A series of poly(N-vinyl carbazole)-based random copolymers containing photosensitive cinnamoyl moieties capable of generating negative type patterned images were synthesized and characterized. First, poly(N-vinyl carbazole- ran -hydroxyethyl methacrylate) copolymers, P(VK-ran-HEMA), were prepared by free radical polymerization of VK and HEMA monomers using AIBN as an initiator in THF. In second step, cinnamoyl groups were introduced by post reaction. Photoluminescent properties of synthesized photosensitive copolymers were measured and, upon UV exposure, negative patterned images with high resolution were produced by standard photolithographic process.