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| No. | Article |
|---|---|
| 1 |
Nanostructured thin films of organic-organometallic block copolymers: One-step lithography with poly(ferrocenylsilanes) by reactive ion etching Lammertink RGH, Hempenius MA, van den Enk JE, Chan VZH, Thomas EL, Vancso GJ Advanced Materials, 12(2), 98, 2000 |