Previous Article Next Article Table of Contents Advanced Materials, Vol.12, No.2, 98-103, 2000 DOI10.1002/(SICI)1521-4095(200001)12:2<98::AID-ADMA98>3.0.CO;2-5 Export Citation Nanostructured thin films of organic-organometallic block copolymers: One-step lithography with poly(ferrocenylsilanes) by reactive ion etching Lammertink RGH, Hempenius MA, van den Enk JE, Chan VZH, Thomas EL, Vancso GJ [Referenced By] Please enable JavaScript to view the comments powered by Disqus.
