화학공학소재연구정보센터
검색결과 : 17건
No. Article
1 Formation of Positive- and Negative-tone Patterns of Poly(lactic acid) by Reaction Development Patterning
Oyama T, Kawada T, Tokoro Y
Chemistry Letters, 46(12), 1810, 2017
2 Tunable Liquid Crystal Lens Based on Pretilt Angle Gradient Alignment
Bezruchenko VS, Muravsky AA, Murauski AA, Stankevich AI, Mahilny UV
Molecular Crystals and Liquid Crystals, 626(1), 222, 2016
3 Making polymer brush photosensitive with azobenzene containing surfactants
Kopyshev A, Lomadze N, Feldmann D, Genzer J, Santer S
Polymer, 79, 65, 2015
4 Low-CTE Photosensitive Polyimide Based on Semialicyclic Poly(amic acid) and Photobase Generator
Ogura T, Higashihara T, Ueda M
Journal of Polymer Science Part A: Polymer Chemistry, 48(6), 1317, 2010
5 Photoinduced Microphase Separation in Block Copolymers: Exploring Shape Incompatibility of Mesogenic Side Groups
Zhao Y, Tong X, Zhao Y
Macromolecular Rapid Communications, 31(11), 986, 2010
6 Direct Patterning of Poly(amic acid) and Low-Temperature Imidization Using a Crosslinker, a Photoacid Generator, and a Thermobase Generator
Ogura T, Higashihara T, Ueda M
Journal of Polymer Science Part A: Polymer Chemistry, 47(13), 3362, 2009
7 Facile Synthesis of Well-Defined pH-Liable Schiff-Base-Type Photosensitive Polymers via Visible-Light-Activated Ambient Temperature RAFT Polymerization
Luo Q, Zheng HM, Peng Y, Gao H, Lu LC, Cai YL
Journal of Polymer Science Part A: Polymer Chemistry, 47(23), 6668, 2009
8 Negative-type photosensitive poly(phenylene ether) based on poly(2,6-dimethyl-1,4-phenylene ether), a crosslinker, and a photoacid generator
Mizoguchi K, Ueda M
Journal of Polymer Science Part A: Polymer Chemistry, 46(15), 4949, 2008
9 Application of epoxy-based photosensitive polymers for optical MEMS and subsequent reliability evaluation
Park J, Shin DS
Materials Chemistry and Physics, 98(2-3), 309, 2006
10 Electroluminescent property and photolithographic process of photosensitive random copolymers
Jeong JW, Kwon Y, Han YS, Park LS
Molecular Crystals and Liquid Crystals, 443, 59, 2005