically Deposited Diffusion-Barriers Paunovic M, Bailey PJ, Schad RG, Smith DA |
1851 - 1855 |
Photostimulated Luminescence and Structural Characterization of Ba5(PO4)3Cleu2+ Phosphors Sato M, Tanaka T, Ohta M |
1856 - 1862 |
Warpage and Oxide Precipitate Distributions in Cz Silicon-Wafers Chiou HD, Chen Y, Carpenter RW, Jeong J |
1862 - 1866 |
Measurement of Mobile Ion Contamination in Multilayer Metallization by Triangular Voltage Sweep Chonko MA, Khamankar R, Tiwald T, Allen T, Vasquez B |
1867 - 1871 |
3-Percent Ti-Tungsten Diffusion-Barriers .1. A Discussion of the Role of the A15 Structure Evans DR, Leet DM |
1872 - 1878 |
The Effect of the Crystal Grown-in Defects on the Pause Tail Characteristics of Megabit Dynamic Random-Access Memory Devices Kim SS, Wijaranakula W |
1879 - 1885 |
Reaction and Film Properties of Selective Titanium Silicide Low-Pressure Chemical-Vapor-Deposition Saito K, Higashi Y, Amazawa T, Arita Y |
1886 - 1893 |
Decomposition of Cyanoethylphosphine, Benzylphosphine, and Cyclopentylphosphine During InP MOCVD Growth Studied by FTIR Spectroscopy - Criteria for the Design of Organophosphine Precursors Abdulridha HH, Bateman JE, Fan GH, Pemble ME, Povey IM |
1893 - 1900 |
Interferometric Real-Time Measurement of Uniformity for Plasma-Etching Dalton TJ, Conner WT, Sawin HH |
1900 - 1904 |
Feature-Scale Fluid-Based Erosion Modeling for Chemical-Mechanical Polishing Runnels SR |
1905 - 1915 |
The Role of Reactive Elements on Scale Growth in High-Temperature Oxidation of Pure Nickel, Iron, Cobalt, and Copper .1. Oxidation-Kinetics and Scale Morphology Strawbridge A, Rapp RA |
1915 - 1920 |
Electrochemical-Behavior of Lithium Electrolytes Based on New Polyether Networks Alloin F, Sanchez JY, Armand M |
1921 - 1927 |
Ionic-Conductivity in Ordered and Disordered Phases of Plastic Crystals Chandra D, Helms JH, Majumdar A |
1928 - 1931 |
High-Performance Solid Oxide Fuel-Cell Cathode Fabricated by Electrochemical Vapor-Deposition Suzuki M, Sasaki H, Otoshi S, Kajimura A, Sugiura N, Ippommatsu M |
1931 - 1937 |
Dielectrics Degradation of Alpha-Si/Co/SiO2/Si Structure During Furnace Annealing Chen BS, Chen MC |
1938 - 1943 |
Effect of Hydrogen-Bonding Characteristics on the Corrosion of Plasma-Deposited Silicon-Nitride Films Rocheleau RE, Zhang Z, Iwane A, Hihara LH |
1943 - 1950 |
Kinetics of SiO2 Deposition from Tetraethylorthosilicate Haupfear EA, Olson EC, Schmidt LD |
1950 - 1954 |
Photoluminescence of Mn(2+)-Activated Znga2O4 Shea LE, Datta RK, Brown JJ |
1954 - 1956 |
Local Etch-Rate Control of Masked InP/InGaAsP by Diffusion-Limited Etching Brenner T, Melchior H |
1957 - 1963 |
Source Drain Dislocations and Electrical Leakage in Titanium-Salicided CMOS Integrated-Circuits Guldi RL |
1964 - 1972 |
Intrinsic and Passivation-Induced Trench Tapering During Plasma-Etching Hamaguchi S, Dalvie M |
1973 - 1976 |
Wet Chemical Cleaning and Surface-Analysis of ZnSe Melendez JL, Helms CR |
1977 - 1982 |
Protective Treatments for Nickel-Based Contact Materials Law HH, Sapjeta J, Chidsey CE, Putvinski TM |
1982 - 1982 |
Effect of Gas-Diffusion Process on Sensing Properties of SnO2 Thin-Film Sensors in a SiO2/SnO2 Layer-Built Structure Fabricated by Sol-Gel Process (Vol 141, Pg 220, 1994) Feng CD, Shimizu Y, Egashira M |
1983 - 1988 |
Silicon-on-Insulator Devices for High-Voltage and Power IC Applications Arnold E |